IL260830A - Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its peripheral surface - Google Patents

Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its peripheral surface

Info

Publication number
IL260830A
IL260830A IL260830A IL26083018A IL260830A IL 260830 A IL260830 A IL 260830A IL 260830 A IL260830 A IL 260830A IL 26083018 A IL26083018 A IL 26083018A IL 260830 A IL260830 A IL 260830A
Authority
IL
Israel
Prior art keywords
optical element
peripheral surface
planar optical
retaining lugs
wavefront
Prior art date
Application number
IL260830A
Other languages
Hebrew (he)
Other versions
IL260830B (en
Inventor
Erbe Torsten
Original Assignee
Jenoptik Optical Sys Gmbh
Erbe Torsten
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenoptik Optical Sys Gmbh, Erbe Torsten filed Critical Jenoptik Optical Sys Gmbh
Publication of IL260830A publication Critical patent/IL260830A/en
Publication of IL260830B publication Critical patent/IL260830B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Description

1 Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its peripheral surface The invention relates to a device comprising a planar optical element and an actuating and holding means, in which the planar optical element is held and its optically effective surface is actively deformable by actuation of actuating elements of the actuating and holding means. Using such a device, an impinging beam can be influenced so as to compensate for imaging errors (aberrations) of the beam, which are caused by one or more optical elements of an optical system and which can be detected, on the whole, as wavefront errors.
Wavefront errors can be described and represented mathematically, for instance, by the so-called Zernike polynomials. They are detectable, for example, by wavefront aberrometers. In this case, the wavefront errors may be caused by individual imaging errors or by superposition of different imaging errors of single or multiple optical elements of an optical system. In many cases, individual optical elements have a dominant influence on the relevant imaging errors of an optical system, and the wavefront deformation caused thereby has a typical appearance, which can be countered by active deformation of the surface of one of the optical elements or, for example, of a mirror additionally arranged in the system for this purpose.
In order to counter imaging errors, a large number of solutions are known from the prior art which use active surface deformation of a planar optical element, usually a mirror.
They differ substantially in the location where an actuating means acts on the planar optical element and where, accordingly, forces are applied into the planar optical element. In some of these solutions, forces are applied on the peripheral surface of the planar optical element or in the edge region adjacent to the peripheral surface. Only such solutions will be considered below.
Using a correction device in accordance with US 2012/0275041 A1, an imaging error of known evolution can be corrected within an optical instrument. For this purpose, a deformable mirror is introduced into the optical path of the arrangement, along which beams of electromagnetic radiation propagate. Forces are applied to the peripheral edge of the deformable mirror and introduced into the mirror such that the latter is deformed as a function of its contour as well as the location of force introduction and the 18.07.2018 S002-12606-IL 2 vectors (amount, direction) of the forces introduced. The deformation of the mirror caused thereby and the resulting local change in the reflection behavior, as a consequence of optical path differences, enable correction of any wavefront errors occurring.
Specifically, the aforementioned US 2012/0275041 A1 proposes to select the contour of the mirror as a function of the imaging error to be corrected, e.g. round so as to correct the focus position, or elliptical so as to correct the focus position and astigmatism.
