HK1047270A1 - Sulfuric acid rycycle apparatus. - Google Patents

Sulfuric acid rycycle apparatus.

Info

Publication number
HK1047270A1
HK1047270A1 HK02109012A HK02109012A HK1047270A1 HK 1047270 A1 HK1047270 A1 HK 1047270A1 HK 02109012 A HK02109012 A HK 02109012A HK 02109012 A HK02109012 A HK 02109012A HK 1047270 A1 HK1047270 A1 HK 1047270A1
Authority
HK
Hong Kong
Prior art keywords
rycycle
sulfuric acid
sulfuric
acid
rycycle apparatus
Prior art date
Application number
HK02109012A
Inventor
Okimitsu Yasuda
Seiichi Fujii
Original Assignee
Suntec System Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000354784A external-priority patent/JP3635026B2/en
Application filed by Suntec System Co Ltd filed Critical Suntec System Co Ltd
Publication of HK1047270A1 publication Critical patent/HK1047270A1/en

Links

HK02109012A 2000-11-21 2002-12-12 Sulfuric acid rycycle apparatus. HK1047270A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000354784A JP3635026B2 (en) 2000-06-14 2000-11-21 Sulfuric acid recycling equipment

Publications (1)

Publication Number Publication Date
HK1047270A1 true HK1047270A1 (en) 2003-02-14

Family

ID=18827309

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02109012A HK1047270A1 (en) 2000-11-21 2002-12-12 Sulfuric acid rycycle apparatus.

Country Status (3)

Country Link
CN (1) CN1191192C (en)
HK (1) HK1047270A1 (en)
SG (1) SG119142A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5572198B2 (en) * 2011-10-31 2014-08-13 セメス株式会社 Substrate processing apparatus and chemical solution recycling method
CN108550519A (en) * 2018-06-08 2018-09-18 东莞市中图半导体科技有限公司 A kind of cleaning device of semiconductor wafer
CN110272028B (en) * 2019-07-01 2023-12-01 中国华电科工集团有限公司 SO 3 Standard gas preparation device and method
CN111321423B (en) * 2020-01-17 2021-06-11 湖北永绍科技股份有限公司 Method for recovering sulfuric acid from waste sulfuric acid containing hydrogen peroxide
CN111729893A (en) * 2020-05-20 2020-10-02 宁夏隆基硅材料有限公司 Semiconductor waste degumming method and device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4980032A (en) * 1988-08-12 1990-12-25 Alameda Instruments, Inc. Distillation method and apparatus for reprocessing sulfuric acid
JPH03147323A (en) * 1989-11-01 1991-06-24 Matsushita Electric Ind Co Ltd Cleaning system
JP3087680B2 (en) * 1997-04-04 2000-09-11 日本電気株式会社 Semiconductor manufacturing equipment
US5963878A (en) * 1998-07-30 1999-10-05 Noram Engineering & Constructors Ltd. Nitration process

Also Published As

Publication number Publication date
SG119142A1 (en) 2006-02-28
CN1191192C (en) 2005-03-02
CN1354127A (en) 2002-06-19

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20161121