IL258195B - System and method for monitoring status of target - Google Patents

System and method for monitoring status of target

Info

Publication number
IL258195B
IL258195B IL258195A IL25819518A IL258195B IL 258195 B IL258195 B IL 258195B IL 258195 A IL258195 A IL 258195A IL 25819518 A IL25819518 A IL 25819518A IL 258195 B IL258195 B IL 258195B
Authority
IL
Israel
Prior art keywords
target
monitoring status
status
monitoring
Prior art date
Application number
IL258195A
Other languages
Hebrew (he)
Other versions
IL258195A (en
Inventor
Simkhovich Boris
Rosenblatt Gilad
Orenstein Meir
Original Assignee
Technion Res & Development Found Ltd
Simkhovich Boris
Rosenblatt Gilad
Orenstein Meir
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Technion Res & Development Found Ltd, Simkhovich Boris, Rosenblatt Gilad, Orenstein Meir filed Critical Technion Res & Development Found Ltd
Priority to IL258195A priority Critical patent/IL258195B/en
Publication of IL258195A publication Critical patent/IL258195A/en
Priority to EP19719920.1A priority patent/EP3769069A1/en
Priority to PCT/IL2019/050299 priority patent/WO2019180704A1/en
Publication of IL258195B publication Critical patent/IL258195B/en
Priority to US17/024,420 priority patent/US11519864B2/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G01N21/553—Attenuated total reflection and using surface plasmons
    • G01N21/554—Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G01N21/553—Attenuated total reflection and using surface plasmons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/214—Variangle incidence arrangement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/215—Brewster incidence arrangement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8883—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges involving the calculation of gauges, generating models
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9511—Optical elements other than lenses, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Nanotechnology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
IL258195A 2018-03-18 2018-03-18 System and method for monitoring status of target IL258195B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IL258195A IL258195B (en) 2018-03-18 2018-03-18 System and method for monitoring status of target
EP19719920.1A EP3769069A1 (en) 2018-03-18 2019-03-18 System and method for monitoring status of target
PCT/IL2019/050299 WO2019180704A1 (en) 2018-03-18 2019-03-18 System and method for monitoring status of target
US17/024,420 US11519864B2 (en) 2018-03-18 2020-09-17 System and method for monitoring status of target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL258195A IL258195B (en) 2018-03-18 2018-03-18 System and method for monitoring status of target

Publications (2)

Publication Number Publication Date
IL258195A IL258195A (en) 2018-05-02
IL258195B true IL258195B (en) 2019-03-31

Family

ID=62455007

Family Applications (1)

Application Number Title Priority Date Filing Date
IL258195A IL258195B (en) 2018-03-18 2018-03-18 System and method for monitoring status of target

Country Status (4)

Country Link
US (1) US11519864B2 (en)
EP (1) EP3769069A1 (en)
IL (1) IL258195B (en)
WO (1) WO2019180704A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11502724B2 (en) * 2019-12-03 2022-11-15 At&T Intellectual Property I, L.P. Method and apparatus for transitioning between electromagnetic wave modes
CN112557304B (en) * 2020-11-22 2021-09-17 复旦大学 Method for identifying nano structure of thin film material based on ellipsometry parameter trajectory topological characteristics
CN113223744B (en) * 2021-04-21 2022-10-25 太原理工大学 Optical micro-control device and method for ultrafast regulation and control of vector vortex light field
CN113281256B (en) * 2021-05-31 2022-06-03 中国科学院长春光学精密机械与物理研究所 Mueller matrix measuring device and measuring method thereof
CN115178438B (en) * 2022-09-14 2022-12-02 深圳市鑫路远电子设备有限公司 Method and system for evaluating steady-state performance of vacuum glue pouring valve
US20240102941A1 (en) * 2022-09-26 2024-03-28 Kla Corporation Calibration Of Parametric Measurement Models Based On In-Line Wafer Measurement Data

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5166752A (en) * 1990-01-11 1992-11-24 Rudolph Research Corporation Simultaneous multiple angle/multiple wavelength ellipsometer and method
US5582646A (en) * 1994-10-21 1996-12-10 J.A. Woollam Co. Inc. Ellipsometer/polarimeter based process monitor and control system suitable for simultaneous retrofit on molecular beam epitaxy system RHEED/LEED interface system, and method of use
US7473916B2 (en) 2005-12-16 2009-01-06 Asml Netherlands B.V. Apparatus and method for detecting contamination within a lithographic apparatus
KR101029473B1 (en) * 2008-11-28 2011-04-18 한국표준과학연구원 Surface plasmon resonance sensor using beam profile ellipsometry
US10048200B2 (en) 2013-08-04 2018-08-14 Photonicsys Ltd. Optical sensor based with multilayered plasmonic structure comprising a nanoporous metallic layer
WO2015125149A1 (en) 2014-02-23 2015-08-27 Nova Measuring Instruments Ltd. Optical critical dimension metrology

Also Published As

Publication number Publication date
US20210072163A1 (en) 2021-03-11
WO2019180704A1 (en) 2019-09-26
US11519864B2 (en) 2022-12-06
IL258195A (en) 2018-05-02
EP3769069A1 (en) 2021-01-27

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