GB9400855D0 - Electrochemical deposition device and apparatus and method of electrochemical deposition using the same - Google Patents

Electrochemical deposition device and apparatus and method of electrochemical deposition using the same

Info

Publication number
GB9400855D0
GB9400855D0 GB9400855A GB9400855A GB9400855D0 GB 9400855 D0 GB9400855 D0 GB 9400855D0 GB 9400855 A GB9400855 A GB 9400855A GB 9400855 A GB9400855 A GB 9400855A GB 9400855 D0 GB9400855 D0 GB 9400855D0
Authority
GB
United Kingdom
Prior art keywords
electrochemical deposition
same
deposition device
electrochemical
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB9400855A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Warwick
Original Assignee
University of Warwick
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Warwick filed Critical University of Warwick
Priority to GB9400855A priority Critical patent/GB9400855D0/en
Publication of GB9400855D0 publication Critical patent/GB9400855D0/en
Priority to JP7518926A priority patent/JPH09511017A/en
Priority to EP95905716A priority patent/EP0740711A1/en
Priority to PCT/GB1995/000090 priority patent/WO1995019458A1/en
Priority to AU14224/95A priority patent/AU1422495A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/22—Servicing or operating apparatus or multistep processes
GB9400855A 1994-01-18 1994-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same Pending GB9400855D0 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB9400855A GB9400855D0 (en) 1994-01-18 1994-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same
JP7518926A JPH09511017A (en) 1994-01-18 1995-01-18 Electrochemical deposition device and apparatus and electrochemical deposition method using them
EP95905716A EP0740711A1 (en) 1994-01-18 1995-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same
PCT/GB1995/000090 WO1995019458A1 (en) 1994-01-18 1995-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same
AU14224/95A AU1422495A (en) 1994-01-18 1995-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9400855A GB9400855D0 (en) 1994-01-18 1994-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same

Publications (1)

Publication Number Publication Date
GB9400855D0 true GB9400855D0 (en) 1994-03-16

Family

ID=10748937

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9400855A Pending GB9400855D0 (en) 1994-01-18 1994-01-18 Electrochemical deposition device and apparatus and method of electrochemical deposition using the same

Country Status (5)

Country Link
EP (1) EP0740711A1 (en)
JP (1) JPH09511017A (en)
AU (1) AU1422495A (en)
GB (1) GB9400855D0 (en)
WO (1) WO1995019458A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9514754D0 (en) * 1995-07-19 1995-09-20 Univ Warwick Conducting polymer films

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51137629A (en) * 1975-05-23 1976-11-27 Nippon Electro Plating Highhspeed continuous plating method
US4367123A (en) * 1980-07-09 1983-01-04 Olin Corporation Precision spot plating process and apparatus
DE3404059A1 (en) * 1984-02-06 1985-08-08 Saafo AG, Zürich DEVICE FOR GALVANIC TREATING WORKPIECES
CH684840A5 (en) * 1991-06-11 1995-01-13 Electroplating Eng Eesa Cell for selectively plated electrolytically selected areas of metal parts arranged in band.

Also Published As

Publication number Publication date
WO1995019458A1 (en) 1995-07-20
EP0740711A1 (en) 1996-11-06
AU1422495A (en) 1995-08-01
JPH09511017A (en) 1997-11-04

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