HK1243822A1 - Super cmos (scmostm) devices on a microelectronic system - Google Patents
Super cmos (scmostm) devices on a microelectronic systemInfo
- Publication number
- HK1243822A1 HK1243822A1 HK18102675.8A HK18102675A HK1243822A1 HK 1243822 A1 HK1243822 A1 HK 1243822A1 HK 18102675 A HK18102675 A HK 18102675A HK 1243822 A1 HK1243822 A1 HK 1243822A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- scmostm
- devices
- microelectronic system
- super cmos
- cmos
- Prior art date
Links
- 238000004377 microelectronic Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0727—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0255—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66515—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using self aligned selective metal deposition simultaneously on the gate and on source or drain
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B10/00—Static random access memory [SRAM] devices
- H10B10/12—Static random access memory [SRAM] devices comprising a MOSFET load element
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
- H10B20/27—ROM only
- H10B20/30—ROM only having the source region and the drain region on the same level, e.g. lateral transistors
- H10B20/38—Doping programmed, e.g. mask ROM
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
- H01L27/1211—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI combined with field-effect transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462062800P | 2014-10-10 | 2014-10-10 | |
PCT/US2015/055020 WO2016057973A1 (en) | 2014-10-10 | 2015-10-09 | Super cmos (scmostm) devices on a microelectronic system |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1243822A1 true HK1243822A1 (en) | 2018-07-20 |
Family
ID=55653885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18102675.8A HK1243822A1 (en) | 2014-10-10 | 2018-02-24 | Super cmos (scmostm) devices on a microelectronic system |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP3216051A4 (en) |
HK (1) | HK1243822A1 (en) |
WO (1) | WO2016057973A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10756097B2 (en) | 2018-06-29 | 2020-08-25 | International Business Machines Corporation | Stacked vertical transistor-based mask-programmable ROM |
CN109784483B (en) * | 2019-01-24 | 2022-09-09 | 电子科技大学 | FD-SOI (field-programmable gate array-silicon on insulator) process-based binary convolution neural network in-memory computing accelerator |
US10734979B1 (en) * | 2019-07-03 | 2020-08-04 | Globalfoundries Inc. | Analog-to-digital inverter circuit structure with FDSOI transistors |
CN111934657B (en) * | 2020-08-13 | 2023-10-24 | 南京物间科技有限公司 | Low-power-consumption power-on reset and power-off reset circuit |
US11315923B2 (en) | 2020-09-17 | 2022-04-26 | International Business Machines Corporation | Stacked nanosheet inverter |
US11387819B2 (en) | 2020-12-10 | 2022-07-12 | Qualcomm Incorporated | Fault resilient flip-flop with balanced topology and negative feedback |
US11894433B2 (en) | 2021-06-22 | 2024-02-06 | International Business Machines Corporation | Method and structure to improve stacked FET bottom EPI contact |
CN113972220B (en) * | 2021-09-27 | 2024-03-15 | 沈阳工业大学 | High-integration central bidirectional Schottky junction type single-tube inverter and manufacturing method thereof |
CN114334956B (en) * | 2022-03-15 | 2022-06-07 | 成都市易冲半导体有限公司 | Isolation protection structure of alternating current power switch with extreme negative voltage resistant high-voltage pin |
WO2024064145A1 (en) * | 2022-09-21 | 2024-03-28 | Schottky Lsi, Inc. | Integration of field effect transistors and schottky diodes on a substrate |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2929869C2 (en) * | 1979-07-24 | 1986-04-30 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Monolithic integrated CMOS inverter circuitry |
US6590800B2 (en) * | 2001-06-15 | 2003-07-08 | Augustine Wei-Chun Chang | Schottky diode static random access memory (DSRAM) device, a method for making same, and CFET based DTL |
US6720231B2 (en) * | 2002-01-28 | 2004-04-13 | International Business Machines Corporation | Fin-type resistors |
JP4237595B2 (en) * | 2003-09-24 | 2009-03-11 | 株式会社東芝 | Static random access memory |
US7928470B2 (en) * | 2005-11-25 | 2011-04-19 | Denso Corporation | Semiconductor device having super junction MOS transistor and method for manufacturing the same |
US8476689B2 (en) * | 2008-12-23 | 2013-07-02 | Augustine Wei-Chun Chang | Super CMOS devices on a microelectronics system |
JP4700125B2 (en) * | 2009-07-30 | 2011-06-15 | 住友電気工業株式会社 | Semiconductor device and manufacturing method thereof |
-
2015
- 2015-10-09 EP EP15849239.7A patent/EP3216051A4/en active Pending
- 2015-10-09 WO PCT/US2015/055020 patent/WO2016057973A1/en active Application Filing
-
2018
- 2018-02-24 HK HK18102675.8A patent/HK1243822A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP3216051A1 (en) | 2017-09-13 |
WO2016057973A1 (en) | 2016-04-14 |
EP3216051A4 (en) | 2018-06-06 |
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