GB9523993D0 - Organometallic complexes of aluminium,gallium and indium - Google Patents

Organometallic complexes of aluminium,gallium and indium

Info

Publication number
GB9523993D0
GB9523993D0 GBGB9523993.5A GB9523993A GB9523993D0 GB 9523993 D0 GB9523993 D0 GB 9523993D0 GB 9523993 A GB9523993 A GB 9523993A GB 9523993 D0 GB9523993 D0 GB 9523993D0
Authority
GB
United Kingdom
Prior art keywords
gallium
indium
aluminium
organometallic complexes
organometallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB9523993.5A
Other versions
GB2295393B (en
GB2295393A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Innospec Ltd
Original Assignee
Associated Octel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Associated Octel Co Ltd filed Critical Associated Octel Co Ltd
Publication of GB9523993D0 publication Critical patent/GB9523993D0/en
Publication of GB2295393A publication Critical patent/GB2295393A/en
Application granted granted Critical
Publication of GB2295393B publication Critical patent/GB2295393B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/06—Aluminium compounds
    • C07F5/061—Aluminium compounds with C-aluminium linkage
    • C07F5/066—Aluminium compounds with C-aluminium linkage compounds with Al linked to an element other than Al, C, H or halogen (this includes Al-cyanide linkage)
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C23C16/20—Deposition of aluminium only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
GB9523993A 1994-11-23 1995-11-23 Organometallic complexes of aluminium,gallium and indium Expired - Fee Related GB2295393B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9423613A GB9423613D0 (en) 1994-11-23 1994-11-23 Organometallic complexes of aluminium, gallium and indium

Publications (3)

Publication Number Publication Date
GB9523993D0 true GB9523993D0 (en) 1996-01-24
GB2295393A GB2295393A (en) 1996-05-29
GB2295393B GB2295393B (en) 1998-08-19

Family

ID=10764832

Family Applications (2)

Application Number Title Priority Date Filing Date
GB9423613A Pending GB9423613D0 (en) 1994-11-23 1994-11-23 Organometallic complexes of aluminium, gallium and indium
GB9523993A Expired - Fee Related GB2295393B (en) 1994-11-23 1995-11-23 Organometallic complexes of aluminium,gallium and indium

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB9423613A Pending GB9423613D0 (en) 1994-11-23 1994-11-23 Organometallic complexes of aluminium, gallium and indium

Country Status (1)

Country Link
GB (2) GB9423613D0 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6228794B1 (en) * 1997-03-14 2001-05-08 University Of Iowa Research Foundation Cationic group 13 complexes incorporating bidentate ligands as polymerization catalysts
BR9913692A (en) 1998-08-19 2001-06-05 Cordant Tech Inc Ablative rocket assembly materials formed of solvent-spun cellulosic precursors, and insulation or thermal protection process for a rocket assembly with the same
EP2182088B1 (en) 2002-11-15 2013-07-17 President and Fellows of Harvard College Atomic layer deposition using metal amidinates
US9029189B2 (en) 2003-11-14 2015-05-12 President And Fellows Of Harvard College Bicyclic guanidines, metal complexes thereof and their use in vapor deposition

Also Published As

Publication number Publication date
GB9423613D0 (en) 1995-01-11
GB2295393B (en) 1998-08-19
GB2295393A (en) 1996-05-29

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee