ID20061A - SENSITIVE RESIN COMPOSITION OF LIGHT AND LAYER CONSIST OF SUCH COMPOSITION - Google Patents

SENSITIVE RESIN COMPOSITION OF LIGHT AND LAYER CONSIST OF SUCH COMPOSITION

Info

Publication number
ID20061A
ID20061A IDP970833A ID970833A ID20061A ID 20061 A ID20061 A ID 20061A ID P970833 A IDP970833 A ID P970833A ID 970833 A ID970833 A ID 970833A ID 20061 A ID20061 A ID 20061A
Authority
ID
Indonesia
Prior art keywords
composition
light
sensitive resin
layer consist
resin composition
Prior art date
Application number
IDP970833A
Other languages
Indonesian (id)
Inventor
Stuart Arthur Harris
Theodorus Kessler
Albertus Koster
Gerardus Franciscus Jo Pouwels
Original Assignee
Stork Screens Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stork Screens Bv filed Critical Stork Screens Bv
Publication of ID20061A publication Critical patent/ID20061A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
IDP970833A 1996-03-15 1997-03-14 SENSITIVE RESIN COMPOSITION OF LIGHT AND LAYER CONSIST OF SUCH COMPOSITION ID20061A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL1002628A NL1002628C2 (en) 1996-03-15 1996-03-15 Photosensitive resin composition and this composition comprising lacquer.

Publications (1)

Publication Number Publication Date
ID20061A true ID20061A (en) 1998-09-24

Family

ID=19762508

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP970833A ID20061A (en) 1996-03-15 1997-03-14 SENSITIVE RESIN COMPOSITION OF LIGHT AND LAYER CONSIST OF SUCH COMPOSITION

Country Status (4)

Country Link
AU (1) AU2046197A (en)
ID (1) ID20061A (en)
NL (1) NL1002628C2 (en)
WO (1) WO1997034199A1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481738A (en) * 1966-09-21 1969-12-02 Ball Brothers Co Inc Presensitized photoengraving plate and method of making same
JPS5637244B2 (en) * 1973-02-13 1981-08-29
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
US4564580A (en) * 1983-06-30 1986-01-14 Kogyo Gijutsuin Photosensitive resin composition
US5053315A (en) * 1990-07-17 1991-10-01 Eastman Kodak Company Radiation-sensitive composition containing an unsaturated polyester and use thereof in lithographic printing plates
US5045432A (en) * 1990-07-17 1991-09-03 Eastman Kodak Company Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates
JPH05127372A (en) * 1991-11-01 1993-05-25 Nippon Paint Co Ltd Lithographic printing photosensitive resin and resin composition

Also Published As

Publication number Publication date
WO1997034199A1 (en) 1997-09-18
NL1002628C2 (en) 1997-09-17
AU2046197A (en) 1997-10-01

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