GB9702410D0 - Method and apparatus for treating a semiconductor wafer - Google Patents

Method and apparatus for treating a semiconductor wafer

Info

Publication number
GB9702410D0
GB9702410D0 GBGB9702410.3A GB9702410A GB9702410D0 GB 9702410 D0 GB9702410 D0 GB 9702410D0 GB 9702410 A GB9702410 A GB 9702410A GB 9702410 D0 GB9702410 D0 GB 9702410D0
Authority
GB
United Kingdom
Prior art keywords
treating
semiconductor wafer
wafer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GBGB9702410.3A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Electrotech Equipments Ltd
Original Assignee
Electrotech Equipments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electrotech Equipments Ltd filed Critical Electrotech Equipments Ltd
Priority to GBGB9702410.3A priority Critical patent/GB9702410D0/en
Publication of GB9702410D0 publication Critical patent/GB9702410D0/en
Priority to GB9724096A priority patent/GB2319532B/en
Priority to GB9724440A priority patent/GB2319533B/en
Priority to KR1019970061321A priority patent/KR100489141B1/en
Priority to JP9321638A priority patent/JPH10199831A/en
Priority to JP9321637A priority patent/JPH10189494A/en
Priority to CN97126177.6A priority patent/CN1110844C/en
Priority to US08/975,705 priority patent/US6174823B1/en
Priority to DE19751785A priority patent/DE19751785B4/en
Priority to DE19751784A priority patent/DE19751784A1/en
Priority to CNB971231877A priority patent/CN1149644C/en
Priority to US08/975,449 priority patent/US6169027B1/en
Pending legal-status Critical Current

Links

GBGB9702410.3A 1996-11-22 1997-02-06 Method and apparatus for treating a semiconductor wafer Pending GB9702410D0 (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
GBGB9702410.3A GB9702410D0 (en) 1997-02-06 1997-02-06 Method and apparatus for treating a semiconductor wafer
GB9724096A GB2319532B (en) 1996-11-22 1997-11-14 Method and apparatus for treating a semiconductor wafer
GB9724440A GB2319533B (en) 1996-11-22 1997-11-20 Methods of forming a barrier layer
KR1019970061321A KR100489141B1 (en) 1996-11-22 1997-11-20 How to fill the recesses on the workpiece surface with conductive material
US08/975,449 US6169027B1 (en) 1996-11-22 1997-11-21 Method of removing surface oxides found on a titanium oxynitride layer using a nitrogen containing plasma
JP9321638A JPH10199831A (en) 1996-11-22 1997-11-21 Method of forming barrier layer
JP9321637A JPH10189494A (en) 1996-11-22 1997-11-21 Method and system for processing semiconductor wafer
CN97126177.6A CN1110844C (en) 1996-11-22 1997-11-21 Methods of forming barrier layer
US08/975,705 US6174823B1 (en) 1996-11-22 1997-11-21 Methods of forming a barrier layer
DE19751785A DE19751785B4 (en) 1996-11-22 1997-11-21 Process for treating a semiconductor wafer
DE19751784A DE19751784A1 (en) 1996-11-22 1997-11-21 Method for producing a barrier layer
CNB971231877A CN1149644C (en) 1996-11-22 1997-11-21 Method and apparatus for treating semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9702410.3A GB9702410D0 (en) 1997-02-06 1997-02-06 Method and apparatus for treating a semiconductor wafer

Publications (1)

Publication Number Publication Date
GB9702410D0 true GB9702410D0 (en) 1997-03-26

Family

ID=10807183

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB9702410.3A Pending GB9702410D0 (en) 1996-11-22 1997-02-06 Method and apparatus for treating a semiconductor wafer

Country Status (1)

Country Link
GB (1) GB9702410D0 (en)

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