GB915621A - New vinyl-substituted heterocyclic compounds and polymers derived therefrom - Google Patents
New vinyl-substituted heterocyclic compounds and polymers derived therefromInfo
- Publication number
- GB915621A GB915621A GB4076958A GB4076958A GB915621A GB 915621 A GB915621 A GB 915621A GB 4076958 A GB4076958 A GB 4076958A GB 4076958 A GB4076958 A GB 4076958A GB 915621 A GB915621 A GB 915621A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vinyl
- radical
- cyclic
- radicals
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 title abstract 5
- -1 fluoralkyl Chemical group 0.000 abstract 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 12
- 150000001875 compounds Chemical class 0.000 abstract 12
- 125000004429 atom Chemical group 0.000 abstract 10
- 125000000217 alkyl group Chemical group 0.000 abstract 8
- 239000008199 coating composition Substances 0.000 abstract 8
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 abstract 7
- 150000002148 esters Chemical class 0.000 abstract 7
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 abstract 6
- 125000004432 carbon atom Chemical group C* 0.000 abstract 6
- 125000004965 chloroalkyl group Chemical group 0.000 abstract 6
- 125000004966 cyanoalkyl group Chemical group 0.000 abstract 6
- 229910052739 hydrogen Inorganic materials 0.000 abstract 6
- 239000001257 hydrogen Substances 0.000 abstract 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 6
- 229920005989 resin Polymers 0.000 abstract 6
- 239000011347 resin Substances 0.000 abstract 6
- 229920002554 vinyl polymer Polymers 0.000 abstract 6
- MMEDJBFVJUFIDD-UHFFFAOYSA-N 2-[2-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC=C1CC(O)=O MMEDJBFVJUFIDD-UHFFFAOYSA-N 0.000 abstract 5
- 150000001241 acetals Chemical group 0.000 abstract 5
- 125000004122 cyclic group Chemical group 0.000 abstract 5
- 239000002904 solvent Substances 0.000 abstract 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 4
- 239000002253 acid Substances 0.000 abstract 4
- 125000003709 fluoroalkyl group Chemical group 0.000 abstract 4
- KMXIAPUAVNXUND-UHFFFAOYSA-N (2-ethenyl-5-methyl-1,3-dioxan-5-yl)methanol Chemical compound OCC1(C)COC(C=C)OC1 KMXIAPUAVNXUND-UHFFFAOYSA-N 0.000 abstract 3
- YRGUDTDALNUKIO-UHFFFAOYSA-N 3-(2-ethenyl-1,3-dioxepan-4-yl)propan-1-ol Chemical compound OCCCC1OC(OCCC1)C=C YRGUDTDALNUKIO-UHFFFAOYSA-N 0.000 abstract 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical group FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 abstract 3
- 125000004423 acyloxy group Chemical group 0.000 abstract 3
- 125000003342 alkenyl group Chemical group 0.000 abstract 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 abstract 3
- 125000003545 alkoxy group Chemical group 0.000 abstract 3
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 3
- 125000003118 aryl group Chemical group 0.000 abstract 3
- 229910052799 carbon Inorganic materials 0.000 abstract 3
- 239000000460 chlorine Chemical group 0.000 abstract 3
- 229910052801 chlorine Chemical group 0.000 abstract 3
- 239000010941 cobalt Substances 0.000 abstract 3
- 229910017052 cobalt Inorganic materials 0.000 abstract 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract 3
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 3
- 238000001035 drying Methods 0.000 abstract 3
- 239000011737 fluorine Chemical group 0.000 abstract 3
- 229910052731 fluorine Inorganic materials 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- 239000002023 wood Substances 0.000 abstract 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 abstract 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 abstract 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 2
- 239000011575 calcium Substances 0.000 abstract 2
- 229910052791 calcium Inorganic materials 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 2
- 239000010949 copper Substances 0.000 abstract 2
