IL308043A - התקן אופטי של חלקיקים טעונים, מכלול עדשות אובייקטיביות, גלאי, מערך גלאים ושיטות - Google Patents
התקן אופטי של חלקיקים טעונים, מכלול עדשות אובייקטיביות, גלאי, מערך גלאים ושיטותInfo
- Publication number
- IL308043A IL308043A IL308043A IL30804323A IL308043A IL 308043 A IL308043 A IL 308043A IL 308043 A IL308043 A IL 308043A IL 30804323 A IL30804323 A IL 30804323A IL 308043 A IL308043 A IL 308043A
- Authority
- IL
- Israel
- Prior art keywords
- detector
- methods
- objective lens
- optical device
- charged particle
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21174519.5A EP4092712A1 (en) | 2021-05-18 | 2021-05-18 | Charged particle optical device and method using it |
| PCT/EP2022/060460 WO2022242978A1 (en) | 2021-05-18 | 2022-04-20 | Charged particle optical device, objective lens assembly, detector, detector array, and methods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL308043A true IL308043A (he) | 2023-12-01 |
Family
ID=76011720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL308043A IL308043A (he) | 2021-05-18 | 2022-04-20 | התקן אופטי של חלקיקים טעונים, מכלול עדשות אובייקטיביות, גלאי, מערך גלאים ושיטות |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240087844A1 (he) |
| EP (2) | EP4092712A1 (he) |
| KR (1) | KR20240008858A (he) |
| CN (1) | CN117321724A (he) |
| IL (1) | IL308043A (he) |
| TW (2) | TWI824518B (he) |
| WO (1) | WO2022242978A1 (he) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024501654A (ja) * | 2020-12-23 | 2024-01-15 | エーエスエムエル ネザーランズ ビー．ブイ． | 荷電粒子光学デバイス |
| EP4576158A1 (en) * | 2023-12-18 | 2025-06-25 | ASML Netherlands B.V. | Charged particle-optical module, charged particle-optical device, and a method of using a charged-particle apparatus |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| WO2008010777A1 (en) * | 2006-07-21 | 2008-01-24 | National University Of Singapore | A multi-beam ion/electron spectra-microscope |
| KR101649106B1 (ko) | 2008-10-01 | 2016-08-19 | 마퍼 리쏘그라피 아이피 비.브이. | 정전기 렌즈 구조 |
| NL1036912C2 (en) | 2009-04-29 | 2010-11-01 | Mapper Lithography Ip Bv | Charged particle optical system comprising an electrostatic deflector. |
| TWI497557B (zh) | 2009-04-29 | 2015-08-21 | Mapper Lithography Ip Bv | 包含靜電偏轉器的帶電粒子光學系統 |
| NL2007604C2 (en) | 2011-10-14 | 2013-05-01 | Mapper Lithography Ip Bv | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams. |
| NL2006868C2 (en) * | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
| US10176965B1 (en) * | 2017-07-05 | 2019-01-08 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets |
| US10504687B2 (en) | 2018-02-20 | 2019-12-10 | Technische Universiteit Delft | Signal separator for a multi-beam charged particle inspection apparatus |
| US10395887B1 (en) | 2018-02-20 | 2019-08-27 | Technische Universiteit Delft | Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column |
| JP7057220B2 (ja) * | 2018-05-24 | 2022-04-19 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法 |
| US10748739B2 (en) | 2018-10-12 | 2020-08-18 | Kla-Tencor Corporation | Deflection array apparatus for multi-electron beam system |
| US10978270B2 (en) | 2018-12-19 | 2021-04-13 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device, interchangeable multi-aperture arrangement for a charged particle beam device, and method for operating a charged particle beam device |
| IL286292B2 (he) * | 2019-03-29 | 2026-03-01 | Asml Netherlands Bv | מכשיר לבדיקת רב קרן עם מצב קרן אחת |
-
2021
- 2021-05-18 EP EP21174519.5A patent/EP4092712A1/en not_active Withdrawn
-
2022
- 2022-04-20 EP EP22723452.3A patent/EP4341979B1/en active Active
- 2022-04-20 WO PCT/EP2022/060460 patent/WO2022242978A1/en not_active Ceased
- 2022-04-20 IL IL308043A patent/IL308043A/he unknown
- 2022-04-20 KR KR1020237039420A patent/KR20240008858A/ko active Pending
- 2022-04-20 CN CN202280035715.3A patent/CN117321724A/zh active Pending
- 2022-05-13 TW TW111117996A patent/TWI824518B/zh active
- 2022-05-13 TW TW112142637A patent/TW202410104A/zh unknown
-
2023
- 2023-11-17 US US18/513,481 patent/US20240087844A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TWI824518B (zh) | 2023-12-01 |
| US20240087844A1 (en) | 2024-03-14 |
| EP4341979A1 (en) | 2024-03-27 |
| CN117321724A (zh) | 2023-12-29 |
| TW202249052A (zh) | 2022-12-16 |
| WO2022242978A1 (en) | 2022-11-24 |
| TW202410104A (zh) | 2024-03-01 |
| KR20240008858A (ko) | 2024-01-19 |
| EP4092712A1 (en) | 2022-11-23 |
| EP4341979B1 (en) | 2025-11-05 |
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