IL326607A - Stabilized organosilane compositions and methods of using same to form dense low-k films - Google Patents

Stabilized organosilane compositions and methods of using same to form dense low-k films

Info

Publication number
IL326607A
IL326607A IL326607A IL32660726A IL326607A IL 326607 A IL326607 A IL 326607A IL 326607 A IL326607 A IL 326607A IL 32660726 A IL32660726 A IL 32660726A IL 326607 A IL326607 A IL 326607A
Authority
IL
Israel
Prior art keywords
films
methods
same
form dense
dense low
Prior art date
Application number
IL326607A
Other languages
Hebrew (he)
Original Assignee
Versum Mat Us Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Versum Mat Us Llc filed Critical Versum Mat Us Llc
Publication of IL326607A publication Critical patent/IL326607A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
IL326607A 2023-08-15 2024-08-12 Stabilized organosilane compositions and methods of using same to form dense low-k films IL326607A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202363519635P 2023-08-15 2023-08-15
PCT/US2024/041986 WO2025038583A1 (en) 2023-08-15 2024-08-12 Stabilized organosilane compositions and methods of using same to form dense low-k films

Publications (1)

Publication Number Publication Date
IL326607A true IL326607A (en) 2026-04-01

Family

ID=94632624

Family Applications (1)

Application Number Title Priority Date Filing Date
IL326607A IL326607A (en) 2023-08-15 2024-08-12 Stabilized organosilane compositions and methods of using same to form dense low-k films

Country Status (3)

Country Link
CN (1) CN121889404A (en)
IL (1) IL326607A (en)
WO (1) WO2025038583A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7892648B2 (en) * 2005-01-21 2011-02-22 International Business Machines Corporation SiCOH dielectric material with improved toughness and improved Si-C bonding
US20100081293A1 (en) * 2008-10-01 2010-04-01 Applied Materials, Inc. Methods for forming silicon nitride based film or silicon carbon based film
WO2017171817A1 (en) * 2016-03-31 2017-10-05 Intel Corporation Flowable dielectrics from vapor phase precursors
WO2019055393A1 (en) * 2017-09-14 2019-03-21 Versum Material Us, Llc Compositions and methods for depositing silicon-containing films
TWI853993B (en) * 2019-08-12 2024-09-01 美商應用材料股份有限公司 Low-k dielectric films

Also Published As

Publication number Publication date
WO2025038583A1 (en) 2025-02-20
TW202517657A (en) 2025-05-01
WO2025038583A9 (en) 2025-04-17
CN121889404A (en) 2026-04-17

Similar Documents

Publication Publication Date Title
IL289902A (en) Methods and compositions for enhanced expansion and cytotoxicity of natural killer cells
IL310530A (en) Stabilized compositions of radionuclides and uses thereof
ZA202210224B (en) Chelator compositions for radiometals and methods of using same
PL4090332T3 (en) Compositions of substituted pyrazolopyrimidines and uses thereof
IL314075A (en) Compositions of (z)-endoxifen and methods of enrichment thereof
GB2622995B (en) CAS13-based compositions and methods of use thereof
IL326607A (en) Stabilized organosilane compositions and methods of using same to form dense low-k films
EP4298076A4 (en) Ceramic compositions and methods of use
IL319844A (en) Compounds and compositions useful as inhibitors of iaps
CA3255793A1 (en) Angiotensinogen-modulating compositions and methods of use thereof
IL310407A (en) Factor xii (f12) irna compositions and methods of use thereof
PL4554562T3 (en) Olanzapine compositions and methods of use
GB202113708D0 (en) Method of protecting digital content
GB202414723D0 (en) Deicing compositions and methods of making and using thereof
IL319457A (en) Compositions of staurosporine analogs and uses thereof
GB202405768D0 (en) Compositions and uses of oligo-chromopeptides and methods of making
IL326294A (en) Apilimod compositions and methods of use
GB202310868D0 (en) compositions and methods of use
CA3289402A1 (en) Compositions and methods for multiplex engineering of immune cells
AU2023904253A0 (en) Methods and Preparation and Uses of Xanthorrhoeaceae Compositions
AU2022904011A0 (en) Methods and Preparation and Uses of Xanthorrhoeaceae Compositions
HK40109982A (en) Stabilized compositions of radionuclides and uses thereof
AU2021904196A0 (en) Methods and Preparation and Uses of Xanthorrhoeaceae Compositions
AU2021411427A9 (en) High pressure-processed architectural coating compositions and methods for high pressure-processing of architectural coating compositions
AU2020904754A0 (en) Methods and Preparation and Uses of Xanthorrhoeaceae Compositions