ID23132A - PROCESS FOR ESTABLISHMENT OF A SUITABLE LAYER LAYER FOR A COLD METAL MATERIAL PROCESS - Google Patents

PROCESS FOR ESTABLISHMENT OF A SUITABLE LAYER LAYER FOR A COLD METAL MATERIAL PROCESS

Info

Publication number
ID23132A
ID23132A IDP990856D ID990856D ID23132A ID 23132 A ID23132 A ID 23132A ID P990856 D IDP990856 D ID P990856D ID 990856 D ID990856 D ID 990856D ID 23132 A ID23132 A ID 23132A
Authority
ID
Indonesia
Prior art keywords
layer
establishment
metal material
cold metal
material process
Prior art date
Application number
IDP990856D
Other languages
Indonesian (id)
Inventor
Naoyuki Kobatashi
Atsushi Moriyama
Original Assignee
Nihon Parkerizing
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Parkerizing filed Critical Nihon Parkerizing
Publication of ID23132A publication Critical patent/ID23132A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/36Phosphatising
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00Electrolytic cleaning, degreasing, pickling or descaling
    • C25F1/02Pickling; Descaling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Forging (AREA)
IDP990856D 1998-09-11 1999-09-10 PROCESS FOR ESTABLISHMENT OF A SUITABLE LAYER LAYER FOR A COLD METAL MATERIAL PROCESS ID23132A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25876598 1998-09-11

Publications (1)

Publication Number Publication Date
ID23132A true ID23132A (en) 2000-03-15

Family

ID=17324786

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP990856D ID23132A (en) 1998-09-11 1999-09-10 PROCESS FOR ESTABLISHMENT OF A SUITABLE LAYER LAYER FOR A COLD METAL MATERIAL PROCESS

Country Status (3)

Country Link
KR (1) KR20000023075A (en)
CN (1) CN1248644A (en)
ID (1) ID23132A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100422649B1 (en) * 2001-08-09 2004-03-11 현대자동차주식회사 Surface lubrication method in cold forming process
KR100491256B1 (en) * 2002-10-31 2005-05-25 주식회사 코우 clutch connector manufacturing method of washing machine
DE102005023023B4 (en) * 2005-05-19 2017-02-09 Chemetall Gmbh Method of preparing metallic workpieces for cold forming, process coated workpieces and their use
CN102719872B (en) * 2012-06-08 2018-04-27 南京派诺金属表面处理技术有限公司 A kind of Slag-free low-temperature rapid electrolytic phosphorizing liquid and phosphorizing process thereof
MX2016010837A (en) * 2014-02-21 2016-10-28 Nihon Parkerizing Composition for direct-current cathodic electrolysis, lubrication-film-equipped metal material, and production method therefor.
KR101523546B1 (en) 2015-02-16 2015-05-28 한영선재(주) Method for manufacturing non phosphate coated metal material for cold heading plastic working
CN110029008A (en) * 2019-05-17 2019-07-19 湖南省机械科学研究院有限公司 A kind of high-efficiency environment friendly release agent for Cold Extrusion Process of Aluminum Alloy
CN113073371A (en) * 2021-03-22 2021-07-06 领润(南京)绿色化学有限公司 Clean anode plate friendly electrolytic phosphating solution and phosphating process thereof

Also Published As

Publication number Publication date
KR20000023075A (en) 2000-04-25
CN1248644A (en) 2000-03-29

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