- 150000005690 diesters Chemical class 0.000 abstract 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 229910052742 iron Inorganic materials 0.000 abstract 2
- 239000011133 lead Substances 0.000 abstract 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 abstract 2
- 238000002156 mixing Methods 0.000 abstract 2
- 239000000178 monomer Substances 0.000 abstract 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N n-Decanedioic acid Natural products OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 abstract 2
- 125000005609 naphthenate group Chemical group 0.000 abstract 2
- 229910052759 nickel Inorganic materials 0.000 abstract 2
- 125000005474 octanoate group Chemical group 0.000 abstract 2
- 239000000049 pigment Substances 0.000 abstract 2
- 238000002360 preparation method Methods 0.000 abstract 2
- 150000003839 salts Chemical class 0.000 abstract 2
- 239000004408 titanium dioxide Substances 0.000 abstract 2
- 239000002966 varnish Substances 0.000 abstract 2
- 239000011701 zinc Substances 0.000 abstract 2
- 229910052725 zinc Inorganic materials 0.000 abstract 2
- JNISSCCQOBFNBA-UHFFFAOYSA-N (2-ethenyl-1,3-dioxan-5-yl)methanol Chemical compound C(=C)C1OCC(CO1)CO JNISSCCQOBFNBA-UHFFFAOYSA-N 0.000 abstract 1
- HOXJLJYTUNYRKS-UHFFFAOYSA-N (2-ethenyl-4-ethyl-5-propyl-1,3-dioxan-5-yl)methanol Chemical compound C(=C)C1OCC(C(O1)CC)(CO)CCC HOXJLJYTUNYRKS-UHFFFAOYSA-N 0.000 abstract 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- LGXVIGDEPROXKC-UHFFFAOYSA-N 1,1-dichloroethene Chemical compound ClC(Cl)=C LGXVIGDEPROXKC-UHFFFAOYSA-N 0.000 abstract 1
- IZRKUJREXIKAQM-UHFFFAOYSA-N 2,3-dichloropropanal Chemical compound ClCC(Cl)C=O IZRKUJREXIKAQM-UHFFFAOYSA-N 0.000 abstract 1
- VFXFHLGYUDXEKM-UHFFFAOYSA-N 2-(1,4-dioxan-2-yloxy)-1,4-dioxane Chemical compound C1OCCOC1OC1OCCOC1 VFXFHLGYUDXEKM-UHFFFAOYSA-N 0.000 abstract 1
- ORWAFQDZRMMTLE-UHFFFAOYSA-N 2-(hydroxymethyl)-1-phenylpropane-1,3-diol Chemical compound OCC(CO)C(O)C1=CC=CC=C1 ORWAFQDZRMMTLE-UHFFFAOYSA-N 0.000 abstract 1
- SZSSMFVYZRQGIM-UHFFFAOYSA-N 2-(hydroxymethyl)-2-propylpropane-1,3-diol Chemical compound CCCC(CO)(CO)CO SZSSMFVYZRQGIM-UHFFFAOYSA-N 0.000 abstract 1
- SFRDXVJWXWOTEW-UHFFFAOYSA-N 2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)CO SFRDXVJWXWOTEW-UHFFFAOYSA-N 0.000 abstract 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 abstract 1
- NOQIUEKRPXMRSL-UHFFFAOYSA-N 4-(hydroxymethyl)heptane-1,7-diol Chemical compound OCCCC(CO)CCCO NOQIUEKRPXMRSL-UHFFFAOYSA-N 0.000 abstract 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-M 9-cis,12-cis-Octadecadienoate Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC([O-])=O OYHQOLUKZRVURQ-HZJYTTRNSA-M 0.000 abstract 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 1
- UDSFAEKRVUSQDD-UHFFFAOYSA-N Dimethyl adipate Chemical compound COC(=O)CCCCC(=O)OC UDSFAEKRVUSQDD-UHFFFAOYSA-N 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000004606 Fillers/Extenders Substances 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- 229910000746 Structural steel Inorganic materials 0.000 abstract 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- UGZICOVULPINFH-UHFFFAOYSA-N acetic acid;butanoic acid Chemical compound CC(O)=O.CCCC(O)=O UGZICOVULPINFH-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 238000007605 air drying Methods 0.000 abstract 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical class OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 abstract 1
- 229920000180 alkyd Polymers 0.000 abstract 1
- 125000005907 alkyl ester group Chemical group 0.000 abstract 1
- 239000010425 asbestos Substances 0.000 abstract 1
- 229920005549 butyl rubber Polymers 0.000 abstract 1
- 239000006227 byproduct Substances 0.000 abstract 1
- 239000006229 carbon black Substances 0.000 abstract 1
- 239000001569 carbon dioxide Substances 0.000 abstract 1
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 1
- 238000005266 casting Methods 0.000 abstract 1
- 229920002678 cellulose Polymers 0.000 abstract 1
