IL323914A - מערכות ושיטות לאופטימיזציה של סריקת דגימות במערכות בדיקה - Google Patents
מערכות ושיטות לאופטימיזציה של סריקת דגימות במערכות בדיקהInfo
- Publication number
- IL323914A IL323914A IL323914A IL32391425A IL323914A IL 323914 A IL323914 A IL 323914A IL 323914 A IL323914 A IL 323914A IL 32391425 A IL32391425 A IL 32391425A IL 323914 A IL323914 A IL 323914A
- Authority
- IL
- Israel
- Prior art keywords
- charged particle
- sample
- particle beams
- failed
- scanning
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202363464501P | 2023-05-05 | 2023-05-05 | |
| PCT/EP2024/060454 WO2024231062A1 (en) | 2023-05-05 | 2024-04-17 | Systems and methods for optimizing scanning of samples in inspection systems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL323914A true IL323914A (he) | 2025-12-01 |
Family
ID=90826265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL323914A IL323914A (he) | 2023-05-05 | 2025-10-12 | מערכות ושיטות לאופטימיזציה של סריקת דגימות במערכות בדיקה |
Country Status (5)
| Country | Link |
|---|---|
| KR (1) | KR20260003700A (he) |
| CN (1) | CN121039773A (he) |
| IL (1) | IL323914A (he) |
| TW (1) | TW202509978A (he) |
| WO (1) | WO2024231062A1 (he) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025261658A1 (en) * | 2024-06-18 | 2025-12-26 | Asml Netherlands B.V. | Systems and methods for handling the impact of failing beams in multibeam inspection |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6750455B2 (en) * | 2001-07-02 | 2004-06-15 | Applied Materials, Inc. | Method and apparatus for multiple charged particle beams |
| US7660687B1 (en) * | 2006-05-25 | 2010-02-09 | Kla-Tencor Corporation | Robust measurement of parameters |
| US9305747B2 (en) * | 2010-11-13 | 2016-04-05 | Mapper Lithography Ip B.V. | Data path for lithography apparatus |
-
2024
- 2024-04-16 TW TW113114060A patent/TW202509978A/zh unknown
- 2024-04-17 WO PCT/EP2024/060454 patent/WO2024231062A1/en active Pending
- 2024-04-17 CN CN202480030136.9A patent/CN121039773A/zh active Pending
- 2024-04-17 KR KR1020257037206A patent/KR20260003700A/ko active Pending
-
2025
- 2025-10-12 IL IL323914A patent/IL323914A/he unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024231062A1 (en) | 2024-11-14 |
| CN121039773A (zh) | 2025-11-28 |
| KR20260003700A (ko) | 2026-01-07 |
| TW202509978A (zh) | 2025-03-01 |
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