HK1076491A1 - Method for repairing fine pattern and apparatus for repairing fine pattern - Google Patents
Method for repairing fine pattern and apparatus for repairing fine patternInfo
- Publication number
- HK1076491A1 HK1076491A1 HK05108450.1A HK05108450A HK1076491A1 HK 1076491 A1 HK1076491 A1 HK 1076491A1 HK 05108450 A HK05108450 A HK 05108450A HK 1076491 A1 HK1076491 A1 HK 1076491A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- fine pattern
- repairing fine
- repairing
- pattern
- fine
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/225—Correcting or repairing of printed circuits
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C20/00—Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
- C23C26/02—Coating not provided for in groups C23C2/00 - C23C24/00 applying molten material to the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Surface Heating Bodies (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002036079 | 2002-02-14 | ||
PCT/JP2002/005320 WO2003069023A1 (en) | 2002-02-14 | 2002-05-30 | Method for repairing fine pattern and apparatus for repairing fine pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1076491A1 true HK1076491A1 (en) | 2006-01-20 |
Family
ID=27678074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK05108450.1A HK1076491A1 (en) | 2002-02-14 | 2005-09-26 | Method for repairing fine pattern and apparatus for repairing fine pattern |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPWO2003069023A1 (en) |
KR (1) | KR20050004771A (en) |
CN (1) | CN100390318C (en) |
AU (1) | AU2002304123A1 (en) |
HK (1) | HK1076491A1 (en) |
WO (1) | WO2003069023A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130341077A1 (en) * | 2012-06-25 | 2013-12-26 | Ibiden Co., Ltd. | Method for repairing disconnection in wiring board, method for manufacturing wiring board, method for forming wiring in wiring board and wiring board |
CN104768331B (en) * | 2015-03-30 | 2018-01-23 | 深圳崇达多层线路板有限公司 | The method for repairing and mending of open lines in a kind of PCB |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2559264B2 (en) * | 1987-12-17 | 1996-12-04 | 富士写真フイルム株式会社 | Silver halide emulsion and method for producing the same |
JPH0219838A (en) * | 1988-07-07 | 1990-01-23 | Matsushita Electric Ind Co Ltd | Method for correcting wiring pattern |
JPH0267517A (en) * | 1988-09-02 | 1990-03-07 | Seiko Epson Corp | Production of liquid crystal display panel |
JPH0385523A (en) * | 1989-08-29 | 1991-04-10 | Sharp Corp | Method for correcting defect of transparent electrode |
JPH06104255A (en) * | 1992-09-14 | 1994-04-15 | Hoya Corp | Laser processing apparatus |
KR100213603B1 (en) * | 1994-12-28 | 1999-08-02 | 가나이 쯔또무 | Wiring correcting method and its device of electronic circuit substrate, and electronic circuit substrate |
JPH11189883A (en) * | 1997-10-20 | 1999-07-13 | Alps Electric Co Ltd | Substrate having recovered metallic pattern, method for recovering metallic pattern in substrate and recovering device |
-
2002
- 2002-05-30 CN CNB02827895XA patent/CN100390318C/en not_active Expired - Fee Related
- 2002-05-30 KR KR10-2004-7010884A patent/KR20050004771A/en not_active Application Discontinuation
- 2002-05-30 WO PCT/JP2002/005320 patent/WO2003069023A1/en active Application Filing
- 2002-05-30 AU AU2002304123A patent/AU2002304123A1/en not_active Abandoned
- 2002-05-30 JP JP2003568128A patent/JPWO2003069023A1/en active Pending
-
2005
- 2005-09-26 HK HK05108450.1A patent/HK1076491A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU2002304123A1 (en) | 2003-09-04 |
CN1617950A (en) | 2005-05-18 |
CN100390318C (en) | 2008-05-28 |
JPWO2003069023A1 (en) | 2005-06-02 |
KR20050004771A (en) | 2005-01-12 |
WO2003069023A1 (en) | 2003-08-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20130530 |