HK64376A - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
HK64376A
HK64376A HK64376A HK64376A HK64376A HK 64376 A HK64376 A HK 64376A HK 64376 A HK64376 A HK 64376A HK 64376 A HK64376 A HK 64376A HK 64376 A HK64376 A HK 64376A
Authority
HK
Hong Kong
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
Application number
HK64376A
Inventor
R Ch Mcconkey
J M Noonan
R C Sutton
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of HK64376A publication Critical patent/HK64376A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/02—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of acids, salts or anhydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
HK64376A 1972-04-26 1976-10-14 Photopolymerisable compositions HK64376A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24774772A 1972-04-26 1972-04-26

Publications (1)

Publication Number Publication Date
HK64376A true HK64376A (en) 1976-10-22

Family

ID=22936205

Family Applications (1)

Application Number Title Priority Date Filing Date
HK64376A HK64376A (en) 1972-04-26 1976-10-14 Photopolymerisable compositions

Country Status (7)

Country Link
JP (1) JPS5633413B2 (en)
BE (1) BE798776A (en)
DE (1) DE2320849C2 (en)
FR (1) FR2181944B1 (en)
GB (1) GB1425423A (en)
HK (1) HK64376A (en)
NL (1) NL7305883A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1507704A (en) * 1974-04-23 1978-04-19 Du Pont Photopolymerisable compositions
US4273857A (en) 1976-01-30 1981-06-16 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
US4046074A (en) * 1976-02-02 1977-09-06 International Business Machines Corporation Non-impact printing system
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
US4353978A (en) 1979-08-14 1982-10-12 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
JPS56135083A (en) * 1980-10-31 1981-10-22 Toshiba Corp Printing recording device in ticket dispenser
JPS5946643A (en) * 1982-09-09 1984-03-16 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
DE3441787A1 (en) * 1984-03-17 1985-09-19 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photopolymerisable mixture and recording material produced from it
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same
US4694103A (en) * 1986-05-19 1987-09-15 Minnesota Mining And Manufacturing Company Method of preparing N-acryloyl-α-amino acids
USRE32952E (en) * 1986-05-19 1989-06-13 Minnesota Mining And Manufacturing Company Method of preparing N-acryloyl-α-amino acids
US7056935B2 (en) 1995-06-07 2006-06-06 Gpi Nil Holdings, Inc. Rotamase enzyme activity inhibitors
US7276381B2 (en) * 2002-01-25 2007-10-02 Bio-Rad Laboratories, Inc. Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes
US20100209843A1 (en) 2009-02-16 2010-08-19 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3575925A (en) * 1968-06-17 1971-04-20 Nat Starch Chem Corp Photosensitive coating systems
CA923358A (en) * 1969-08-01 1973-03-27 Fuji Photo Film Co. Light-sensitive stencil printing material

Also Published As

Publication number Publication date
BE798776A (en) 1973-10-26
GB1425423A (en) 1976-02-18
JPS5633413B2 (en) 1981-08-04
DE2320849C2 (en) 1983-09-22
FR2181944B1 (en) 1977-01-07
FR2181944A1 (en) 1973-12-07
NL7305883A (en) 1973-10-30
DE2320849A1 (en) 1973-11-08
JPS4942329A (en) 1974-04-20

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