GB9917305D0 - Method and apparatus for anisotropic etching - Google Patents
Method and apparatus for anisotropic etchingInfo
- Publication number
- GB9917305D0 GB9917305D0 GBGB9917305.6A GB9917305A GB9917305D0 GB 9917305 D0 GB9917305 D0 GB 9917305D0 GB 9917305 A GB9917305 A GB 9917305A GB 9917305 D0 GB9917305 D0 GB 9917305D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- anisotropic etching
- anisotropic
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9917305.6A GB9917305D0 (en) | 1999-07-23 | 1999-07-23 | Method and apparatus for anisotropic etching |
PCT/GB2000/002786 WO2001008207A1 (en) | 1999-07-23 | 2000-07-24 | Method and apparatus for anisotropic etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9917305.6A GB9917305D0 (en) | 1999-07-23 | 1999-07-23 | Method and apparatus for anisotropic etching |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9917305D0 true GB9917305D0 (en) | 1999-09-22 |
Family
ID=10857802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9917305.6A Ceased GB9917305D0 (en) | 1999-07-23 | 1999-07-23 | Method and apparatus for anisotropic etching |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB9917305D0 (en) |
WO (1) | WO2001008207A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6284666B1 (en) * | 2000-05-31 | 2001-09-04 | International Business Machines Corporation | Method of reducing RIE lag for deep trench silicon etching |
JP2012521075A (en) * | 2009-03-17 | 2012-09-10 | ロート ウント ラウ アーゲー | Substrate processing apparatus and substrate processing method |
JP2022519724A (en) * | 2019-02-08 | 2022-03-24 | コーニング インコーポレイテッド | A method for laser machining transparent workpieces using a pulsed laser beam focal lens and steam etching |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4749440A (en) * | 1985-08-28 | 1988-06-07 | Fsi Corporation | Gaseous process and apparatus for removing films from substrates |
DE4241045C1 (en) * | 1992-12-05 | 1994-05-26 | Bosch Gmbh Robert | Process for anisotropic etching of silicon |
EP0822582B1 (en) * | 1996-08-01 | 2003-10-01 | Surface Technology Systems Plc | Method of etching substrates |
US5899741A (en) * | 1998-03-18 | 1999-05-04 | Taiwan Semiconductor Manufacturing Company Ltd. | Method of manufacturing low resistance and low junction leakage contact |
-
1999
- 1999-07-23 GB GBGB9917305.6A patent/GB9917305D0/en not_active Ceased
-
2000
- 2000-07-24 WO PCT/GB2000/002786 patent/WO2001008207A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2001008207A8 (en) | 2001-07-12 |
WO2001008207A1 (en) | 2001-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2001247753A1 (en) | Method and apparatus for integrated-battery devices | |
GB0014059D0 (en) | Method and apparatus | |
GB0004354D0 (en) | Apparatus and method | |
AU2001292202A1 (en) | Method and apparatus for shape deformation and placement | |
SG92720A1 (en) | Method and apparatus for etching silicon | |
GB2385363B (en) | An apparatus and method for coupling two elements | |
GB0008300D0 (en) | Method and apparatus | |
GB0005886D0 (en) | Elector-plating apparatus and method | |
SG97160A1 (en) | Placement system apparatus and method | |
GB9917305D0 (en) | Method and apparatus for anisotropic etching | |
GB2352900B (en) | Positioning apparatus and method | |
GB2376363B (en) | Positioning apparatus and method | |
GB9911401D0 (en) | Method and apparatus for anisotropic etching | |
GB9921524D0 (en) | Method and apparatus | |
GB9921785D0 (en) | Apparatus and method | |
GB9815931D0 (en) | Method and apparatus for anisotropic etching | |
GB9823364D0 (en) | Method and apparatus for anisotropic etching | |
GB9910725D0 (en) | Method and apparatus for antisotropic etching | |
EP1096553A4 (en) | Anisotropic etching method and apparatus | |
GB0010008D0 (en) | Method and apparatus | |
GB9924191D0 (en) | Method and apparatus | |
GB9905441D0 (en) | Method and apparatus | |
GB0011023D0 (en) | Method and apparatus for facilitating tranactions | |
HUP9902394A2 (en) | Method and apparatus for tampon-printing | |
GB9906054D0 (en) | Method and apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |