IL149418A0 - Improved method of electrophoretic deposition of ferroelectric films using a tri-functional additive and compositions for effecting same - Google Patents

Improved method of electrophoretic deposition of ferroelectric films using a tri-functional additive and compositions for effecting same

Info

Publication number
IL149418A0
IL149418A0 IL14941800A IL14941800A IL149418A0 IL 149418 A0 IL149418 A0 IL 149418A0 IL 14941800 A IL14941800 A IL 14941800A IL 14941800 A IL14941800 A IL 14941800A IL 149418 A0 IL149418 A0 IL 149418A0
Authority
IL
Israel
Prior art keywords
tri
compositions
improved method
functional additive
electrophoretic deposition
Prior art date
Application number
IL14941800A
Other languages
English (en)
Original Assignee
Cerel Ceramic Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cerel Ceramic Technologies Ltd filed Critical Cerel Ceramic Technologies Ltd
Publication of IL149418A0 publication Critical patent/IL149418A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/09—Forming piezoelectric or electrostrictive materials
    • H10N30/093—Forming inorganic materials
    • H10N30/097—Forming inorganic materials by sintering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Semiconductor Memories (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
IL14941800A 1999-11-02 2000-10-25 Improved method of electrophoretic deposition of ferroelectric films using a tri-functional additive and compositions for effecting same IL149418A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/432,205 US6127283A (en) 1999-11-02 1999-11-02 Method of electrophoretic deposition of ferroelectric films using a trifunctional additive and compositions for effecting same
PCT/IL2000/000679 WO2001033608A2 (en) 1999-11-02 2000-10-25 Improved method of electrophoretic deposition of ferroelectric films using a tri-functional additive and compositions for effecting same

Publications (1)

Publication Number Publication Date
IL149418A0 true IL149418A0 (en) 2002-11-10

Family

ID=23715189

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14941800A IL149418A0 (en) 1999-11-02 2000-10-25 Improved method of electrophoretic deposition of ferroelectric films using a tri-functional additive and compositions for effecting same

Country Status (6)

Country Link
US (2) US6127283A (de)
EP (1) EP1259660A4 (de)
AU (1) AU1050101A (de)
CA (1) CA2389804A1 (de)
IL (1) IL149418A0 (de)
WO (1) WO2001033608A2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6410086B1 (en) * 1999-11-26 2002-06-25 Cerel (Ceramic Technologies) Ltd. Method for forming high performance surface coatings and compositions of same
IL143780A (en) * 2001-06-14 2007-06-03 Cerel Ceramic Technologies Ltd Process for manufacturing electrode
JP2003031719A (ja) * 2001-07-16 2003-01-31 Shinko Electric Ind Co Ltd 半導体パッケージ及びその製造方法並びに半導体装置
JP2005515495A (ja) * 2002-01-10 2005-05-26 ケント ステート ユニバーシティ 液晶セル用材料
US7758773B2 (en) * 2002-01-10 2010-07-20 Kent State University Non-synthetic method for modifying properties of liquid crystals
US20040118686A1 (en) * 2002-10-02 2004-06-24 Jan Ma Piezoelectric tubes
JP3937174B2 (ja) * 2004-03-22 2007-06-27 セイコーエプソン株式会社 強誘電体膜、強誘電体膜の製造方法、強誘電体キャパシタ、強誘電体メモリおよび圧電素子
WO2006008736A1 (en) * 2004-07-22 2006-01-26 Cerel (Ceramic Technologies) Ltd. Fabrication of electrical components and circuits by selective electrophoretic deposition (s-epd) and transfer
WO2007092363A2 (en) * 2006-02-03 2007-08-16 San Diego State University Hybrid slip casting-electrophoretic deposition (epd) process
US7965375B2 (en) * 2007-07-03 2011-06-21 Qimoda Ag Lithography mask, rewritable mask, process for manufacturing a mask, device for processing a substrate, lithographic system and a semiconductor device
US8629422B2 (en) * 2008-11-05 2014-01-14 University Of Limerick Deposition of materials
ITMI20090934A1 (it) * 2009-05-27 2010-11-28 Elettroplast Spa Procedimento elettroforetico di deposizione di rivestimenti
US8681417B2 (en) * 2011-12-27 2014-03-25 Visitret Displays Ou Fast response electrophoretic display device
CN102703888B (zh) * 2012-06-25 2014-03-26 赵家文 一种金属铝盐覆盖膜剂及其制作方法、金属铝盐覆盖膜
PT107271B (pt) * 2013-11-04 2020-08-11 Universidade De Aveiro Materiais dieléctricos de elevado q sobre substratos isoladores, método de deposição e seu uso
TWI572262B (zh) * 2014-12-16 2017-02-21 國立清華大學 壓電換能器之製造方法
CN105420784B (zh) * 2015-10-30 2017-11-14 华南师范大学 一种制备垂直有序铁电纳米杯阵列的方法
US11499248B2 (en) 2017-03-15 2022-11-15 Lawrence Livermore National Security, Llc Electric field driven assembly of ordered nanocrystal superlattices
US20180308941A1 (en) * 2017-04-21 2018-10-25 Yu-chen Chang Two-dimensional electronic devices and related fabrication methods

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07127439A (ja) * 1993-11-05 1995-05-16 Mazda Motor Corp エンジンの排気構造
US5462647A (en) * 1994-09-09 1995-10-31 Midwest Research Institute Preparation of lead-zirconium-titanium film and powder by electrodeposition

Also Published As

Publication number Publication date
WO2001033608A3 (en) 2001-11-01
CA2389804A1 (en) 2001-05-10
EP1259660A2 (de) 2002-11-27
US20010003681A1 (en) 2001-06-14
US6127283A (en) 2000-10-03
EP1259660A4 (de) 2006-09-13
US6479406B2 (en) 2002-11-12
WO2001033608A2 (en) 2001-05-10
AU1050101A (en) 2001-05-14

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