IL330139A - Device and method for producing a semiconductor wafer using reduced autodoping - Google Patents

Device and method for producing a semiconductor wafer using reduced autodoping

Info

Publication number
IL330139A
IL330139A IL330139A IL33013926A IL330139A IL 330139 A IL330139 A IL 330139A IL 330139 A IL330139 A IL 330139A IL 33013926 A IL33013926 A IL 33013926A IL 330139 A IL330139 A IL 330139A
Authority
IL
Israel
Prior art keywords
producing
semiconductor wafer
autodoping
reduced
reduced autodoping
Prior art date
Application number
IL330139A
Other languages
Hebrew (he)
Original Assignee
Siltronic Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siltronic Ag filed Critical Siltronic Ag
Publication of IL330139A publication Critical patent/IL330139A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/12—Substrate holders or susceptors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
IL330139A 2023-12-19 2024-12-05 Device and method for producing a semiconductor wafer using reduced autodoping IL330139A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP23218055.4A EP4575049A1 (en) 2023-12-19 2023-12-19 Apparatus and method for fabricating a semiconductor wafer with reduced autodoping
PCT/EP2024/084931 WO2025131760A1 (en) 2023-12-19 2024-12-05 Device and method for producing a semiconductor wafer using reduced autodoping

Publications (1)

Publication Number Publication Date
IL330139A true IL330139A (en) 2026-08-01

Family

ID=89430529

Family Applications (1)

Application Number Title Priority Date Filing Date
IL330139A IL330139A (en) 2023-12-19 2024-12-05 Device and method for producing a semiconductor wafer using reduced autodoping

Country Status (4)

Country Link
EP (1) EP4575049A1 (en)
CN (1) CN122459510A (en)
IL (1) IL330139A (en)
WO (1) WO2025131760A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100726301B1 (en) * 2000-05-08 2007-06-13 엠이엠씨 일렉트로닉 머티리얼즈 인코포레이티드 Epitaxial silicon wafer free from autodoping and backside halo
JP4378699B2 (en) * 2004-08-03 2009-12-09 株式会社Ｓｕｍｃｏ Epitaxial growth equipment
DE102009011622B4 (en) 2009-03-04 2018-10-25 Siltronic Ag Epitaxial silicon wafer and process for producing an epitaxially coated silicon wafer
CN117071063A (en) * 2023-08-25 2023-11-17 西安奕斯伟材料科技股份有限公司 Epitaxial growth device and epitaxial growth method

Also Published As

Publication number Publication date
CN122459510A (en) 2026-07-24
WO2025131760A1 (en) 2025-06-26
TW202536939A (en) 2025-09-16
EP4575049A1 (en) 2025-06-25