IL148750A - Method for determining the endpoint of etch process steps - Google Patents

Method for determining the endpoint of etch process steps

Info

Publication number
IL148750A
IL148750A IL14875000A IL14875000A IL148750A IL 148750 A IL148750 A IL 148750A IL 14875000 A IL14875000 A IL 14875000A IL 14875000 A IL14875000 A IL 14875000A IL 148750 A IL148750 A IL 148750A
Authority
IL
Israel
Prior art keywords
endpoint
determining
process steps
etch process
etch
Prior art date
Application number
IL14875000A
Other languages
English (en)
Other versions
IL148750A0 (en
Original Assignee
Infineon Technologies Ag
Infineon Technologies Sc300
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag, Infineon Technologies Sc300, Motorola Inc filed Critical Infineon Technologies Ag
Publication of IL148750A0 publication Critical patent/IL148750A0/xx
Publication of IL148750A publication Critical patent/IL148750A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Drying Of Semiconductors (AREA)
IL14875000A 1999-09-30 2000-09-28 Method for determining the endpoint of etch process steps IL148750A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99119443A EP1089318A1 (en) 1999-09-30 1999-09-30 Method for determining the endpoint of etch process steps
PCT/EP2000/009518 WO2001024254A1 (en) 1999-09-30 2000-09-28 Method for determining the endpoint of etch process steps

Publications (2)

Publication Number Publication Date
IL148750A0 IL148750A0 (en) 2002-09-12
IL148750A true IL148750A (en) 2005-11-20

Family

ID=8239097

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14875000A IL148750A (en) 1999-09-30 2000-09-28 Method for determining the endpoint of etch process steps

Country Status (8)

Country Link
US (1) US20030010750A1 (zh)
EP (2) EP1089318A1 (zh)
JP (1) JP2003510844A (zh)
KR (1) KR100474174B1 (zh)
DE (1) DE60032498T2 (zh)
IL (1) IL148750A (zh)
TW (1) TW573334B (zh)
WO (1) WO2001024254A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW472336B (en) * 2001-02-21 2002-01-11 Promos Technologies Inc Method for controlling etching depth
US6728591B1 (en) * 2001-08-01 2004-04-27 Advanced Micro Devices, Inc. Method and apparatus for run-to-run control of trench profiles
US8257546B2 (en) * 2003-04-11 2012-09-04 Applied Materials, Inc. Method and system for monitoring an etch process
AU2003293146A1 (en) 2003-11-28 2005-07-21 Corning Incorporated Method for fabricating glass panels
US7279657B2 (en) * 2005-06-13 2007-10-09 Applied Materials, Inc. Scanned rapid thermal processing with feed forward control
US7521332B2 (en) * 2007-03-23 2009-04-21 Alpha & Omega Semiconductor, Ltd Resistance-based etch depth determination for SGT technology

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4680084A (en) * 1984-08-21 1987-07-14 American Telephone And Telegraph Company, At&T Bell Laboratories Interferometric methods and apparatus for device fabrication
FR2616269B1 (fr) * 1987-06-04 1990-11-09 Labo Electronique Physique Dispositif de test pour la mise en oeuvre d'un procede de realisation de dispositifs semiconducteurs
US5362356A (en) * 1990-12-20 1994-11-08 Lsi Logic Corporation Plasma etching process control
US5407524A (en) * 1993-08-13 1995-04-18 Lsi Logic Corporation End-point detection in plasma etching by monitoring radio frequency matching network
US5465859A (en) * 1994-04-28 1995-11-14 International Business Machines Corporation Dual phase and hybrid phase shifting mask fabrication using a surface etch monitoring technique
US5877407A (en) * 1997-07-22 1999-03-02 Lucent Technologies Inc. Plasma etch end point detection process
US6136712A (en) * 1998-09-30 2000-10-24 Lam Research Corporation Method and apparatus for improving accuracy of plasma etching process

Also Published As

Publication number Publication date
IL148750A0 (en) 2002-09-12
KR20020085879A (ko) 2002-11-16
KR100474174B1 (ko) 2005-03-10
EP1089318A1 (en) 2001-04-04
EP1218934A1 (en) 2002-07-03
TW573334B (en) 2004-01-21
EP1218934B1 (en) 2006-12-20
JP2003510844A (ja) 2003-03-18
DE60032498D1 (de) 2007-02-01
WO2001024254A1 (en) 2001-04-05
US20030010750A1 (en) 2003-01-16
DE60032498T2 (de) 2007-10-04

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Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed
MM9K Patent not in force due to non-payment of renewal fees