GR3005593T3 - - Google Patents

Info

Publication number
GR3005593T3
GR3005593T3 GR920401893T GR920401893T GR3005593T3 GR 3005593 T3 GR3005593 T3 GR 3005593T3 GR 920401893 T GR920401893 T GR 920401893T GR 920401893 T GR920401893 T GR 920401893T GR 3005593 T3 GR3005593 T3 GR 3005593T3
Authority
GR
Greece
Prior art keywords
substituted
radiation sensitive
aromatic
divalent radical
unsubsti
Prior art date
Application number
GR920401893T
Other languages
Greek (el)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GR3005593T3 publication Critical patent/GR3005593T3/el

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Abstract

Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: in which, R represents H or CH₃; each R₁, which may be the same or different represents H or alkyl; R₂ represents a single bond or a substituted or unsubsti­tuted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.
GR920401893T 1986-02-12 1992-09-03 GR3005593T3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868603405A GB8603405D0 (en) 1986-02-12 1986-02-12 Radiation sensitive material

Publications (1)

Publication Number Publication Date
GR3005593T3 true GR3005593T3 (en) 1993-06-07

Family

ID=10592907

Family Applications (1)

Application Number Title Priority Date Filing Date
GR920401893T GR3005593T3 (en) 1986-02-12 1992-09-03

Country Status (14)

Country Link
US (1) US4902601A (en)
EP (1) EP0233072B1 (en)
JP (1) JP2545219B2 (en)
AT (1) ATE80232T1 (en)
AU (1) AU588426B2 (en)
CA (1) CA1326101C (en)
DE (1) DE3781422T2 (en)
ES (1) ES2035039T3 (en)
FI (1) FI87609C (en)
GB (1) GB8603405D0 (en)
GR (1) GR3005593T3 (en)
NO (1) NO167583C (en)
NZ (1) NZ219229A (en)
ZA (1) ZA87952B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8820547D0 (en) * 1988-08-31 1988-09-28 Vickers Plc Improvements in/relating to polymeric compounds
US5094765A (en) * 1990-04-30 1992-03-10 Texaco Inc. Lubricating oil composition
US5206349A (en) * 1990-08-10 1993-04-27 Toyo Gosei Kogy Co., Ltd. Aromatic diazo compounds and photosensitive compositions using the same
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
NL9200186A (en) * 1992-02-03 1993-09-01 Dsm Nv IONOGENIC DISPENSER APPLICABLE IN AQUEOUS DISPERSIONS.
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
US5846685A (en) * 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
EP1263800B1 (en) * 2001-01-04 2006-11-08 Council of Scientific and Industrial Research Linker based solid support for peptide and small molecule organic synthesis

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230087A (en) * 1959-02-26 1966-01-18 Azoplate Corp Light-sensitive polymeric diazonium and azidoacrylamido reproduction materials and process for making plates therefrom
DE1114704B (en) * 1959-02-26 1961-10-05 Kalle Ag Photosensitive material
CA924954A (en) * 1968-06-21 1973-04-24 Polychrome Corporation Resin-diazo light-sensitive materials
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
JPS54135525A (en) * 1978-04-12 1979-10-20 Konishiroku Photo Ind Co Ltd Photosensitive material
FI71845C (en) * 1979-12-18 1987-02-09 Vickers Ltd FOERBAETTRINGAR ANGAOENDE STRAOLNINGSKAENSLIGA MATERIAL.
JPS58127923A (en) * 1982-01-26 1983-07-30 Fuji Photo Film Co Ltd Photosensitive composition
JPS59101644A (en) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd Photosensitive composition
US4458001A (en) * 1982-12-29 1984-07-03 Polaroid Corporation β-Eliminating polymers for diffusion control in photographic products
CA1272544A (en) * 1985-05-27 1990-08-07 Satoshi Urano Functional polymers and their production

Also Published As

Publication number Publication date
ZA87952B (en) 1988-05-25
AU588426B2 (en) 1989-09-14
CA1326101C (en) 1994-01-11
JP2545219B2 (en) 1996-10-16
FI87609B (en) 1992-10-15
ES2035039T3 (en) 1993-04-16
JPS62283330A (en) 1987-12-09
US4902601A (en) 1990-02-20
DE3781422T2 (en) 1993-02-11
NO167583B (en) 1991-08-12
NZ219229A (en) 1989-01-27
NO167583C (en) 1991-11-20
ATE80232T1 (en) 1992-09-15
NO870547L (en) 1987-08-13
EP0233072A3 (en) 1988-06-01
DE3781422D1 (en) 1992-10-08
FI870601A0 (en) 1987-02-12
AU6872387A (en) 1987-08-13
GB8603405D0 (en) 1986-03-19
EP0233072B1 (en) 1992-09-02
FI870601A (en) 1987-08-13
NO870547D0 (en) 1987-02-11
EP0233072A2 (en) 1987-08-19
FI87609C (en) 1993-01-25

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