HK1053808A1 - 化學氣相沉積方法及從其中製備的塗料 - Google Patents

化學氣相沉積方法及從其中製備的塗料

Info

Publication number
HK1053808A1
HK1053808A1 HK03104724.2A HK03104724A HK1053808A1 HK 1053808 A1 HK1053808 A1 HK 1053808A1 HK 03104724 A HK03104724 A HK 03104724A HK 1053808 A1 HK1053808 A1 HK 1053808A1
Authority
HK
Hong Kong
Prior art keywords
vapor deposition
chemical vapor
deposition method
produced therefrom
coatings produced
Prior art date
Application number
HK03104724.2A
Other languages
English (en)
Inventor
T Hunt Andrew
Deshpande Girish
Tzyy-Jiuan Hwang Jan
Sowa Laye Nii
Oljaca Miodrag
Shanmugham Subramaniam
S Shoup Shara
Tomov Trifon
J Jr Dalzell William
Poda Aimee
Hendrick Michelle
Original Assignee
Ngimat Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ngimat Co filed Critical Ngimat Co
Publication of HK1053808A1 publication Critical patent/HK1053808A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
HK03104724.2A 1999-12-29 2003-07-02 化學氣相沉積方法及從其中製備的塗料 HK1053808A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US47449199A 1999-12-29 1999-12-29
US23457500P 2000-09-22 2000-09-22
PCT/US2000/035416 WO2001047704A1 (en) 1999-12-29 2000-12-21 Chemical vapor deposition method and coatings produced therefrom

Publications (1)

Publication Number Publication Date
HK1053808A1 true HK1053808A1 (zh) 2003-11-07

Family

ID=26928085

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03104724.2A HK1053808A1 (zh) 1999-12-29 2003-07-02 化學氣相沉積方法及從其中製備的塗料

Country Status (6)

Country Link
EP (1) EP1268186B1 (zh)
AU (1) AU771864B2 (zh)
BR (1) BR0016782A (zh)
CA (1) CA2393531C (zh)
HK (1) HK1053808A1 (zh)
WO (1) WO2001047704A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005025083B4 (de) 2005-05-30 2007-05-24 Infineon Technologies Ag Thermoplast-Duroplast-Verbund und Verfahren zum Verbinden eines thermoplastischen Materials mit einem duroplastischen Material
JP4757709B2 (ja) * 2006-05-26 2011-08-24 株式会社豊田中央研究所 樹脂ガラス用積層体及びその製造方法
GB2466805B (en) * 2009-01-08 2014-06-11 Cvd Technologies Ltd Method for depositing an antibacterial coating on a substrate
WO2013076525A1 (en) * 2011-11-21 2013-05-30 Arcelormittal Investigación Y Desarrollo Sl Coating method and apparatus
KR102170813B1 (ko) * 2013-07-09 2020-10-28 한국전력공사 연소화학기상증착 반응을 이용한 기능성 코팅 장치
US10782285B2 (en) 2014-10-03 2020-09-22 Rite Taste, LLC Device and method for chemical analysis
EP3201627B1 (en) 2014-10-03 2020-02-12 Rite Taste, LLC System for detecting gluten in food samples
US11209416B2 (en) 2017-07-28 2021-12-28 Graphene-Dx, Inc. Device and method for chemical analysis
AU2019211495A1 (en) 2018-01-29 2020-09-17 Graphene-Dx, Inc. Methods and devices for detection of pathogens

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4235616A (en) * 1979-05-14 1980-11-25 Corning Glass Works Optical waveguide manufacturing process and article
JPS5969142A (ja) * 1982-10-13 1984-04-19 Toshiba Corp 膜形成方法及び膜形成装置
JPS59121917A (ja) * 1982-12-28 1984-07-14 Nec Corp 気相成長装置
US4734451A (en) * 1983-09-01 1988-03-29 Battelle Memorial Institute Supercritical fluid molecular spray thin films and fine powders
US4689247A (en) * 1986-05-15 1987-08-25 Ametek, Inc. Process and apparatus for forming thin films
JPH0776097B2 (ja) * 1987-01-20 1995-08-16 日本電信電話株式会社 ガラス膜製造装置
EP0486475B1 (en) * 1988-03-03 1997-12-03 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
CA2010887C (en) * 1990-02-26 1996-07-02 Peter George Tsantrizos Reactive spray forming process
DE69224808T2 (de) * 1991-12-26 1998-07-09 Toyo Boseki Gassperrfilm
EP0689618B1 (en) * 1993-03-24 2003-02-26 Georgia Tech Research Corporation Method and apparatus for the combustion chemical vapor deposition of films and coatings

Also Published As

Publication number Publication date
CA2393531A1 (en) 2001-07-05
EP1268186A4 (en) 2007-10-24
BR0016782A (pt) 2005-01-11
EP1268186B1 (en) 2015-09-02
AU771864B2 (en) 2004-04-01
CA2393531C (en) 2011-02-15
EP1268186A1 (en) 2003-01-02
AU2740201A (en) 2001-07-09
WO2001047704A1 (en) 2001-07-05

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