Despite the same forces acting on the perimeter, this allows locally differing flexing moments to be applied to the surface, depending on the distance of the force application from the center of the mirror. It is proposed therein that, as a means of force application, an intermediate plate having the same contour as the mirror be connected to the peripheral edge of the mirror by a ring and that a force be introduced centrally into the intermediate plate, e.g. by means of a piezo actuator, said force then acting on the periphery of the mirror. In order to differentiate the force effect along the periphery of the mirror, it is proposed to design the intermediate plate differentially in thickness or/and to introduce the forces eccentrically into the intermediate plate. This solution allows different flexing moments to be generated in the mirror along the periphery. However, the ratio of the flexing moments with respect to each other is predetermined by the design of the contour of the mirror and is thus no longer variable.
US 7,229,178 B1 discloses a deformable mirror whose circular or oval mirror plate can be bent parabolically via an internal (smaller) and an external (larger) annular support.
For this purpose, the mirror is placed between the annular support. The required force is introduced by a mechanical actuating element. The actuating element acts directly or indirectly, via a lever, on the annular supports. Force introduction via the level and parallel annular supports is always effected centrally with respect to the axis of symmetry of the mirror. This merely allows the parameters of a paraboloid surface to be influenced. Again, no locally differentiated application of force is possible.
In a device known from DE 601 16 322 322 T2, aberrations are also compensated for by application of force onto a mirror. For the application of force, there are provided at least one active actuating element and two so-called force transmission rods. The force transmission rods each have their ends connected to the mirror via a respective deformation element, thereby applying the same force into the mirror at different points. 18.07.2018 S002-12606-IL 3 A differentiated application of force at different points is not possible.
DE 196 28 672 C2 discloses a mirror comprising a deformable mirror plate held by its edge as well as comprising an actuating mechanism acting on the rear surface of the mirror plate, said actuating mechanism comprising a plurality of springs connected in parallel, which act on the rear surface of the mirror plate, and comprising an actuating means for adjustment of the spring force. In this case, a force is applied into the center of the mirror and into eccentric points of action which are arranged in radially opposite pairs. The introduction of force can be adjusted only jointly for all points of action.
DE 10 2007 010 906 A1 proposes a device with an actuating means, comprising at least one main actuator which acts on the peripheral surface of an optical element. In one embodiment, a bending moment is introduced into the optical element, with the axis of the bending moment being perpendicular to the optical axis and perpendicular to a radial direction. In the case of only one main actuator, the optical element is fixed on the opposite side in the axial direction. Advantageously, main actuators are provided on two opposite sides with respect to the optical axis, each of said main actuators introducing a respective bending moment into the optical element. As a main actuator, an electrodynamic drive is proposed. In particular, an electromagnetic plunger coil drive is supposed to be suitable to introduce high forces with great accuracy of repetition and great positioning accuracy so as to bend the optical element in a very accurate and reproducible manner. The device is suitable, in particular for dynamic correction of wavefront errors, for example those of a holographic projection device, and are not suitable for static correction.
US 3 601 343 A discloses a mount for strain-free support of an element with an expansion coefficient that differs from that of the mount. The mount consists of a rigid annular body having a plurality of flexible support arms formed thereon in an axial direction of the mount, which grip the element to be supported at their free ends. The mount merely allows a radial movement and thus unhindered, different expansion of the mount and the element in a radial direction.
