GB8425403D0 - Metal patterning method - Google Patents
Metal patterning methodInfo
- Publication number
- GB8425403D0 GB8425403D0 GB848425403A GB8425403A GB8425403D0 GB 8425403 D0 GB8425403 D0 GB 8425403D0 GB 848425403 A GB848425403 A GB 848425403A GB 8425403 A GB8425403 A GB 8425403A GB 8425403 D0 GB8425403 D0 GB 8425403D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- patterning method
- metal patterning
- metal
- patterning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08425403A GB2166254A (en) | 1984-10-08 | 1984-10-08 | Method for the production of a metal patterning mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08425403A GB2166254A (en) | 1984-10-08 | 1984-10-08 | Method for the production of a metal patterning mask |
Publications (2)
Publication Number | Publication Date |
---|---|
GB8425403D0 true GB8425403D0 (en) | 1984-11-14 |
GB2166254A GB2166254A (en) | 1986-04-30 |
Family
ID=10567868
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08425403A Withdrawn GB2166254A (en) | 1984-10-08 | 1984-10-08 | Method for the production of a metal patterning mask |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2166254A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5897982A (en) * | 1996-03-05 | 1999-04-27 | Kabushiki Kaisha Toshiba | Resist develop process having a post develop dispense step |
GB2383849A (en) * | 2002-01-03 | 2003-07-09 | Zarlink Semiconductor Ltd | Resist development |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3961101A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Process for improved development of electron-beam-sensitive resist films |
-
1984
- 1984-10-08 GB GB08425403A patent/GB2166254A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB2166254A (en) | 1986-04-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |