GB9210887D0 - Resolving slit assembly and method of ion implantation - Google Patents

Resolving slit assembly and method of ion implantation

Info

Publication number
GB9210887D0
GB9210887D0 GB929210887A GB9210887A GB9210887D0 GB 9210887 D0 GB9210887 D0 GB 9210887D0 GB 929210887 A GB929210887 A GB 929210887A GB 9210887 A GB9210887 A GB 9210887A GB 9210887 D0 GB9210887 D0 GB 9210887D0
Authority
GB
United Kingdom
Prior art keywords
ion implantation
slit assembly
resolving slit
resolving
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB929210887A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Superion Ltd
Original Assignee
Superion Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Superion Ltd filed Critical Superion Ltd
Priority to GB929210887A priority Critical patent/GB9210887D0/en
Publication of GB9210887D0 publication Critical patent/GB9210887D0/en
Priority to PCT/GB1993/001034 priority patent/WO1993023871A1/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB929210887A 1992-05-21 1992-05-21 Resolving slit assembly and method of ion implantation Pending GB9210887D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB929210887A GB9210887D0 (en) 1992-05-21 1992-05-21 Resolving slit assembly and method of ion implantation
PCT/GB1993/001034 WO1993023871A1 (en) 1992-05-21 1993-05-20 Resolving slit assembly and method of ion implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB929210887A GB9210887D0 (en) 1992-05-21 1992-05-21 Resolving slit assembly and method of ion implantation

Publications (1)

Publication Number Publication Date
GB9210887D0 true GB9210887D0 (en) 1992-07-08

Family

ID=10715867

Family Applications (1)

Application Number Title Priority Date Filing Date
GB929210887A Pending GB9210887D0 (en) 1992-05-21 1992-05-21 Resolving slit assembly and method of ion implantation

Country Status (2)

Country Link
GB (1) GB9210887D0 (en)
WO (1) WO1993023871A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5629528A (en) * 1996-01-16 1997-05-13 Varian Associates, Inc. Charged particle beam system having beam-defining slit formed by rotating cyclinders
CN107195518A (en) 2017-06-22 2017-09-22 京东方科技集团股份有限公司 Ion implanting quantity regulating device and method, ion implantation device, determination methods

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2851610A (en) * 1954-09-08 1958-09-09 Akashi Kazuhiko Variable aperture for electron microscope
JPH0727766B2 (en) * 1983-08-15 1995-03-29 アプライド マテリアルズ インコーポレーテッド Ion implantation device and ion source device operating method
DE69026751T2 (en) * 1989-05-17 1996-11-14 Kobe Steel Ltd Ion beam focusing device

Also Published As

Publication number Publication date
WO1993023871A1 (en) 1993-11-25

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