GB935250A - Improvements in or relating to photo reproduction coatings for printing plates - Google Patents

Improvements in or relating to photo reproduction coatings for printing plates

Info

Publication number
GB935250A
GB935250A GB1242/60A GB124260A GB935250A GB 935250 A GB935250 A GB 935250A GB 1242/60 A GB1242/60 A GB 1242/60A GB 124260 A GB124260 A GB 124260A GB 935250 A GB935250 A GB 935250A
Authority
GB
United Kingdom
Prior art keywords
residues
esters
substituted
relating
benzene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1242/60A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB935250A publication Critical patent/GB935250A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/71—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
GB1242/60A 1959-01-21 1960-01-13 Improvements in or relating to photo reproduction coatings for printing plates Expired GB935250A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK36769A DE1118606B (de) 1959-01-21 1959-01-21 Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
GB935250A true GB935250A (en) 1963-08-28

Family

ID=7220794

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1242/60A Expired GB935250A (en) 1959-01-21 1960-01-13 Improvements in or relating to photo reproduction coatings for printing plates

Country Status (7)

Country Link
US (2) US3188210A (US06291589-20010918-C00001.png)
BE (1) BE586713A (US06291589-20010918-C00001.png)
CH (1) CH390053A (US06291589-20010918-C00001.png)
DE (1) DE1118606B (US06291589-20010918-C00001.png)
FR (1) FR1260028A (US06291589-20010918-C00001.png)
GB (1) GB935250A (US06291589-20010918-C00001.png)
NL (2) NL247588A (US06291589-20010918-C00001.png)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407926A (en) 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
EP0488686A1 (en) * 1990-11-28 1992-06-03 Hoechst Celanese Corporation A process of making naphthoquinone diazide esters using lactone solvents
US5143815A (en) * 1987-08-31 1992-09-01 Hoechst Aktiengesellschaft Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture
US5413899A (en) * 1991-11-13 1995-05-09 Hoechst Aktiengesellschaft Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters
US5514515A (en) * 1995-05-24 1996-05-07 Shipley Company, L.L.C. Photoactive compounds having a heterocyclic group used in photoresist compositions
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions

Families Citing this family (76)