- 229920002301 cellulose acetate Polymers 0.000 abstract 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- DMEXFOUCEOWRGD-UHFFFAOYSA-N chloro-[chloro(dimethyl)silyl]oxy-dimethylsilane Chemical compound C[Si](C)(Cl)O[Si](C)(C)Cl DMEXFOUCEOWRGD-UHFFFAOYSA-N 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 235000019864 coconut oil Nutrition 0.000 abstract 1
- 239000003240 coconut oil Substances 0.000 abstract 1
- 239000004567 concrete Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- NZNMSOFKMUBTKW-UHFFFAOYSA-M cyclohexanecarboxylate Chemical compound [O-]C(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-M 0.000 abstract 1
- 210000003298 dental enamel Anatomy 0.000 abstract 1
- 238000007865 diluting Methods 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 abstract 1
- 239000000806 elastomer Substances 0.000 abstract 1
- 125000004185 ester group Chemical group 0.000 abstract 1
- 230000032050 esterification Effects 0.000 abstract 1
- 238000005886 esterification reaction Methods 0.000 abstract 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 abstract 1
- 125000001033 ether group Chemical group 0.000 abstract 1
- BDQLSFNBDZZVHL-UHFFFAOYSA-N ethyl 4-hydroxy-2-(1-hydroxyethyl)pentanoate Chemical compound C(=O)(OCC)C(C(C)O)CC(C)O BDQLSFNBDZZVHL-UHFFFAOYSA-N 0.000 abstract 1
- KKIYISFFZPZGLZ-UHFFFAOYSA-N ethyl 5-hydroxy-2-(2-hydroxyethyl)pentanoate Chemical compound CCOC(=O)C(CCO)CCCO KKIYISFFZPZGLZ-UHFFFAOYSA-N 0.000 abstract 1
- BWMHGMSGYSIWLC-UHFFFAOYSA-N ethyl 6-hydroxy-3-(hydroxymethyl)hexanoate Chemical compound C(=O)(OCC)CC(CO)CCCO BWMHGMSGYSIWLC-UHFFFAOYSA-N 0.000 abstract 1
- 239000004744 fabric Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 125000005456 glyceride group Chemical group 0.000 abstract 1
- 235000010985 glycerol esters of wood rosin Nutrition 0.000 abstract 1
- LTBLRTCVEAUSON-UHFFFAOYSA-N heptane-1,4,7-triol Chemical compound OCCCC(O)CCCO LTBLRTCVEAUSON-UHFFFAOYSA-N 0.000 abstract 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract 1
- 239000013067 intermediate product Substances 0.000 abstract 1
- 229940049918 linoleate Drugs 0.000 abstract 1
- 235000021388 linseed oil Nutrition 0.000 abstract 1
- 239000000944 linseed oil Substances 0.000 abstract 1
- 150000002689 maleic acids Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 125000005395 methacrylic acid group Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- AYPJVPWNLGHTEP-UHFFFAOYSA-N methyl 3,5-dihydroxyhexanoate Chemical compound COC(=O)CC(O)CC(C)O AYPJVPWNLGHTEP-UHFFFAOYSA-N 0.000 abstract 1
- 239000011707 mineral Substances 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 abstract 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 abstract 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 abstract 1
- 239000003921 oil Substances 0.000 abstract 1
- 235000019198 oils Nutrition 0.000 abstract 1
- 239000005012 oleoresinous Substances 0.000 abstract 1
- 150000001451 organic peroxides Chemical class 0.000 abstract 1
- 239000011505 plaster Substances 0.000 abstract 1
- 229920001084 poly(chloroprene) Polymers 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 150000007519 polyprotic acids Polymers 0.000 abstract 1
- 229920001296 polysiloxane Polymers 0.000 abstract 1
- 229920002635 polyurethane Polymers 0.000 abstract 1
- 239000004814 polyurethane Substances 0.000 abstract 1
- 230000037452 priming Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 abstract 1
- 239000011369 resultant mixture Substances 0.000 abstract 1
- 229910052895 riebeckite Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 159000000000 sodium salts Chemical class 0.000 abstract 1
- 235000015096 spirit Nutrition 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
- 229920003048 styrene butadiene rubber Polymers 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 abstract 1
- 239000000057 synthetic resin Substances 0.000 abstract 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings
