IL328666A - מודול בחירת צבע לסינון פס אורך גל הניתן לבחירה - Google Patents

מודול בחירת צבע לסינון פס אורך גל הניתן לבחירה

Info

Publication number
IL328666A
IL328666A IL328666A IL32866626A IL328666A IL 328666 A IL328666 A IL 328666A IL 328666 A IL328666 A IL 328666A IL 32866626 A IL32866626 A IL 32866626A IL 328666 A IL328666 A IL 328666A
Authority
IL
Israel
Prior art keywords
filtering
wavelength band
selection module
color selection
selectable wavelength
Prior art date
Application number
IL328666A
Other languages
English (en)
Inventor
Greevenbroek Hendrikus Robertus Marie Van
Oktay Onur Kuzucu
Zili Zhou
Stijn Oskar Matisse Hinterding
Patrick Warnaar
Niels Caspar Herman Hesp
Original Assignee
Asml Netherlands Bv
Greevenbroek Hendrikus Robertus Marie Van
Oktay Onur Kuzucu
Zili Zhou
Stijn Oskar Matisse Hinterding
Patrick Warnaar
Niels Caspar Herman Hesp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP23217927.5A external-priority patent/EP4575636A1/en
Application filed by Asml Netherlands Bv, Greevenbroek Hendrikus Robertus Marie Van, Oktay Onur Kuzucu, Zili Zhou, Stijn Oskar Matisse Hinterding, Patrick Warnaar, Niels Caspar Herman Hesp filed Critical Asml Netherlands Bv
Publication of IL328666A publication Critical patent/IL328666A/he

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/706831—Recipe selection or optimisation, e.g. select or optimise recipe parameters such as wavelength, polarisation or illumination modes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706847—Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706849—Irradiation branch, e.g. optical system details, illumination mode or polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
IL328666A 2023-12-19 2024-11-13 מודול בחירת צבע לסינון פס אורך גל הניתן לבחירה IL328666A (he)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP23217927.5A EP4575636A1 (en) 2023-12-19 2023-12-19 A color selection module for filtering a selectable wavelength band
EP24173626 2024-05-01
PCT/EP2024/082240 WO2025131447A1 (en) 2023-12-19 2024-11-13 A color selection module for filtering a selectable wavelength band

Publications (1)

Publication Number Publication Date
IL328666A true IL328666A (he) 2026-07-01

Family

ID=93520787

Family Applications (1)

Application Number Title Priority Date Filing Date
IL328666A IL328666A (he) 2023-12-19 2024-11-13 מודול בחירת צבע לסינון פס אורך גל הניתן לבחירה

Country Status (4)

Country Link
CN (1) CN122459743A (he)
IL (1) IL328666A (he)
TW (1) TW202536546A (he)
WO (1) WO2025131447A1 (he)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4685560A3 (en) 2025-12-10 2026-07-08 ASML Netherlands B.V. Color selection module

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
NL1036245A1 (nl) 2007-12-17 2009-06-18 Asml Netherlands Bv Diffraction based overlay metrology tool and method of diffraction based overlay metrology.
NL1036734A1 (nl) 2008-04-09 2009-10-12 Asml Netherlands Bv A method of assessing a model, an inspection apparatus and a lithographic apparatus.
NL1036857A1 (nl) 2008-04-21 2009-10-22 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
KR101295203B1 (ko) 2008-10-06 2013-08-09 에이에스엠엘 네델란즈 비.브이. 2차원 타겟을 이용한 리소그래피 포커스 및 조사량 측정
WO2011012624A1 (en) 2009-07-31 2011-02-03 Asml Netherlands B.V. Metrology method and apparatus, lithographic system, and lithographic processing cell
NL2007176A (en) 2010-08-18 2012-02-21 Asml Netherlands Bv Substrate for use in metrology, metrology method and device manufacturing method.
US9733124B2 (en) * 2013-04-18 2017-08-15 BMG LABTECH, GmbH Microplate reader with linear variable filter
IL290735B2 (he) 2014-11-26 2023-03-01 Asml Netherlands Bv שיטה מטרולוגית, תוצר מחשב ומערכת
IL256196B (he) 2015-06-17 2022-07-01 Asml Netherlands Bv בחירת מרשם על בסיס הרכב אינטר-מרשם
JP6731490B2 (ja) 2016-03-07 2020-07-29 エーエスエムエル ネザーランズ ビー．ブイ． 照明システムおよびメトロロジシステム
US10241337B2 (en) * 2016-05-27 2019-03-26 Verily Life Sciences Llc Tunable spectral slicer and methods of use
DE102018124714B3 (de) * 2018-10-08 2019-10-17 Abberior Instruments Gmbh Bandpassfilter für Licht mit variabler unterer und oberer Grenzwellenlänge

Also Published As

Publication number Publication date
CN122459743A (zh) 2026-07-24
TW202536546A (zh) 2025-09-16
WO2025131447A1 (en) 2025-06-26