DE 198 27 603 A1 discloses, in connection with a projection lighting system of microlithography, a mount in which an optical element is arranged, and actuators which act on the optical element perpendicular to the optical axis. The actuators are designed 18.07.2018 S002-12606-IL 4 to cause flexing of the optical element without substantial changes in thickness.
DE 10 2012 209 309 A1 discloses a lithography system comprising at least one mirror assembly. A mirror assembly of lithography systems comprises mirrors with a large diameter, which makes low-deformation support and actuation difficult. According to the aforementioned DE 10 2012 209 309 A1, the mirror is formed from a mirror substrate, whose front surface is provided with a reflective surface, and an annular side wall, said mirror substrate and said side wall limiting a hollow space, resulting in the mirror having a comparatively low weight. The mirror is supported, actively or passively, on a structural element of the lithography system by a plurality of supporting elements via the side wall. This results in deformation being uncoupled to a large extent to the reflective surface of the mirror.
It is the object of the invention to find a device comprising a deformable planar optical element to compensate for aberrations, said device allowing locally differentiated and very precise application of force on the peripheral surface of the planar optical element.
The object is achieved by a device as claimed in claim 1.
Advantageous embodiments are indicated in subclaims 2 to 7 which refer back to claim 1.
It is essential to the invention that at least three retaining lugs are fixed to the planar optical element to be deformed, which are distributed over the peripheral surface. By bending at least one of the retaining lugs perpendicular to its longitudinal axis and, thus, perpendicular to the axis of symmetry of the planar optical element, after mounting the device, a force is applied into the planar optical element, in the direction of the axis of symmetry toward the support on the peripheral surface of the planar optical element.
One force may be applied by all retaining lugs if the planar optical element is centrally supported on a supporting surface of the support so that the support acts as an abutment.
If the planar optical element is not a mirror but a transparent planar plate, it cannot be centrally supported by a supporting surface; therefore, in this case, the function of the abutment is assumed by at least one of the retaining lugs. Said retaining lug is then either not bent when producing the desired deformation of the planar optical element, so 18.07.2018 S002-12606-IL 5 that said retaining lug, due to its stiffness, generates a counterforce on the peripheral surface, in the direction of the longitudinal axis, or it was pre-stressed before being mounted, so that an increased counterforce can be generated by reducing the pre- stress. In this case, a displacement or tilt is accepted which, although not a deformation, has an effect on the image, which may be additionally compensated for, if necessary, by the deformation.
The invention will be explained in more detail below with reference to exemplary embodiments and drawings. In the Figures: Fig. 1a shows a first schematic diagram of a device comprising a mirror in a sectional view; Fig. 1b shows a device according to Fig. 1a in a perspective view; Fig. 1c shows a schematic diagram of a retaining lug; Fig. 1d shows a mounted retaining lug in a relaxed state; Fig. 1e shows a mounted retaining lug in a stressed state; Fig. 2a shows a second schematic diagram of a device comprising a planar plate in a sectional view; Fig. 2b shows a device according to Fig. 2a in a perspective view; Figs. 3a – 3d show various advantageous distributions of the retaining lugs on the peripheral surface of the planar optical element; Figs. 4a – 4f: show various advantageous embodiments of the first end of the retaining lugs; Fig. 5a shows a particularly advantageous embodiment of a retaining lug; Fig. 5b shows a mounted retaining lug according to Fig. 5a in a relaxed state, and Fig. 5c shows a mounted retaining lug according to Fig. 5a in a stressed state.
