GB823383A - Improvements in or relating to processes and apparatus for the production of very pure crystalline substances - Google Patents
Improvements in or relating to processes and apparatus for the production of very pure crystalline substancesInfo
- Publication number
- GB823383A GB823383A GB1282/56A GB128256A GB823383A GB 823383 A GB823383 A GB 823383A GB 1282/56 A GB1282/56 A GB 1282/56A GB 128256 A GB128256 A GB 128256A GB 823383 A GB823383 A GB 823383A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrodes
- anode
- enclosure
- cathode
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
In the production of very pure crystalline silicon according to the method of the parent Specification, provision is made for liquid cooling of the enclosure and one or more of the electrodes so that the release of vapours from at least the surfaces other than that of the deposition electrode or electrodes is prevented. In Fig. 1 the cathode 2 is the deposition electrode and may consist of a rod of silicon. Cooling water is circulated through the enclosure 1 and the anode 4. The gaseous starting products, e.g. silicon tetrachloride or silico-chloroform, are introduced through a ring of nozzles 5. The reducing agent, e.g. hydrogen, is introduced through the tube 7 surrounding the anode. The anode 4 may be shaken, periodically or continuously, to remove deposits which do form, e.g. by means of an armature and relay 9. In a modification the cathode is surrounded by a ring anode, or one or more rotating anodes may be used, or the cathode may rotate. In <PICT:0823383/III/1> <PICT:0823383/III/2> Fig. 3 the enclosure consists of two water-cooled hollow tubes 16 and 17 with oblique electrodes 18 and 19 of the substance to be produced. An A.C. discharge is used. The enclosure and the electrodes are so dimensioned to cool the electrodes. 21 is an observation window and 20 is a nozzle for introducing the gas. The cooled surfaces may consist of copper, silver or steel. Copper-coated or silver-coated metals may be used.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE823383X | 1955-01-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB823383A true GB823383A (en) | 1959-11-11 |
Family
ID=6746134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1282/56A Expired GB823383A (en) | 1955-01-13 | 1956-01-13 | Improvements in or relating to processes and apparatus for the production of very pure crystalline substances |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB823383A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011008849A1 (en) * | 2009-07-14 | 2011-01-20 | Hemlock Semiconductor Corporation | A method of inhibiting formation of deposits in a manufacturing system |
US8147656B2 (en) | 2005-05-25 | 2012-04-03 | Spawnt Private S.A.R.L. | Method for the production of silicon from silyl halides |
US8177943B2 (en) | 2006-09-14 | 2012-05-15 | Spawnt Private S.A.R.L. | Solid polysilane mixtures |
-
1956
- 1956-01-13 GB GB1282/56A patent/GB823383A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8147656B2 (en) | 2005-05-25 | 2012-04-03 | Spawnt Private S.A.R.L. | Method for the production of silicon from silyl halides |
US9382122B2 (en) | 2005-05-25 | 2016-07-05 | Spawnt Private S.À.R.L. | Method for the production of silicon from silyl halides |
US8177943B2 (en) | 2006-09-14 | 2012-05-15 | Spawnt Private S.A.R.L. | Solid polysilane mixtures |
WO2011008849A1 (en) * | 2009-07-14 | 2011-01-20 | Hemlock Semiconductor Corporation | A method of inhibiting formation of deposits in a manufacturing system |
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