* Cited by examiner, † Cited by third party
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US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US3857896A (en) * 1967-09-13 1974-12-31 R Desjarlais Substituted diresorcyl sulfide and sulfoxide compounds
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US4024122A (en) * 1973-02-12 1977-05-17 Rca Corporation Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3124936A1 (de) * 1981-06-25 1983-01-20 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
US4596763A (en) * 1984-10-01 1986-06-24 American Hoechst Corporation Positive photoresist processing with mid U-V range exposure
JPS62123444A (ja) 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US4737437A (en) * 1986-03-27 1988-04-12 East Shore Chemical Co. Light sensitive diazo compound, composition and method of making the composition
DE3635303A1 (de) 1986-10-17 1988-04-28 Hoechst Ag Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
JP2568827B2 (ja) * 1986-10-29 1997-01-08 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5081001A (en) * 1987-05-22 1992-01-14 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4797345A (en) * 1987-07-01 1989-01-10 Olin Hunt Specialty Products, Inc. Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5290656A (en) * 1988-05-07 1994-03-01 Sumitomo Chemical Company, Limited Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
JP2552900B2 (ja) * 1988-06-07 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5456996A (en) * 1988-07-07 1995-10-10 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
US5861229A (en) * 1988-07-07 1999-01-19 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
EP0358871B1 (en) * 1988-07-07 1998-09-30 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
EP0384892A1 (de) * 1989-02-23 1990-08-29 Ciba-Geigy Ag Photoresist-Zusammensetzungen
US5200293A (en) * 1989-02-23 1993-04-06 Ciba-Geigy Corporation Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPH087433B2 (ja) * 1989-04-19 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
US5256521A (en) * 1989-09-19 1993-10-26 Ocg Microelectronic Materials, Inc. Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer
US5215856A (en) * 1989-09-19 1993-06-01 Ocg Microelectronic Materials, Inc. Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements
JP2571136B2 (ja) * 1989-11-17 1997-01-16 日本ゼオン株式会社 ポジ型レジスト組成物
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物
DE4134526A1 (de) * 1990-10-18 1992-05-14 Toyo Gosei Kogyo Kk Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung
US5260162A (en) * 1990-12-17 1993-11-09 Khanna Dinesh N Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
WO1992012205A1 (en) * 1991-01-11 1992-07-23 Sumitomo Chemical Company, Limited Positive resist composition
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
JP3391471B2 (ja) * 1992-02-25 2003-03-31 住友化学工業株式会社 ポジ型レジスト組成物
WO1993018438A1 (en) * 1992-03-06 1993-09-16 Hoechst Celanese Corporation Positive photoresist composition
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US5384228A (en) * 1992-04-14 1995-01-24 Tokyo Ohka Kogyo Co., Ltd. Alkali-developable positive-working photosensitive resin composition
US5401605A (en) * 1992-08-12 1995-03-28 Tokyo Ohka Kogyo Co., Ltd. Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
US6573022B1 (en) 1997-10-17 2003-06-03 Fuji Photo Film Co., Ltd. Positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
JP4219435B2 (ja) * 1997-12-15 2009-02-04 東京応化工業株式会社 ポリフェノールジエステル化物の製造方法およびポジ型感光性組成物
JP4179579B2 (ja) * 2000-05-08 2008-11-12 東洋合成工業株式会社 １，２−ナフトキノンジアジド系感光剤の製造方法
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP1332000B1 (en) * 2000-10-30 2012-06-20 Sequenom, Inc. Method for delivery of submicroliter volumes onto a substrate
DE60144036D1 (de) 2000-11-30 2011-03-24 Fujifilm Corp Flachdruckplattenvorläufer
US6936399B2 (en) 2001-10-22 2005-08-30 Fuji Photo Film Co., Ltd. Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate
FR2843558B1 (fr) 2002-08-13 2004-10-29 Jean Marie Nouel Procede de copie d'une plaque pour impression en offset humide
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
US7081330B2 (en) 2002-09-20 2006-07-25 Fuji Photo Film Co., Ltd. Method of making lithographic printing plate
US7090958B2 (en) * 2003-04-11 2006-08-15 Ppg Industries Ohio, Inc. Positive photoresist compositions having enhanced processing time
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2007070694A (ja) * 2005-09-07 2007-03-22 Konica Minolta Medical & Graphic Inc 帯状アルミニウム板の陽極酸化処理方法、平版印刷版材料用支持体及び陽極酸化処理装置
US20090180931A1 (en) 2007-09-17 2009-07-16 Sequenom, Inc. Integrated robotic sample transfer device
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
EP2218519A4 (en) 2007-11-14 2012-03-21 Fujifilm Corp METHOD FOR DRYING A COATING FILM AND METHOD FOR PRODUCING A PRECURSOR FOR A LITHOGRAPHIC PRINTING PLATE
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
EP2749946B1 (en) * 2008-07-16 2015-09-09 Nissan Chemical Industries, Ltd. Positive resist composition;patttern forming method; microlens and planarization film therefrom; solid-state imaging device, liquid crystal display device and led display device comprising the same
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
KR101146622B1 (ko) * 2009-08-31 2012-05-16 금호석유화학 주식회사 감광성 화합물 및 이를 포함하는 감광성 조성물
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
US8608878B2 (en) * 2010-09-08 2013-12-17 Ensign-Bickford Aerospace & Defense Company Slow burning heat generating structure
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB537696A (en) * 1940-01-03 1941-07-02 Kodak Ltd Improvements in and relating to colour-forming development and colour photographic elements
BE497135A (US06291589-20010918-C00001.png) * 1949-07-23
BE508016A (US06291589-20010918-C00001.png) * 1950-12-23
AT182606B (de) * 1951-04-13 1955-07-25 Hans Dr Ing Deckel Photographischer Objektivveschluß mit einem Blitzlicht-Gleichstimmer
NL185407B (nl) * 1953-03-11 Mitsui Petrochemical Ind Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze.
BE539176A (US06291589-20010918-C00001.png) * 1954-09-08

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407926A (en) 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
US5143815A (en) * 1987-08-31 1992-09-01 Hoechst Aktiengesellschaft Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture
EP0488686A1 (en) * 1990-11-28 1992-06-03 Hoechst Celanese Corporation A process of making naphthoquinone diazide esters using lactone solvents
US5413899A (en) * 1991-11-13 1995-05-09 Hoechst Aktiengesellschaft Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters
US5514515A (en) * 1995-05-24 1996-05-07 Shipley Company, L.L.C. Photoactive compounds having a heterocyclic group used in photoresist compositions
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions

Also Published As

Publication number Publication date
US3184310A (en) 1965-05-18
NL130248C (US06291589-20010918-C00001.png)
BE586713A (US06291589-20010918-C00001.png)
DE1118606B (de) 1961-11-30
FR1260028A (fr) 1961-05-05
CH390053A (de) 1965-03-31
US3188210A (en) 1965-06-08
NL247588A (US06291589-20010918-C00001.png)

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