Figs. 1a and 1b as well as Figs. 2a and 2b schematically show two embodiments of a 18.07.2018 S002-12606-IL 6 device for variably influencing the wavefront of a beam. They differ in that, in the embodiment of Fig. 1a, the device includes a mirror as a reflecting planar optical element 1, and in the embodiment of Fig. 2a, the device includes a planar plate as a transmitting planar optical element 1. The reflecting or the transmitting planar optical element 1 is actively deformed in the device, thereby actively influencing the wavefront of an impinging beam.
The planar optical element 1 has an axis of symmetry A, a front surface 1.1, a rear surface 1.2 and a cylindrical peripheral surface 1.3.
In addition to the planar optical element 1, the device comprises an actuating and holding means 2, which is arranged coaxially with respect to the planar optical element 1 and includes a support 2.1, a socket assembly 2.2 and at least three elastic retaining lugs 2.3. The support 2.1 and the socket assembly 2.2 have a common axis of symmetry B, which coincides with the axis of symmetry A of the planar optical element 1, and are firmly connected to each other. The connection may be established by a releasable connection, as shown, or by a non-releasable cohesive connection.
The support 2.1 comprises a first cylindrical peripheral surface 2.1.1 and a second peripheral surface 2.1.2. Between the first and the second cylindrical peripheral surfaces 2.1.1, 2.1.2, there is a recess 2.1.0 with respect to which the first and the second cylindrical peripheral surfaces 2.1.1, 2.1.2 are raised and whose width corresponds to a perpendicular distance a of the first and second cylindrical peripheral surfaces 2.1.1, 2.1.2 from each other. The diameter of the peripheral surface 1.3 of the planar optical element 1 and the diameter of the first and second cylindrical peripheral surfaces 2.1.1, 2.1.2 are equal.
As shown in Fig. 1c, the at least three elastic retaining lugs 2.3 each have a longitudinal axis 2.3.0, which is parallel to the joint axis of symmetry B, and they are firmly attached, respectively, to the peripheral surface 1.3 by a first end 2.3.1 and to the second cylindrical peripheral surface 2.1.2 by a second end 2.3.2. They each contact the first peripheral surface 2.1.1.
Figs. 1a – 1e and Figs. 2a and 2b apply to all conceivable embodiments of the retaining lugs 2.3. The design of the retaining lugs 2.3, their arrangement and the nature of the connection to the peripheral surface 1.3 of the planar optical element 1 via the first end 18.07.2018 S002-12606-IL 7 2.3.1 as well as to the support 2.1 via the second end 2.3.2 are only shown here by way of example and may specifically deviate therefrom in multiple ways, as well as being combined with each other in whatever manner, as will be explained later.
The socket assembly 2.2 is arranged around the support 2.1 and firmly connected to the latter. Both parts may also be connected to each other monolithically.
In the socket assembly 2.2, there is arranged at least one actuating element 2.4 which is assigned to one of the at least three elastic retaining lugs 2.3. The translational adjustment of the actuating element 2.4, which acts in a perpendicular direction on the surface of the retaining lug 2.3, causes the retaining lug 2.3 to be bent perpendicular to its longitudinal axis 2.3.0. This allows the retaining lug 2.3 to be both pre-stressed prior to mounting and increasingly relaxed after mounting for the purpose of deforming the planar optical element 1, as well as to be mounted stress-free and be relaxed after mounting in order to deform the planar optical element 1. Fig. 1d shows a stress-free retaining lug 2.3 and Fig. 1e shows a retaining lug 2.3 in a stressed state. If the retaining lug 2.3 is a simple leaf spring with a constant rectangular cross-section over its length, the actuating element 2.4 will preferably act on the retaining lug 2.3 centrally above the recess 2.1.0.
