ID24748A - Metoda untuk membuat silikon oksinitrid - Google Patents

Metoda untuk membuat silikon oksinitrid

Info

Publication number
ID24748A
ID24748A IDW20000597A ID20000597A ID24748A ID 24748 A ID24748 A ID 24748A ID W20000597 A IDW20000597 A ID W20000597A ID 20000597 A ID20000597 A ID 20000597A ID 24748 A ID24748 A ID 24748A
Authority
ID
Indonesia
Prior art keywords
oxinitrid
methods
make silicone
silicone
make
Prior art date
Application number
IDW20000597A
Other languages
English (en)
Inventor
David F Dawson-Elli
Carlton M Truesdale
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of ID24748A publication Critical patent/ID24748A/id

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/0821—Oxynitrides of metals, boron or silicon
    • C01B21/0823—Silicon oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/055—Peroxyhydrates; Peroxyacids or salts thereof
    • C01B15/14—Peroxyhydrates; Peroxyacids or salts thereof containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
IDW20000597A 1997-08-29 1998-08-05 Metoda untuk membuat silikon oksinitrid ID24748A (id)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5724197P 1997-08-29 1997-08-29

Publications (1)

Publication Number Publication Date
ID24748A true ID24748A (id) 2000-08-03

Family

ID=22009383

Family Applications (1)

Application Number Title Priority Date Filing Date
IDW20000597A ID24748A (id) 1997-08-29 1998-08-05 Metoda untuk membuat silikon oksinitrid

Country Status (9)

Country Link
EP (1) EP1025041A1 (id)
JP (1) JP2001514151A (id)
KR (1) KR20010023452A (id)
CN (1) CN1268099A (id)
BR (1) BR9811384A (id)
CA (1) CA2297329A1 (id)
ID (1) ID24748A (id)
TW (1) TW509660B (id)
WO (1) WO1999011573A1 (id)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1130633A1 (en) * 2000-02-29 2001-09-05 STMicroelectronics S.r.l. A method of depositing silicon oxynitride polimer layers

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4788309A (en) * 1985-04-26 1988-11-29 Sri International Method of forming compounds having Si-N groups and resulting products
US5166104A (en) * 1986-02-12 1992-11-24 Toa Nenryo Kogyo Kabushiki Kaisha Polysiloxazanes, silicon oxynitride fibers and processes for producing same

Also Published As

Publication number Publication date
WO1999011573A1 (en) 1999-03-11
EP1025041A1 (en) 2000-08-09
BR9811384A (pt) 2000-08-29
AU8694298A (en) 1999-03-22
KR20010023452A (ko) 2001-03-26
TW509660B (en) 2002-11-11
CA2297329A1 (en) 1999-03-11
CN1268099A (zh) 2000-09-27
AU731687B2 (en) 2001-04-05
JP2001514151A (ja) 2001-09-11

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