- C07D407/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F24/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
New compounds, which may be used in coating compositions, contain 2-6 vinyl cycloacetal radicals having the structural formula <FORM:0915621/III/1> in which <FORM:0915621/III/2> represents carbon atoms in the ring, a being an integer having a value of at least 3, and all but one of the valencies of the carbon atoms being satisfied by hydrogen, or an alkyl, aryl, alkaryl, chloroalkyl, fluoroalkyl, alkoxyalkyl, chloroalkoxyalkyl, fluoroalkoxyalkyl, cyanoalkoxyalkyl, cyanoalkyl or alkenyl group, the remaining valence connecting the cyclic radical to at least one other such radical through an interposed polyvalent connecting radical, and R is hydrogen, fluorine or chlorine or an alkyl, cyano, acyloxy, chloroalkyl, fluoralkyl, cyanoalkyl, alkoxy or carbalkoxy radical. The interposed polyvalent radical contains in the chain of atoms directly connecting the cyclic radicals at least 2 different atoms, at least one of which is carbon. The preferred connecting groups are ester groups. The compounds can be used as coating compositions, if desired, with the addition of solvents or pigments. Driers, for example, the naphthenate, linoleate, resinate, tallate, octoate and other salts of metals such as cobalt, lead, iron, manganese, zinc, calcium, nickel or copper may be added to the coating compositions. The drying of the film may be speeded by heating, e.g. at 100 DEG -150 DEG F. or higher. They become substantially insoluble in solvents for the original material when 0,05% of cobalt (in the form of a 10% solution of cobalt octoate) is mixed with it and the resultant mixture is flowed on steel test panels standing in air at 68 DEG -80 DEG F. Examples are given of the preparation of coating compositions for wood and metal panels by mixing (a) titanium dioxide, an extender, linseed oil and an itaconic diester of 5 5-hydroxymethyl-5-methyl-2-vinyl-1,3-dioxane and (b) titanium dioxide, toluene, cobalt octoate and a sebacic acid diester of 5-hydroxymethyl-5-methyl-2-vinyl-1,3-dioxane or an o-phthalic acid diester of 4-hydroxypropyl-2-vinyl-1,3-dioxepane or a mixture of these. (Examples LXX and LXXI). Coating compositions containing the new compounds may be used on structural steel, structures and articles made of wood, metal, ceramics, glass, fabrics, fibres, plaster, concrete, asbestos and wire. It is usually desirable when treating wood to apply a priming coat of different composition. The coating compositions can also be used as primers or undercoats.ALSO:The invention comprises new compounds containing 2-6 vinyl cycloacetal radicals having the structural formula <FORM:0915621/IV(a)/1> in which <FORM:0915621/IV(a)/2> represents carbon atoms in the ring, a being at least 3, and all but one of the valencies of the carbon atoms being satisfied by hydrogen, or an alkyl, aryl, alkaryl, chloroalkyl, fluoroalkyl, alkoxyalkyl, chloroalkoxyalkyl, fluoroalkoxyalkyl, cyanoalkoxyalkyl, cyanoalkyl or alkenyl group, the remaining valence connecting the cyclic radical to at least one other such radical through an interposed polyvalent connecting radical, and R is hydrogen, fluorine or chlorine or an alkyl, cyano, acyloxy, chloroalkyl, fluoroalkyl, cyanoalkyl, alkoxy or carbalkoxy radical. The interposed polyvalent radical contains in the chain of atoms directly connecting the cyclic radicals at least 2 different atoms, at least one of which is carbon. The preferred connecting groups are ester or ether groups. Among the connecting groups specified are some containing silicon. For example, (a) a mixed dioxanyl-ethyl silicate ester is obtained by reacting 2-vinyl-4-ethyl-5-propyl-5-methylol-1,3-dioxane with tetraethyl silicate in toluene (Example XXXVIII) and (b) a bis-dioxanyl ether is prepared by reacting the sodium salt of 2-vinyl-5-methylol-1,3-dioxane with sym-dichloro-tetramethyldisiloxane in toluene (Example