GB9616221D0 - A method of etch depth control in sintered workpieces - Google Patents
A method of etch depth control in sintered workpiecesInfo
- Publication number
- GB9616221D0 GB9616221D0 GBGB9616221.9A GB9616221A GB9616221D0 GB 9616221 D0 GB9616221 D0 GB 9616221D0 GB 9616221 A GB9616221 A GB 9616221A GB 9616221 D0 GB9616221 D0 GB 9616221D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- depth control
- etch depth
- sintered workpieces
- workpieces
- sintered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9616221.9A GB9616221D0 (en) | 1996-08-01 | 1996-08-01 | A method of etch depth control in sintered workpieces |
PCT/GB1997/001941 WO1998005605A1 (en) | 1996-08-01 | 1997-07-17 | A method of etch depth control in sintered workpieces |
AU35536/97A AU3553697A (en) | 1996-08-01 | 1997-07-17 | A method of etch depth control in sintered workpieces |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9616221.9A GB9616221D0 (en) | 1996-08-01 | 1996-08-01 | A method of etch depth control in sintered workpieces |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9616221D0 true GB9616221D0 (en) | 1996-09-11 |
Family
ID=10797888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9616221.9A Pending GB9616221D0 (en) | 1996-08-01 | 1996-08-01 | A method of etch depth control in sintered workpieces |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU3553697A (en) |
GB (1) | GB9616221D0 (en) |
WO (1) | WO1998005605A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6949202B1 (en) | 1999-10-26 | 2005-09-27 | Reflectivity, Inc | Apparatus and method for flow of process gas in an ultra-clean environment |
US7041224B2 (en) | 1999-10-26 | 2006-05-09 | Reflectivity, Inc. | Method for vapor phase etching of silicon |
US6290864B1 (en) | 1999-10-26 | 2001-09-18 | Reflectivity, Inc. | Fluoride gas etching of silicon with improved selectivity |
US7189332B2 (en) | 2001-09-17 | 2007-03-13 | Texas Instruments Incorporated | Apparatus and method for detecting an endpoint in a vapor phase etch |
US7645704B2 (en) | 2003-09-17 | 2010-01-12 | Texas Instruments Incorporated | Methods and apparatus of etch process control in fabrications of microstructures |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4367044A (en) * | 1980-12-31 | 1983-01-04 | International Business Machines Corp. | Situ rate and depth monitor for silicon etching |
US4435898A (en) * | 1982-03-22 | 1984-03-13 | International Business Machines Corporation | Method for making a base etched transistor integrated circuit |
JPH03196521A (en) * | 1989-12-25 | 1991-08-28 | Nec Kansai Ltd | Manufacture of semiconductor device |
-
1996
- 1996-08-01 GB GBGB9616221.9A patent/GB9616221D0/en active Pending
-
1997
- 1997-07-17 AU AU35536/97A patent/AU3553697A/en not_active Abandoned
- 1997-07-17 WO PCT/GB1997/001941 patent/WO1998005605A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1998005605A1 (en) | 1998-02-12 |
AU3553697A (en) | 1998-02-25 |
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