GB8904564D0 - Fabrication of thin films - Google Patents

Fabrication of thin films

Info

Publication number
GB8904564D0
GB8904564D0 GB898904564A GB8904564A GB8904564D0 GB 8904564 D0 GB8904564 D0 GB 8904564D0 GB 898904564 A GB898904564 A GB 898904564A GB 8904564 A GB8904564 A GB 8904564A GB 8904564 D0 GB8904564 D0 GB 8904564D0
Authority
GB
United Kingdom
Prior art keywords
fabrication
thin films
films
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB898904564A
Other versions
GB2228948A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems PLC
Original Assignee
British Aerospace PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by British Aerospace PLC filed Critical British Aerospace PLC
Priority to GB8904564A priority Critical patent/GB2228948A/en
Publication of GB8904564D0 publication Critical patent/GB8904564D0/en
Publication of GB2228948A publication Critical patent/GB2228948A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB8904564A 1989-02-28 1989-02-28 Fabrication of thin films from a composite target Withdrawn GB2228948A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8904564A GB2228948A (en) 1989-02-28 1989-02-28 Fabrication of thin films from a composite target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8904564A GB2228948A (en) 1989-02-28 1989-02-28 Fabrication of thin films from a composite target

Publications (2)

Publication Number Publication Date
GB8904564D0 true GB8904564D0 (en) 1989-04-12
GB2228948A GB2228948A (en) 1990-09-12

Family

ID=10652464

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8904564A Withdrawn GB2228948A (en) 1989-02-28 1989-02-28 Fabrication of thin films from a composite target

Country Status (1)

Country Link
GB (1) GB2228948A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051113A (en) * 1998-04-27 2000-04-18 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing
GB9901093D0 (en) * 1999-01-20 1999-03-10 Marconi Electronic Syst Ltd Method of making coatings
US6224718B1 (en) * 1999-07-14 2001-05-01 Veeco Instruments, Inc. Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides
US6635154B2 (en) * 2001-11-03 2003-10-21 Intevac, Inc. Method and apparatus for multi-target sputtering
FR2971261B1 (en) * 2011-02-08 2013-09-20 Centre Nat Rech Scient DEVICE AND METHOD FOR ION SPREADING
US20130270104A1 (en) * 2012-04-11 2013-10-17 Intermolecular, Inc. Combinatorial processing using mosaic sputtering targets
WO2015101584A1 (en) * 2013-12-31 2015-07-09 Essilor International (Compagnie Generale D'optique) Multi-layer assembly and method for controlling layer thicknesses
US11901167B2 (en) * 2022-04-18 2024-02-13 Plasma-Therm Nes Llc Ion beam deposition target life enhancement

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1594668A (en) * 1968-10-15 1970-06-08
GB1371522A (en) * 1971-10-01 1974-10-23 Int Computers Ltd Process for forming a manganese bismuthide film
CH558428A (en) * 1972-11-23 1975-01-31 Balzers Patent Beteilig Ag TARGET CHANGING DEVICE FOR SPRAYING BY ION.
US3864239A (en) * 1974-04-22 1975-02-04 Nasa Multitarget sequential sputtering apparatus
US4108751A (en) * 1977-06-06 1978-08-22 King William J Ion beam implantation-sputtering
DE2917841A1 (en) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg EVAPORATOR FOR VACUUM EVAPORATION SYSTEMS
GB2102027A (en) * 1981-07-18 1983-01-26 Gen Eng Radcliffe 1979 Target for magnetically enhanced sputtering of chromium-iron alloy
JPS59200761A (en) * 1983-04-28 1984-11-14 Toshiba Corp Supporting device for sputtering target

Also Published As

Publication number Publication date
GB2228948A (en) 1990-09-12

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)