HK1167718A1 - Method for treating waste organic solvents - Google Patents

Method for treating waste organic solvents

Info

Publication number
HK1167718A1
HK1167718A1 HK12108352.1A HK12108352A HK1167718A1 HK 1167718 A1 HK1167718 A1 HK 1167718A1 HK 12108352 A HK12108352 A HK 12108352A HK 1167718 A1 HK1167718 A1 HK 1167718A1
Authority
HK
Hong Kong
Prior art keywords
organic solvents
treating waste
waste organic
treating
solvents
Prior art date
Application number
HK12108352.1A
Inventor
Jinbae Jeong
Jaewoong Mun
Myungho Lee
Hyun Cheol Jeong
Do Soon Kang
Original Assignee
Enf Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enf Technology Co Ltd filed Critical Enf Technology Co Ltd
Publication of HK1167718A1 publication Critical patent/HK1167718A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Processing Of Solid Wastes (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
HK12108352.1A 2009-04-15 2012-08-27 Method for treating waste organic solvents HK1167718A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020090032887A KR100952913B1 (en) 2009-04-15 2009-04-15 Treatment method for waste organic solvent
PCT/KR2010/002343 WO2010120131A2 (en) 2009-04-15 2010-04-15 Method for treating waste organic solvents

Publications (1)

Publication Number Publication Date
HK1167718A1 true HK1167718A1 (en) 2012-12-07

Family

ID=42219925

Family Applications (1)

Application Number Title Priority Date Filing Date
HK12108352.1A HK1167718A1 (en) 2009-04-15 2012-08-27 Method for treating waste organic solvents

Country Status (4)

Country Link
KR (1) KR100952913B1 (en)
CN (1) CN102388345B (en)
HK (1) HK1167718A1 (en)
WO (1) WO2010120131A2 (en)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5571417A (en) * 1991-10-22 1996-11-05 International Business Machines Corporation Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol
US5268260A (en) * 1991-10-22 1993-12-07 International Business Machines Corporation Photoresist develop and strip solvent compositions and method for their use
US5310428A (en) * 1992-12-22 1994-05-10 Inernational Business Machines Corporation Solvent stabilization process and method of recovering solvent
JP3328250B2 (en) * 1998-12-09 2002-09-24 岸本産業株式会社 Resist residue remover
JP2001225535A (en) * 2000-02-18 2001-08-21 Seiko Epson Corp Winding device of ink ribbon in printer and printer
JP3409028B2 (en) * 2000-04-28 2003-05-19 松下環境空調エンジニアリング株式会社 Method and apparatus for regenerating solvent
KR100858047B1 (en) * 2005-09-30 2008-09-10 니폰 리파인 가부시키가이샤 An apparatus and method for recovering solvent
KR100751074B1 (en) * 2006-06-28 2007-08-21 주식회사 이엔에프테크놀로지 Treatment method for waste organic solvent containing photoresist component

Also Published As

Publication number Publication date
CN102388345A (en) 2012-03-21
KR100952913B1 (en) 2010-04-16
CN102388345B (en) 2013-10-09
WO2010120131A2 (en) 2010-10-21
WO2010120131A3 (en) 2011-03-10

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20180415