GB8909747D0 - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
GB8909747D0
GB8909747D0 GB898909747A GB8909747A GB8909747D0 GB 8909747 D0 GB8909747 D0 GB 8909747D0 GB 898909747 A GB898909747 A GB 898909747A GB 8909747 A GB8909747 A GB 8909747A GB 8909747 D0 GB8909747 D0 GB 8909747D0
Authority
GB
United Kingdom
Prior art keywords
sputtering apparatus
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB898909747A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IONIC COATINGS Ltd
Original Assignee
IONIC COATINGS Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IONIC COATINGS Ltd filed Critical IONIC COATINGS Ltd
Priority to GB898909747A priority Critical patent/GB8909747D0/en
Publication of GB8909747D0 publication Critical patent/GB8909747D0/en
Priority to PCT/GB1990/000633 priority patent/WO1990013137A1/en
Pending legal-status Critical Current

Links

GB898909747A 1989-04-27 1989-04-27 Sputtering apparatus Pending GB8909747D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB898909747A GB8909747D0 (en) 1989-04-27 1989-04-27 Sputtering apparatus
PCT/GB1990/000633 WO1990013137A1 (en) 1989-04-27 1990-04-25 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB898909747A GB8909747D0 (en) 1989-04-27 1989-04-27 Sputtering apparatus

Publications (1)

Publication Number Publication Date
GB8909747D0 true GB8909747D0 (en) 1989-06-14

Family

ID=10655887

Family Applications (1)

Application Number Title Priority Date Filing Date
GB898909747A Pending GB8909747D0 (en) 1989-04-27 1989-04-27 Sputtering apparatus

Country Status (2)

Country Link
GB (1) GB8909747D0 (en)
WO (1) WO1990013137A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH690805A5 (en) * 1993-05-04 2001-01-15 Unaxis Balzers Ag Magnetic-assisted atomization and vacuum treatment system herewith.
US5433835B1 (en) * 1993-11-24 1997-05-20 Applied Materials Inc Sputtering device and target with cover to hold cooling fluid
US5487822A (en) * 1993-11-24 1996-01-30 Applied Materials, Inc. Integrated sputtering target assembly
DE4415232A1 (en) * 1994-04-30 1995-11-02 Leybold Ag Coating system
DE4426200A1 (en) * 1994-07-23 1996-01-25 Leybold Ag Cathode sputtering appts.
US6221217B1 (en) 1995-07-10 2001-04-24 Cvc, Inc. Physical vapor deposition system having reduced thickness backing plate
WO1997003221A1 (en) * 1995-07-10 1997-01-30 Cvc Products, Inc. Magnetron cathode apparatus and method for sputtering
DE19722056A1 (en) * 1997-05-27 1998-12-03 Roland Dr Gesche Method and apparatus for production of thin layers by low pressure gas discharge in a hollow cathode
US6340415B1 (en) 1998-01-05 2002-01-22 Applied Materials, Inc. Method and apparatus for enhancing a sputtering target's lifetime
US6852202B2 (en) * 2002-05-21 2005-02-08 Applied Materials, Inc. Small epicyclic magnetron with controlled radial sputtering profile
US6841050B2 (en) 2002-05-21 2005-01-11 Applied Materials, Inc. Small planetary magnetron
DE10232179B4 (en) 2002-07-16 2009-01-08 Qimonda Ag PVD

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173265A (en) * 1983-03-22 1984-10-01 Fujitsu Ltd Sputtering device
EP0169680A1 (en) * 1984-07-20 1986-01-29 Varian Associates, Inc. Magnetron sputter etching system
JPS6199673A (en) * 1984-10-15 1986-05-17 Tokuda Seisakusho Ltd Sputtering device
JPS6260866A (en) * 1985-08-02 1987-03-17 Fujitsu Ltd Magnetron sputtering device
JPS6247478A (en) * 1985-08-26 1987-03-02 バリアン・アソシエイツ・インコ−ポレイテツド Planer magnetron sputtering apparatus wherein circular motion and radial motion of magnetic field are combined
DE3619194A1 (en) * 1986-06-06 1987-12-10 Leybold Heraeus Gmbh & Co Kg MAGNETRON SPRAYING CATODE FOR VACUUM COATING SYSTEMS

Also Published As

Publication number Publication date
WO1990013137A1 (en) 1990-11-01

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