GB768022A - Improvements in or relating to methods of forming p-n junctions in crystalline semi-conducting materials - Google Patents

Improvements in or relating to methods of forming p-n junctions in crystalline semi-conducting materials

Info

Publication number
GB768022A
GB768022A GB8976/53A GB897653A GB768022A GB 768022 A GB768022 A GB 768022A GB 8976/53 A GB8976/53 A GB 8976/53A GB 897653 A GB897653 A GB 897653A GB 768022 A GB768022 A GB 768022A
Authority
GB
United Kingdom
Prior art keywords
type
slice
molten
layer
powdered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8976/53A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co PLC
Original Assignee
General Electric Co PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NLAANVRAGE7508163,A priority Critical patent/NL182045B/en
Application filed by General Electric Co PLC filed Critical General Electric Co PLC
Priority to GB8976/53A priority patent/GB768022A/en
Priority to FR1090746D priority patent/FR1090746A/en
Priority to CH324866D priority patent/CH324866A/en
Publication of GB768022A publication Critical patent/GB768022A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

768,022. Semi-conductor devices. GENERAL ELECTRIC CO., Ltd., and JAMES, E. G. Sept. 30, 1953 [Oct. 15, 1952; March 31, 1953], Nos. 8975/53 and 8976/53. Divided out of 723,179. Class 37. P-N junctions are produced in crystalline semi-conducting material by producing, in an inert atmosphere or vacuum, on top of a solid semiconductor body of one conductivity type a molten layer of the semi-conductor material formed at least in part by melting the tip of the body, and then crystallizing the molten layer, which contains sufficient of at least one impurity of opposite conductiv, ity type to ensure that at least the first part of the layer to solidify is of opposite type to the main body. Preferably the original body is monocrystalline and the solidification progressively upward so that the resultant body is also monocrystalline. In one embodiment a monocrystalline slice of N-type Ge 24 is placed on graphite block 25 mounted for vertical movement on a cooled chamber 19 on rod 20 in a chamber 1 through which a current of argon flows, the slice being heated from above by a carbon heating element 7 mounted in watercooled blocks 8 and 9. A thin layer of powdered P-type Ge on top is melted together with a thin surface zone, the P-type impurity being sufficient to ensure that the whole molten mass solidifies from the bottom upwards as P-type Ge when the slice is lowered. The resulting single crystal may be cut into fragments and made into PN diodes or into PNP junction units by diffusion of impurities such as In into the N-type zone. In a second method after part of the molten layer has solidified lowering of the slice is interrupted and powdered N-type Ge added to the Ge remaining molten to give a further N- type layer. Alternatively powdered Ge made N-type by inclusion of As which is more soluble in liquid than in solid Ge, and Ge made P-type by inclusion of B which is more soluble in solid than in liquid Ge are both sprinkled on the body and melted together with the surface zone the relative quantities being such that the first thin layer to solidify is P-type while the remainder is N-type. In all cases blocks of material may replace the powder, or the whole of the molten Ge may be derived from the top of the body, the impurities being added directly to it. The added Ge may also be in liquid form produced by fusion of powdered material in falling through a heated coil on to the body, or melted in separate vessels and poured over the surface. A rod of Ge with axis vertical may replace the slice and after formation of junctions thereon the tip is removed and the process repeated.
GB8976/53A 1953-03-31 1953-03-31 Improvements in or relating to methods of forming p-n junctions in crystalline semi-conducting materials Expired GB768022A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
NLAANVRAGE7508163,A NL182045B (en) 1953-03-31 DEVICE FOR MEASURING MILK QUANTITIES.
GB8976/53A GB768022A (en) 1953-03-31 1953-03-31 Improvements in or relating to methods of forming p-n junctions in crystalline semi-conducting materials
FR1090746D FR1090746A (en) 1953-03-31 1953-10-12 Semiconductor crystalline materials
CH324866D CH324866A (en) 1953-03-31 1953-10-14 Process for forming a P-N junction in a semiconductor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB310353X 1953-03-31
GB8976/53A GB768022A (en) 1953-03-31 1953-03-31 Improvements in or relating to methods of forming p-n junctions in crystalline semi-conducting materials

Publications (1)

Publication Number Publication Date
GB768022A true GB768022A (en) 1957-02-13

Family

ID=26242547

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8976/53A Expired GB768022A (en) 1953-03-31 1953-03-31 Improvements in or relating to methods of forming p-n junctions in crystalline semi-conducting materials

Country Status (4)

Country Link
CH (1) CH324866A (en)
FR (1) FR1090746A (en)
GB (1) GB768022A (en)
NL (1) NL182045B (en)

Also Published As

Publication number Publication date
NL182045B (en)
FR1090746A (en) 1955-04-04
CH324866A (en) 1957-10-15

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