The actuating element 2.4 has a direction of action RE, radial to the joint axis of symmetry B, along which an actuating force or a travel, respectively, is applied radially with respect to the joint axis of symmetry B into the retaining lug 2.3, so that the latter bends perpendicularly to its longitudinal axis 2.3.0. The retaining lug 2.3 does not bend over its entire length along the longitudinal axis 2.3.0 between the firm connections at the first end 2.3.1 and second end 2.3.2, but only over a length equal to the distance a, because it is unfree due to the contact with the first peripheral surface 2.1.1 in the direction of action RE. A difference s between the length of a bending line BL forming for the retaining lug 2.3 above the distance a and the distance a corresponds to the distance by which the first end 2.3.1 of the retaining lug 2.3 is drawn toward the support 2.1 in the case of stress-free mounting, and a force relevant thereto acts on the peripheral surface 1.3 of the planar optical element 1 in a direction of action RA. The direction of action R is parallel to the axis of symmetry A of the planar optical element A 1. In the case of pre-stress, the direction of action RE changes its directionality if the pre-stress is reduced by adjustment of the actuating element 2.4. 18.07.2018 S002-12606-IL 8 With respect to the foregoing description, the embodiments according to Fig. 1a and Fig. 2a do not differ.
If a mirror is advantageously used as the planar optical element 1, as shown in Fig. 1a, the rear surface 1.2, which has no optical effect, may be used otherwise. Accordingly, a raised supporting surface 2.1.3 is provided on the support 2.1 on which the planar optical element 1 is centrally supported by its rear surface 1.2 on the support 2.1, so that the latter forms an abutment for forces introduced via the retaining lugs 2.3.
Advantagesously, this allows all retaining lugs 2.3 to be used in order to apply the same forces or forces of different magnitudes into the planar optical element 1. Some or all of the retaining lugs 2.3 could be mounted stress-free or pre-stressed. If all retaining lugs 2.3 are mounted stress-free or under pre-stress, the forces applied into the retaining lugs 2.3 all have the same sign. Otherwise, forces may be applied in opposite directions into the retaining lugs 2.3 and, correspondingly, into the planar optical element 1.
Retaining lugs 2.3 into which no forces are applied act as an additional abutment due to their stiffness in the direction of their longitudinal axis 2.3.0 which is not bent. Depending on how an expected deformation of the planar optical element 1 is to be possible, the retaining lugs 2.3 are mounted either in a pre-stressed or a relaxed condition, dimensioned and mounted on the peripheral surface 1.3 of the planar optical element 1 with respect to each other in number and arrangement.
If a transparent planar plate is advantageously used as the planar optical element 1, as shown in Fig. 2a , the support 2.1 has a breakthrough 2.1.4 which does not limit a beam guided through the planar plate. At least one of the retaining lugs 2.3 must then act as an abutment for forces introduced via other ones of the retaining lugs 2.3, so that the application of force via the other retaining lugs 2.3 does not turn into an axial displacement but causes bending of the planar optical element 1. Assigning an actuating element 2.4 to each of the retaining lugs 2.3 allows a choice to be made as to which of the retaining lugs 2.3 are used for force introduction and which of the retaining lugs 2.3 are used to act as an abutment, respectively. In this case, the retaining lugs 2.3 may also be mounted either stress-free or pre-stressed.
As shown in Fig. 2a, the transparent planar plate - which may also apply to a planar mirror - has a stepped edge region 1.4 extending circumferentially on both sides. This edge region 1.4 may also be formed on only one side. The transparent planar plate or 18.07.2018 S002-12606-IL 9 planar mirror, respectively, thus has a reduced thickness along said stepped edge region 1.4, which increases its flexural sensitivity.
Advantageous embodiments of the arrangement of the retaining lugs 2.3 on the peripheral surface 1.3 of the planar optical element 1 are shown in Figs. 3a – 3d. They are preferably arranged individually or distributed in symmetrical pairs on the peripheral surface 1.3. The thin lines shown on the surface of the planar optical element 1 represent lines of the same height and are intended to show examples, by approximation, of the possibilities of differently bent surfaces as a function of the arrangement of the retaining lugs 2.3. The retaining lugs 2.3 represented in black here act as abutments, while the retaining lugs 2.3 shown in white serve to apply forces into the planar plate which all act in one direction, i.e. not in opposite directions, in the examples shown.
