HK25596A - Light-sensitive positive mixture containing a dye and light-sensitive positive registration material prepared therefrom - Google Patents

Light-sensitive positive mixture containing a dye and light-sensitive positive registration material prepared therefrom

Info

Publication number
HK25596A
HK25596A HK25596A HK25596A HK25596A HK 25596 A HK25596 A HK 25596A HK 25596 A HK25596 A HK 25596A HK 25596 A HK25596 A HK 25596A HK 25596 A HK25596 A HK 25596A
Authority
HK
Hong Kong
Prior art keywords
light
sensitive positive
dye
mixture containing
material prepared
Prior art date
Application number
HK25596A
Inventor
Hans-Joachim Dr Merrem
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of HK25596A publication Critical patent/HK25596A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
HK25596A 1987-10-30 1996-02-08 Light-sensitive positive mixture containing a dye and light-sensitive positive registration material prepared therefrom HK25596A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873736758 DE3736758A1 (en) 1987-10-30 1987-10-30 POSITIVELY WORKING LIGHT-SENSITIVE MIXTURE, CONTAINING A DYE, AND POSITIVELY WORKING LIGHT-SENSITIVE RECORDING MATERIAL MADE FROM THEREOF

Publications (1)

Publication Number Publication Date
HK25596A true HK25596A (en) 1996-02-16

Family

ID=6339393

Family Applications (1)

Application Number Title Priority Date Filing Date
HK25596A HK25596A (en) 1987-10-30 1996-02-08 Light-sensitive positive mixture containing a dye and light-sensitive positive registration material prepared therefrom

Country Status (5)

Country Link
EP (1) EP0314037B1 (en)
JP (1) JP2608940B2 (en)
KR (1) KR960015638B1 (en)
DE (2) DE3736758A1 (en)
HK (1) HK25596A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2711590B2 (en) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 Positive photoresist composition
JP2579387B2 (en) * 1990-12-12 1997-02-05 三菱化学株式会社 Photoresist composition
JP2838335B2 (en) * 1992-02-03 1998-12-16 富士写真フイルム株式会社 Photosensitive composition
US5275909A (en) * 1992-06-01 1994-01-04 Ocg Microelectronic Materials, Inc. Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye
US5290418A (en) * 1992-09-24 1994-03-01 Applied Biosystems, Inc. Viscous electrophoresis polymer medium and method
JPH08146599A (en) * 1994-11-24 1996-06-07 Nec Corp Photosensitive composition and fine pattern forming method using the composition
JP3436843B2 (en) * 1996-04-25 2003-08-18 東京応化工業株式会社 Base material for lithography and resist material for lithography using the same
JP4333095B2 (en) * 1998-10-30 2009-09-16 日立化成デュポンマイクロシステムズ株式会社 Photosensitive polymer composition, method for producing relief pattern, and electronic component

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3307943A (en) * 1963-05-14 1967-03-07 Du Pont Image reproduction elements and processes
JPS6088941A (en) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk Photoresist composition
JPS61231541A (en) * 1985-04-06 1986-10-15 Nippon Seihaku Kk Photosensitive lithographic plating material
JPS61241759A (en) * 1985-04-18 1986-10-28 Toray Ind Inc Lithographic plate requiring no water

Also Published As

Publication number Publication date
EP0314037B1 (en) 1994-02-23
DE3887955D1 (en) 1994-03-31
KR960015638B1 (en) 1996-11-18
KR890007120A (en) 1989-06-19
EP0314037A2 (en) 1989-05-03
EP0314037A3 (en) 1990-10-31
JP2608940B2 (en) 1997-05-14
DE3736758A1 (en) 1989-05-11
JPH01154049A (en) 1989-06-16

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)