IL320409A - Method and apparatus for inspection focus measurement - Google Patents

Method and apparatus for inspection focus measurement

Info

Publication number
IL320409A
IL320409A IL320409A IL32040925A IL320409A IL 320409 A IL320409 A IL 320409A IL 320409 A IL320409 A IL 320409A IL 32040925 A IL32040925 A IL 32040925A IL 320409 A IL320409 A IL 320409A
Authority
IL
Israel
Prior art keywords
focus measurement
inspection focus
inspection
measurement
focus
Prior art date
Application number
IL320409A
Other languages
Hebrew (he)
Inventor
Torres Raul Andres Guevara
Gregory Warren Jenkins
Original Assignee
Asml Netherlands Bv
Torres Raul Andres Guevara
Gregory Warren Jenkins
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Torres Raul Andres Guevara, Gregory Warren Jenkins filed Critical Asml Netherlands Bv
Publication of IL320409A publication Critical patent/IL320409A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706851—Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IL320409A 2022-11-07 2023-10-20 Method and apparatus for inspection focus measurement IL320409A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202263423214P 2022-11-07 2022-11-07
PCT/EP2023/079327 WO2024099740A1 (en) 2022-11-07 2023-10-20 Method and apparatus for inspection focus measurement

Publications (1)

Publication Number Publication Date
IL320409A true IL320409A (en) 2025-06-01

Family

ID=88517418

Family Applications (1)

Application Number Title Priority Date Filing Date
IL320409A IL320409A (en) 2022-11-07 2023-10-20 Method and apparatus for inspection focus measurement

Country Status (3)

Country Link
CN (1) CN120077332A (en)
IL (1) IL320409A (en)
WO (1) WO2024099740A1 (en)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG108975A1 (en) 2003-07-11 2005-02-28 Asml Netherlands Bv Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7723657B2 (en) * 2007-11-16 2010-05-25 Mitutoyo Corporation Focus detection apparatus having extended detection range
NL2010717A (en) 2012-05-21 2013-11-25 Asml Netherlands Bv Determining a structural parameter and correcting an asymmetry property.
WO2017102428A1 (en) * 2015-12-18 2017-06-22 Asml Netherlands B.V. Focus monitoring arrangement and inspection apparatus including such an arrangement
US10146041B1 (en) * 2018-05-01 2018-12-04 Nanotronics Imaging, Inc. Systems, devices and methods for automatic microscope focus
CN110657953B (en) * 2018-06-29 2022-02-18 上海微电子装备（集团）股份有限公司 Focal length measuring system and method, focusing system and method and photoetching device
DE102019004337B4 (en) * 2019-06-21 2024-03-21 Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Optical system and beam analysis method

Also Published As

Publication number Publication date
WO2024099740A1 (en) 2024-05-16
CN120077332A (en) 2025-05-30

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