Figs. 4a – 4f show various advantageous embodiments of the first and second ends 2.3.1, 2.3.2 of the retaining lug 2.3. They differ, in particular, in their torsion resistance and their tangential elasticity as well as in the force distribution on the peripheral surface 1.3 of the planar optical element 1. The first end 2.3.1 is preferably glued to the peripheral surface 1.3 of the planar optical element 1.
The second end 2.3.2 of the retaining lugs 2.3 may also be mounted cohesively, but also e.g. in a force-fitting manner, between the support 2.1 and the socket assembly 2.2. Moreover, the retaining lugs 2.3 are advantageously worked out of a sheet metal and connected in groups or all connected each other monolithically at their second ends 2.3.2.
As actuating elements 2.4, mechanical actuating elements, such as adjusting screws, or electromechanical actuating elements, such as piezo elements, may be used, by which a force is applied to a retaining lug 2.3 via a translational adjustment travel so as to stress said retaining lug 2.3 between its fixed first and second ends 2.3.1, 2.3.2.
Generally, conventional leaf springs with a constant rectangular cross-section over their length, such as those shown in Figs. 1a and 1b, may be used as retaining lugs 2.3.
However, they may also have other cross-sections over their length (not shown in the drawings), for instance varying in thickness or width along their length. 18.07.2018 S002-12606-IL 10 A retaining lug 2.3 as shown in Figs. 5a - 5c and as described below is used as particularly advantageous.
This embodiment of the retaining lug 2.3 is divided by separation cuts and/or cutouts into a leaf spring frame 2.3.3 and a framed leaf spring tongue 2.3.4. Advantageously, the leaf spring frame 2.3.3 and the leaf spring tongue 2.3.4 are symmetrical with respect to the longitudinal axis 2.3.0.
The first end 2.3.1 and the second end 2.3.2 of the retaining lug 2.3 are formed on the leaf spring frame 2.3.3.
The leaf spring tongue 2.3.4 is monolithically connected to the leaf spring frame 2.3.3 by a fixed tongue end 2.3.4.1, which faces the first end 2.3.1 and is spaced apart from the latter. On the opposite side, the leaf spring tongue 2.3.4 has a free tongue end 2.3.4.2, which faces the second end 2.3.2. The actuating element 2.4 acts in its direction of action R on the free tongue end 2.3.4.2. The retaining lug 2.3 contacts the first E peripheral surface 2.1.1 by the leaf spring frame 2.3.3 and is pressed against it when a force is applied onto the retaining lug 2.3 via the actuating element 2.4, so that the second end 2.3.2 is guided in the direction of action RA of the planar optical element 1.
The nested design of the leaf spring tongue 2.3.4 within the leaf spring frame 2.3.3 has the particular advantage for this embodiment of the retaining lug 2.3 that a desired transmission ratio between the applied adjustment travel of the actuating element 2.4 or a correspondingly introduced force, respectively, and the force acting on the peripheral surface 1.3 of the planar optical element 1 can be adjusted without having to adapt the external dimensions of the retaining lug 2.3 for this purpose. 18.07.2018 S002-12606-IL 11 List of reference numerals 1 planar optical element 1.1 front surface 1.2 rear surface 1.3 peripheral surface (of the planar optical element 1) 1.4 stepped edge region 2 actuating and holding means 2.1 support 2.1.0 recess 2.1.1 first peripheral surface 2.1.2 second peripheral surface 2.1.3 supporting surface 2.1.4 breakthrough 2.2 socket assembly 2.3 retaining lug 2.3.0 longitudinal axis 2.3.1 first end 2.3.2 second end 2.3.3 leaf spring frame 2.3.4 leaf spring tongue 2.3.4.1 fixed tongue end 2.3.4.2 free tongue end 2.4 actuating element A axis of symmetry (of the planar optical element 1) B joint axis of symmetry (of the support 2.1 and the socket assembly 2.2) a distance RE direction of action of the actuating element 2.4 RA direction of action of the retaining lugs 2.3 on the planar optical element 1 s difference BL bending line 18.07.2018 S002-12606-IL