XXXIX). The new poly-vinylcycloacetal compounds may be used in air-drying coating compositions, both the cyclic acetal and vinyl groups disappearing as drying proceeds. Solvents and pigments may be added if required. The coating compositions may also contain known film-formers, e.g. glyceride oils, oil-modified alkyd resins, oleoresinous varnishes, synthetic resins such as alkylated urea-aldehyde resins, alkylated melamine aldehyde resins, polyepoxypolyhydroxy resins, phenol-aldehyde resins, polymers and copolymers of vinyl and vinylidene compounds; elastomers such as neoprene, styrene-butadiene rubbers and isobutylene-isoprene rubbers; cellulose esters such as cellulose acetate and acetate-butyrate; polyurethanes and silicones. There may also be added metallic driers, e.g. the naphthenates, linoleates, resinates, tallates and octoates of cobalt, lead, iron, manganese, zinc, calcium, nickel and copper. The drying may be hastened by heating, e.g. to 100 DEG -150 DEG F. The new vinyl cycloacetal compounds may be homopolymerized or copolymerized with other ethylenically unsaturated monomers. Examples are given of the preparation of (a) a black baking enamel by mixing carbon black, a coconut oil modified alkyl resin in toluene, a solution of butylated ureaformaldehyde resin in butanol, cobalt octoate and a diester obtained from dimethyl adipate and 4-hydroxypropyl-2-vinyl-1,3-dioxepane; (b) a clear varnish is prepared by dissolving ester gum in the diphthalate ester of 4-hydroxypropyl-2-vinyl-1,3-dioxepane under a blanket of carbon dioxide, diluting the mixture with mineral spirits and adding cobalt octoate (Example LXXIII); and polymers by treating the sebacic acid diester of 5-hydroxymethyl-5-methyl-2-vinyl-1,3-dioxane with styrene monomer or methyl methacrylate monomer in the presence of azobisisobutyronitrile (Examples LXXIV and LXXV). Other monomers which may be used to form polymers with the new compounds are acrylic, methacrylic and maleic acids and their esters, butadiene, acrylonitrile, vinyl chloride, vinylidine chloride and vinyl acetate. The polymerization may be carried out in bulk or in aqueous or organic media preferably in the presence of an organic peroxide, per-salts or an azo compound. The polymers are useful in coatings and in moulding and casting resins.ALSO:The invention comprises compounds containing 2-6 vinyl acetal radicals having the structural formula <FORM:0915621/IV (b)/1> in which <FORM:0915621/IV (b)/2> represents carbon atoms in the ring, a being an integer having a value of at least 3, and all but one of the valencies of said carbon atoms being satisfied by hydrogen, or an alkyl, aryl, alkaryl, chloroalkyl, fluoralkyl, alkoxyalkyl, chloroalkoxyalkyl, fluoroalkoxyalkyl, cyanoalkoxyalkyl, cyanoalkyl or alkenyl group, the remaining valence connecting the cyclic radical to at least one other such radical through an interposed polyvalent connecting radical, which contains in the chain of atoms directly connecting the cyclic radicals at least two different atoms, at least one of which is carbon; and R is hydrogen, fluorine, chlorine, or an alkyl, cyano, acyloxy, chloroalkyl, fluoroalkyl, cyanoalkyl, alkoxy or carbalkoxy radical. Examples of suitable polyvalent connecting radicals are, <FORM:0915621/IV (b)/3> -(OCH2CH2)-1-5 and -CH2-(OCH2CH2)1-5. In addition to compounds containing vinyl cyclic acetal radicals and connecting radicals as illustrated above the invention includes compounds containing bivalent intermediate or bridging radicals between the cyclic acetal rings and the polyvalent connecting radicals e.g. compounds having the connecting radical -CH2-OOC-C6H4-COO-CH2. The group <FORM:0915621/IV (b)/4> may be introduced into an intermediate by reacting acrolein or the appropriate a -substituted acrolein with a polyhydroxy compound as follows:- <FORM:0915621/IV (b)/5> Alternatively an intermediate product may be prepared as follows:- <FORM:0915621/IV (b)/6> is