GB798691A - Improvements in or relating to processes and apparatus for electrolytic shaping - Google Patents

Improvements in or relating to processes and apparatus for electrolytic shaping

Info

Publication number
GB798691A
GB798691A GB1251855A GB1251855A GB798691A GB 798691 A GB798691 A GB 798691A GB 1251855 A GB1251855 A GB 1251855A GB 1251855 A GB1251855 A GB 1251855A GB 798691 A GB798691 A GB 798691A
Authority
GB
United Kingdom
Prior art keywords
electrode
germanium
drop
electrolyte
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1251855A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens and Halske AG
Siemens AG
Original Assignee
Siemens and Halske AG
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens and Halske AG, Siemens AG filed Critical Siemens and Halske AG
Publication of GB798691A publication Critical patent/GB798691A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching
    • C25F3/12Etching of semiconducting materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063Electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Weting (AREA)

Abstract

798,691. Electrolysis. SIEMENS & HALSKE AKT.-GES. April 29, 1955 [May 6, 1954], No. 12518/55. Classes 37 and 41. A process for shaping an element of semiconductive material comprises placing a drop of electrolyte between an electrode and the surface of the element, the spacing of the electrode and the element being such that the drop is held therebetween, and passing an electric current through the electrode, drop and element. As shown, an electrode 2 consisting of, or containing, acceptor impurity material is disposed opposite a crystal 1 of n-germanium, being held in a holding device and moved slowly and constantly in the direction of the arrow 3, while a current flows between parts 1 and 2 through a bead of electrolyte 4. Germanium is electrolytically removed until the chain-line profile is produced, and the direction of current is then reversed, to deposit acceptor impurity material from the electrode 2 on the germanium, the electrode meanwhile being moved in the direction of the arrow 5. The acceptor impurity material may be brought into more intimate contact with the germanium by subsequent heat-treatment. The process of the invention may be used to remove material from the surface of the central conductivity zone of an n-p-n or p-n-p transistor to reduce its capacity; electrodes are then disposed on either side of the central zone to produce recesses. The movement of the electrode may be such as to maintain constant the distance between it and the element. The drop of electrolyte may be replenished by forming the electrode as a jet, from which the liquid slowly trickles. A number of electrodes in juxtaposition may be used, and the electrodes may be shaped to produce cavities of predetermined shapes, e.g. round, polygonal, star-shaped or annular, and they may be rotated or moved laterally, or both.
GB1251855A 1954-05-06 1955-04-29 Improvements in or relating to processes and apparatus for electrolytic shaping Expired GB798691A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES39040A DE1082786B (en) 1954-05-06 1954-05-06 Method and device for the shaping electrolytic processing of bodies made of semiconducting or conductive material

Publications (1)

Publication Number Publication Date
GB798691A true GB798691A (en) 1958-07-23

Family

ID=7483145

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1251855A Expired GB798691A (en) 1954-05-06 1955-04-29 Improvements in or relating to processes and apparatus for electrolytic shaping

Country Status (3)

Country Link
DE (1) DE1082786B (en)
FR (1) FR1123551A (en)
GB (1) GB798691A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE565765C (en) * 1929-07-24 1932-12-08 Vladimir Gusseff Method and device for the electrolytic processing of metals
NL144803C (en) * 1948-02-26
US2497770A (en) * 1948-12-29 1950-02-14 Bell Telephone Labor Inc Transistor-microphone

Also Published As

Publication number Publication date
DE1082786B (en) 1960-06-02
FR1123551A (en) 1956-09-24

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