Claims (7)

Claims
1. A device for variably influencing the wavefront of a beam, said device comprising a reflecting or transmitting planar optical element (1), which has a front surface (1.1), a rear surface (1.2) and a cylindrical peripheral surface (1.3) around an axis of symmetry (A), and further comprising an actuating and holding means (2), characterized in that the actuating and holding means (2), which is arranged coaxially with respect to the planar optical element (1) and includes a support (2.1) and a socket assembly (2.2) with a joint axis of symmetry (B), and at least three elastic retaining lugs (2.3), wherein the support (2.1) comprises a first cylindrical peripheral surface (2.1.1) and a second peripheral surface (2.1.2), which are arranged at a perpendicular distance (a) from each other, limiting a recess (2.1.0), as well as having a same diameter as the peripheral surface (1.3) of the planar optical element (1), the socket assembly (2.2) is arranged around the support (2.1) and firmly connected to the latter, the at least three elastic retaining lugs (2.3) each have a longitudinal axis (2.3.0), which is parallel to the joint axis of symmetry (B), and they are firmly attached, respectively, by a first end (2.3.1) to the peripheral surface (1.3) and by a second end (2.3.2) to the second cylindrical peripheral surface (2.1.2) and contact the first peripheral surface (2.1.1), and at least one of the at least three elastic retaining lugs (2.3) has an actuating element (2.4) assigned to it, which is arranged in the socket assembly (2.2) and by means of which the assigned retaining lug (2.3) can be bent over a length equal to the distance (a) perpendicular to its longitudinal axis (2.3.0).
2. The device for variably influencing the wavefront of a beam according to claim 1, characterized in that the planar optical element (1) is a mirror and a raised supporting surface (2.1.3) is provided on the support (2.1), on which supporting surface (2.1.3) the planar optical element (1) is centrally supported by its rear surface (1.2) on the support (2.1), so that the latter forms an abutment for forces introduced via the retaining lugs (2.3). 18.07.2018 S002-12606-IL
3. The device for variably influencing the wavefront of a beam according to claim 1, characterized in that the planar optical element (1) is a transparent planar plate and the support (2.1) has a breakthrough (2.1.4) which does not limit a beam guided through the planar plate, and wherein at least one of the retaining lugs (2.3) acts as an abutment for forces introduced via other ones of the retaining lugs (2.3).
4. The device for variably influencing the wavefront of a beam according to claim 1, characterized in that at least one of the at least three elastic retaining lugs (2.3) is pre-stressed.
5. The device for variably influencing the wavefront of a beam according to claim 1, characterized in that the at least three elastic retaining lugs (2.3) are arranged axially symmetric to the joint axis of symmetry (B).
6. The device for variably influencing the wavefront of a beam according to claim 1, characterized in that the retaining lugs (2.3) are each divided by separation cuts and/or cutouts into a leaf spring frame (2.3.3) and a framed leaf spring tongue (2.3.4), wherein the first end (2.3.1) and the second end (2.3.2) of the retaining lug (2.3) are formed on the leaf spring frame (2.3.3) and the latter contacts the first peripheral surface (2.1.1), the leaf spring tongue (2.3.4) is monolithically connected to the leaf spring frame (2.3.3) by a fixed tongue end (2.3.4.1), which faces the first end (2.3.1) and is spaced apart from the latter, and the assigned actuating element (2.4) acts on a free tongue end (2.3.4.2).
7. The device for variably influencing the wavefront of a beam according to claim 1, characterized in that the planar optical element (1) comprises an edge region (1.4) which is stepped on one or both sides. 18.07.2018 S002-12606-IL
IL260830A 2017-08-02 2018-07-29 Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its peripheral surface IL260830B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102017117468.0A DE102017117468B3 (en) 2017-08-02 2017-08-02 Device for variably influencing the wavefront of a beam with a plano-optic deformable over its peripheral surface