prepared by condensing 2,3-dichlorpropionaldehyde and trimethylolpropane and is dehydrochlorinated to give the group <FORM:0915621/IV (b)/7> The preferred class of new products is esters and these may be prepared by preparing a hydroxyalkyl 2-vinyl-1,3-cyclic acetal as above and reacting it with a C1-C6 alkyl ester or the acid chloride of the desired polycarboxylic acid, or reacting an acetoxyalkyl-2-vinyl-1-1,3-cyclic acetal with the desired polycarboxylic acid or a C1-C6 ester thereof, and eliminating acetic acid or alkyl acetate. Alternatively a haloalkyl-2-vinyl-1,3-cyclic acetal may be reacted with a salt of the desired polybasic acid. The preferred method of preparing the esters is by condensing substantially equimolar proportions of acrolein and a triol, e.g. trimethylolpropane, under mild acid conditions in a solvent forming a binary azeotrope with water, at a temperature below 130 DEG C. to give a hydroxyalkyl-2-vinyl-1,3-cyclic acetal and to esterify this by treatment with an alkyl ester of the desired acid, preferably under basic ester interchange conditions and in the presence of a solvent which forms a binary azeotrope with the alcohol by-product. It is particularly preferred to carry out the esterification in the presence of an alkyl orthotitanate. Suitable starting materials are (a) for cyclic acetals containing 6 atoms in the cyclic acetal ring (i.e. a = 3): trimethylolmethane, trimethylolethane, trimethylolpropane, trimethylolbutane, methyl 3,5-dihydroxy hexanoate, 1-phenyl-2-hydroxymethyl-1,3-propanediol and ethyl 4-(11,31-dihydroxypropyl)cyclohexane carboxylate; (b) for cyclic acetals containing 7 atoms in the cyclic acetal ring; (i.e. a = 4): 1,4,7-heptanetriol, ethyl 8,11-dihydroxy stearate and 3-carbethoxy-2,5-hexanediol; (c) for cyclic acetals containing 8 atoms in the cyclic acetal ring (a = 5): 4-hydroxymethyl-1,7-heptanediol, 2-carbethoxymethyl-1,5-pentanediol and ethyl-3,7-dihydroxy octanoate; and (d) for cyclic acetals containing 9 atoms in the cyclic acetal ring (a = 6): 3-carbethoxy-1,6-hexanediol. Suitable dicarboxylic
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68302157A | 1957-09-10 | 1957-09-10 | |
US73007058A | 1958-04-22 | 1958-04-22 | |
US737507A US3010918A (en) | 1957-09-10 | 1958-05-26 | Chemical compounds |
Publications (1)
Publication Number | Publication Date |
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GB915621A true GB915621A (en) | 1963-01-16 |
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ID=27418412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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GB4076958A Expired GB915621A (en) | 1957-09-10 | 1958-12-17 | New vinyl-substituted heterocyclic compounds and polymers derived therefrom |
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Cited By (1)
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WO2015182567A1 (en) * | 2014-05-28 | 2015-12-03 | 日本酢ビ・ポバール株式会社 | Dispersion stabilizer for suspension polymerization, method for producing vinyl polymer, and vinyl chloride resin |
-
1958
- 1958-12-17 GB GB4076958A patent/GB915621A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2015182567A1 (en) * | 2014-05-28 | 2015-12-03 | 日本酢ビ・ポバール株式会社 | Dispersion stabilizer for suspension polymerization, method for producing vinyl polymer, and vinyl chloride resin |
JPWO2015182567A1 (en) * | 2014-05-28 | 2017-04-20 | 日本酢ビ・ポバール株式会社 | Dispersion stabilizer for suspension polymerization, method for producing vinyl polymer, and vinyl chloride resin |
TWI656136B (en) * | 2014-05-28 | 2019-04-11 | 日商日本瓦姆 珀巴爾股份有限公司 | Dispersion stabilizer for suspension polymerization, method for producing vinyl polymer, and vinyl chloride resin |
US10301402B2 (en) | 2014-05-28 | 2019-05-28 | Japan Vam & Poval Co., Ltd. | Dispersion stabilizer for suspension polymerization, production method for vinyl-based polymer, and vinyl chloride resin |
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