GB8334255D0 - Depositing dielectric films in plasma discharge - Google Patents

Depositing dielectric films in plasma discharge

Info

Publication number
GB8334255D0
GB8334255D0 GB838334255A GB8334255A GB8334255D0 GB 8334255 D0 GB8334255 D0 GB 8334255D0 GB 838334255 A GB838334255 A GB 838334255A GB 8334255 A GB8334255 A GB 8334255A GB 8334255 D0 GB8334255 D0 GB 8334255D0
Authority
GB
United Kingdom
Prior art keywords
plasma discharge
dielectric films
depositing dielectric
depositing
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB838334255A
Other versions
GB2132637A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LFE Corp
Original Assignee
LFE Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LFE Corp filed Critical LFE Corp
Publication of GB8334255D0 publication Critical patent/GB8334255D0/en
Publication of GB2132637A publication Critical patent/GB2132637A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
GB08334255A 1983-01-03 1983-12-22 Process for depositing dielectric films in a plasma glow discharge Withdrawn GB2132637A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US45523783A 1983-01-03 1983-01-03

Publications (2)

Publication Number Publication Date
GB8334255D0 true GB8334255D0 (en) 1984-02-01
GB2132637A GB2132637A (en) 1984-07-11

Family

ID=23807984

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08334255A Withdrawn GB2132637A (en) 1983-01-03 1983-12-22 Process for depositing dielectric films in a plasma glow discharge

Country Status (4)

Country Link
JP (1) JPS59135733A (en)
DE (1) DE3400096A1 (en)
GB (1) GB2132637A (en)
NL (1) NL8304493A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61128403A (en) * 1984-11-28 1986-06-16 鐘淵化学工業株式会社 Non-crystalline silicon based insulating material
KR870000750A (en) * 1985-06-14 1987-02-20 이마드 마하윌리 How to chemically vapor coat a silicon dioxide film
JPH02114530A (en) * 1988-10-25 1990-04-26 Mitsubishi Electric Corp Thin film formation device
GB2241250A (en) * 1990-01-26 1991-08-28 Fuji Electric Co Ltd RF plasma CVD employing an electrode with a shower supply surface
ES2125229T3 (en) * 1990-07-31 1999-03-01 Applied Materials Inc PLASMA TREATMENT REACTOR.

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2371524A1 (en) * 1976-11-18 1978-06-16 Alsthom Atlantique PROCESS FOR DEPOSITING A THIN LAYER BY DECOMPOSITION OF A GAS IN A PLASMA
US4265991A (en) * 1977-12-22 1981-05-05 Canon Kabushiki Kaisha Electrophotographic photosensitive member and process for production thereof
JPS5767938A (en) * 1980-10-16 1982-04-24 Canon Inc Production of photoconductive member
EP0060651B1 (en) * 1981-03-16 1986-07-30 Energy Conversion Devices, Inc. Apparatus including improved cathode for continuous deposition of amorphous material

Also Published As

Publication number Publication date
JPS59135733A (en) 1984-08-04
GB2132637A (en) 1984-07-11
NL8304493A (en) 1984-08-01
DE3400096A1 (en) 1984-07-05

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)