Publications (2)

Publication Number Publication Date
IL260830A true IL260830A (en) 2019-01-31
IL260830B IL260830B (en) 2020-05-31

Family

ID=63372056

Family Applications (1)

Application Number Title Priority Date Filing Date
IL260830A IL260830B (en) 2017-08-02 2018-07-29 Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its peripheral surface

Country Status (4)

Country Link
US (1) US10775615B2 (en)
CN (1) CN109387917B (en)
DE (1) DE102017117468B3 (en)
IL (1) IL260830B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018116570B3 (en) * 2017-08-02 2018-10-18 Jenoptik Optical Systems Gmbh Device for variably influencing the wavefront of a beam with a plane optic deformable over its rear side
DE102019208980A1 (en) * 2019-06-19 2020-12-24 Carl Zeiss Smt Gmbh OPTICAL SYSTEM, OPTICAL ARRANGEMENT AND LITHOGRAPH SYSTEM
CN112068307B (en) * 2020-09-21 2021-12-07 中国科学院长春光学精密机械与物理研究所 Hybrid thermally-driven wavefront correction device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3601343A (en) 1969-09-05 1971-08-24 North American Rockwell Strain-free mount
WO1993025929A1 (en) * 1992-06-08 1993-12-23 United Technologies Corporation Coaxial integrated deformable mirror actuator/retraction arrangement
DE19628672C2 (en) 1996-07-16 1999-07-29 Precitec Gmbh Deformable mirror
DE19827603A1 (en) 1998-06-20 1999-12-23 Zeiss Carl Fa Projection light exposure system for microlithography
US6262853B1 (en) * 1998-12-25 2001-07-17 Olympus Optical Co., Ltd. Lens barrel having deformable member
US6411426B1 (en) 2000-04-25 2002-06-25 Asml, Us, Inc. Apparatus, system, and method for active compensation of aberrations in an optical system
US7646544B2 (en) * 2005-05-14 2010-01-12 Batchko Robert G Fluidic optical devices
DE10135806A1 (en) * 2001-07-23 2003-02-13 Zeiss Carl Mirror device for reflection of electromagnetic radiation with expansion sensor formed in semiconductor layer of mirror body
US7697222B2 (en) * 2003-12-25 2010-04-13 Nikon Corporation Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
JP2006113414A (en) * 2004-10-18 2006-04-27 Canon Inc Optical element holding apparatus, lens barrel, exposure apparatus, and method for manufacturing micro device
US7229178B1 (en) 2004-12-20 2007-06-12 Sandia Corporation Variable focal length deformable mirror
DE102007010906A1 (en) 2007-03-05 2008-09-11 Seereal Technologies S.A. Imaging device for influencing incident light
CN102375200B (en) * 2010-08-18 2013-12-18 上海微电子装备有限公司 Radial adjusting device of adjustable optical element
FR2974425B1 (en) 2011-04-19 2014-06-27 Centre Nat Etd Spatiales DEVICE FOR CORRECTING AT LEAST ONE EVOLUTION ABERRATION KNOWN TO DEFORMABLE MIRROR
FR2980278B1 (en) * 2011-09-16 2014-05-02 Thales Sa MIRROR COMPRISING MECHANICAL MEANS FOR GENERATING PRIMARY GEOMETRIC ABERRATIONS
DE102012209309A1 (en) 2012-06-01 2013-12-05 Carl Zeiss Smt Gmbh Lithographic apparatus and method for producing a mirror assembly
CN205080349U (en) * 2015-10-20 2016-03-09 南昌欧菲光电技术有限公司 Camera module

Also Published As

Publication number Publication date
DE102017117468B3 (en) 2018-09-20
IL260830B (en) 2020-05-31
CN109387917A (en) 2019-02-26
CN109387917B (en) 2021-11-09
US20190041632A1 (en) 2019-02-07
US10775615B2 (en) 2020-09-15

Similar Documents

Publication Publication Date Title
US10775615B2 (en) Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its peripheral surface
KR100591306B1 (en) Optical System, in Particular Projection exposure system for microlithography
JP4809987B2 (en) Support structure for optical element, exposure apparatus using the same, and method for manufacturing semiconductor device
TW518428B (en) Optical system, in particular projection-illumination unit used in microlithography
US6859337B2 (en) Optical-element mountings exhibiting reduced deformation of optical elements held thereby
US7193794B2 (en) Adjustment arrangement of an optical element
US4655563A (en) Variable thickness deformable mirror
US6398373B1 (en) Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
US20090207511A1 (en) Assembly for adjusting an optical element
US20100060973A1 (en) Imaging Device for Influencing Incident Light
JP2009080467A (en) Imaging device for influencing impinging light
WO2007010011A2 (en) Optical element module
CN106104360A (en) For compensating the adjustable deformable mirror of the scrambling of beam
KR20140124325A (en) Mirror unit and exposure apparatus
CN105324721A (en) EUV imaging apparatus
JP2000009980A (en) Lens barrel and projection aligner using the same
JP5168507B2 (en) Optical element holding mechanism, optical system barrel, and exposure apparatus
US8876306B2 (en) Mirror comprising mechanical means for generating primary geometrical aberrations
US8279398B2 (en) Deforming mechanism, exposure apparatus, and device manufacturing method
WO2023135994A1 (en) Shape-changeable mirror, laser processing device, and method for manufacturing shape-changeable mirror
US10634902B2 (en) Device for variably influencing the wavefront of a beam, said device comprising a planar optical element deformable via its rear surface
JP6929024B2 (en) Manufacturing method of optical equipment, exposure equipment and articles
JP2011145688A (en) Supporting structure of optical element, exposure apparatus using the same, and manufacturing method of semiconductor device
CN114341736A (en) Field facet system, optical arrangement and lithographic apparatus
CN110703406A (en) Optical remote sensor for compensating optical system misadjustment by using structural deformation

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed