GB824282A - Photosensitive compositions for lithography - Google Patents
Photosensitive compositions for lithographyInfo
- Publication number
- GB824282A GB824282A GB333256A GB333256A GB824282A GB 824282 A GB824282 A GB 824282A GB 333256 A GB333256 A GB 333256A GB 333256 A GB333256 A GB 333256A GB 824282 A GB824282 A GB 824282A
- Authority
- GB
- United Kingdom
- Prior art keywords
- azide
- groups
- areas
- acrylonitrile
- acrylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 238000001459 lithography Methods 0.000 title 1
- 150000001540 azides Chemical class 0.000 abstract 4
- 231100000489 sensitizer Toxicity 0.000 abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 3
- 229920001577 copolymer Polymers 0.000 abstract 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000000178 monomer Substances 0.000 abstract 2
- 239000000243 solution Substances 0.000 abstract 2
- 239000002966 varnish Substances 0.000 abstract 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 abstract 1
- 229920001756 Polyvinyl chloride acetate Polymers 0.000 abstract 1
- 238000003916 acid precipitation Methods 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- -1 aromatic azide Chemical class 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 238000004043 dyeing Methods 0.000 abstract 1
- 230000005660 hydrophilic surface Effects 0.000 abstract 1
- 230000002209 hydrophobic effect Effects 0.000 abstract 1
- 125000001165 hydrophobic group Chemical group 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 229920002689 polyvinyl acetate Polymers 0.000 abstract 1
- 239000011118 polyvinyl acetate Substances 0.000 abstract 1
- 239000004800 polyvinyl chloride Substances 0.000 abstract 1
- 230000000717 retained effect Effects 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 159000000000 sodium salts Chemical class 0.000 abstract 1
- 125000002348 vinylic group Chemical group 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE552780D BE552780A (enrdf_load_stackoverflow) | 1956-02-02 | ||
| FR1153617D FR1153617A (fr) | 1956-02-02 | 1955-12-27 | Nouvelle composition photosensible et ses applications |
| GB333256A GB824282A (en) | 1956-02-02 | 1956-02-02 | Photosensitive compositions for lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB333256A GB824282A (en) | 1956-02-02 | 1956-02-02 | Photosensitive compositions for lithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB824282A true GB824282A (en) | 1959-11-25 |
Family
ID=9756314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB333256A Expired GB824282A (en) | 1956-02-02 | 1956-02-02 | Photosensitive compositions for lithography |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE552780A (enrdf_load_stackoverflow) |
| FR (1) | FR1153617A (enrdf_load_stackoverflow) |
| GB (1) | GB824282A (enrdf_load_stackoverflow) |
-
0
- BE BE552780D patent/BE552780A/xx unknown
-
1955
- 1955-12-27 FR FR1153617D patent/FR1153617A/fr not_active Expired
-
1956
- 1956-02-02 GB GB333256A patent/GB824282A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| BE552780A (enrdf_load_stackoverflow) | |
| FR1153617A (fr) | 1958-03-19 |
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