GB9100618D0 - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof

Info

Publication number
GB9100618D0
GB9100618D0 GB919100618A GB9100618A GB9100618D0 GB 9100618 D0 GB9100618 D0 GB 9100618D0 GB 919100618 A GB919100618 A GB 919100618A GB 9100618 A GB9100618 A GB 9100618A GB 9100618 D0 GB9100618 D0 GB 9100618D0
Authority
GB
United Kingdom
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB919100618A
Other versions
GB2248516A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9100618D0 publication Critical patent/GB9100618D0/en
Publication of GB2248516A publication Critical patent/GB2248516A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0925Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising an N-well only in the substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Element Separation (AREA)
  • Semiconductor Memories (AREA)
GB9100618A 1990-10-05 1991-01-11 Channel stop arrangement for semiconductor device Withdrawn GB2248516A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900015802A KR920008951A (en) 1990-10-05 1990-10-05 Semiconductor device having double doped channel stop layer and method of manufacturing same

Publications (2)

Publication Number Publication Date
GB9100618D0 true GB9100618D0 (en) 1991-02-27
GB2248516A GB2248516A (en) 1992-04-08

Family

ID=19304337

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9100618A Withdrawn GB2248516A (en) 1990-10-05 1991-01-11 Channel stop arrangement for semiconductor device

Country Status (6)

Country Link
JP (1) JPH04234161A (en)
KR (1) KR920008951A (en)
DE (1) DE4101313A1 (en)
FR (1) FR2667726A1 (en)
GB (1) GB2248516A (en)
IT (1) IT1246231B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0170285B1 (en) * 1995-05-12 1999-03-30 김광호 Element separating method of semiconductor device
EP1538673A4 (en) * 2002-09-09 2009-07-15 Sanyo Electric Co Protective device
KR101106988B1 (en) * 2010-07-22 2012-01-25 윤지윤 A mop

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4268847A (en) * 1977-09-16 1981-05-19 Nippon Electric Co., Ltd. Semiconductor device having an insulated gate type field effect transistor and method for producing the same
US4458262A (en) * 1980-05-27 1984-07-03 Supertex, Inc. CMOS Device with ion-implanted channel-stop region and fabrication method therefor
US4411058A (en) * 1981-08-31 1983-10-25 Hughes Aircraft Company Process for fabricating CMOS devices with self-aligned channel stops
JPS5837946A (en) * 1981-08-31 1983-03-05 Fujitsu Ltd Mis type semiconductor integrated circuit device
WO1985004525A1 (en) * 1984-03-29 1985-10-10 Hughes Aircraft Company A latch-up resistant cmos structure for vlsi
JPS61111576A (en) * 1984-10-13 1986-05-29 Fujitsu Ltd Semiconductor device
JPS61207052A (en) * 1985-03-12 1986-09-13 Sanyo Electric Co Ltd High withstand voltage cmos semiconductor device
US4829019A (en) * 1987-05-12 1989-05-09 Texas Instruments Incorporated Method for increasing source/drain to channel stop breakdown and decrease P+/N+ encroachment
JP2772020B2 (en) * 1989-02-22 1998-07-02 株式会社東芝 MOS type semiconductor device
JPH0766946B2 (en) * 1989-03-31 1995-07-19 株式会社東芝 Semiconductor device and manufacturing method thereof

Also Published As

Publication number Publication date
ITMI910106A0 (en) 1991-01-18
FR2667726A1 (en) 1992-04-10
KR920008951A (en) 1992-05-28
IT1246231B (en) 1994-11-16
DE4101313A1 (en) 1992-04-09
JPH04234161A (en) 1992-08-21
ITMI910106A1 (en) 1992-07-18
GB2248516A (en) 1992-04-08

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)