GB706288A - Production of silicon-containing compounds - Google Patents
Production of silicon-containing compoundsInfo
- Publication number
- GB706288A GB706288A GB10631/52A GB1063152A GB706288A GB 706288 A GB706288 A GB 706288A GB 10631/52 A GB10631/52 A GB 10631/52A GB 1063152 A GB1063152 A GB 1063152A GB 706288 A GB706288 A GB 706288A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- mixture
- alcohol
- phenol
- orthosilicate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002210 silicon-based material Substances 0.000 title 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 16
- 235000019441 ethanol Nutrition 0.000 abstract 15
- 239000000203 mixture Substances 0.000 abstract 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 8
- 150000002989 phenols Chemical class 0.000 abstract 7
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 abstract 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 6
- 239000005864 Sulphur Substances 0.000 abstract 6
- 229910052710 silicon Inorganic materials 0.000 abstract 6
- 239000010703 silicon Substances 0.000 abstract 6
- MDQPYPSVDGIWID-UHFFFAOYSA-N [Si].S=O Chemical compound [Si].S=O MDQPYPSVDGIWID-UHFFFAOYSA-N 0.000 abstract 5
- 150000001298 alcohols Chemical class 0.000 abstract 5
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 abstract 4
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 abstract 4
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 abstract 4
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 abstract 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 abstract 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract 4
- 238000004821 distillation Methods 0.000 abstract 4
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 abstract 4
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 abstract 4
- 239000000377 silicon dioxide Substances 0.000 abstract 4
- KHDSWONFYIAAPE-UHFFFAOYSA-N silicon sulfide Chemical compound S=[Si]=S KHDSWONFYIAAPE-UHFFFAOYSA-N 0.000 abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 3
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 abstract 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 abstract 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 abstract 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 abstract 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract 2
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- 229950011260 betanaphthol Drugs 0.000 abstract 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical group OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 229930003836 cresol Natural products 0.000 abstract 2
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 2
- SCCMALBMEASKCM-UHFFFAOYSA-N diethyl bis(triethoxysilyl) silicate Chemical compound CCO[Si](OCC)(OCC)O[Si](OCC)(OCC)O[Si](OCC)(OCC)OCC SCCMALBMEASKCM-UHFFFAOYSA-N 0.000 abstract 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 2
- -1 ethylhexyl Chemical group 0.000 abstract 2
- 239000000706 filtrate Substances 0.000 abstract 2
- 238000005194 fractionation Methods 0.000 abstract 2
- 229910052742 iron Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 229910052605 nesosilicate Inorganic materials 0.000 abstract 2
- 150000004762 orthosilicates Chemical class 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 abstract 2
- 238000010992 reflux Methods 0.000 abstract 2
- MQHSFMJHURNQIE-UHFFFAOYSA-N tetrakis(2-ethylhexyl) silicate Chemical compound CCCCC(CC)CO[Si](OCC(CC)CCCC)(OCC(CC)CCCC)OCC(CC)CCCC MQHSFMJHURNQIE-UHFFFAOYSA-N 0.000 abstract 2
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 abstract 2
- GYTROFMCUJZKNA-UHFFFAOYSA-N triethyl triethoxysilyl silicate Chemical compound CCO[Si](OCC)(OCC)O[Si](OCC)(OCC)OCC GYTROFMCUJZKNA-UHFFFAOYSA-N 0.000 abstract 2
- 238000005406 washing Methods 0.000 abstract 2
- CWFYZVLCOZOBLO-UHFFFAOYSA-N C(C)C(CO)CCCC.C(CCCCCC)O Chemical compound C(C)C(CO)CCCC.C(CCCCCC)O CWFYZVLCOZOBLO-UHFFFAOYSA-N 0.000 abstract 1
- BOEMUWBZRVAKIE-UHFFFAOYSA-N CCCCC(CC)CO[Si](O)(O)O[Si](OCC(CC)CCCC)(OCC(CC)CCCC)OCC(CC)CCCC Chemical compound CCCCC(CC)CO[Si](O)(O)O[Si](OCC(CC)CCCC)(OCC(CC)CCCC)OCC(CC)CCCC BOEMUWBZRVAKIE-UHFFFAOYSA-N 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 abstract 1
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052788 barium Inorganic materials 0.000 abstract 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000004927 clay Substances 0.000 abstract 1
- 150000004294 cyclic thioethers Chemical class 0.000 abstract 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 abstract 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 abstract 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 abstract 1
- 150000002978 peroxides Chemical class 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 229910052700 potassium Inorganic materials 0.000 abstract 1
- 239000011591 potassium Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- DWFFKGPZNGKUPH-UHFFFAOYSA-N sulfanylidenesilicon Chemical compound S=[Si] DWFFKGPZNGKUPH-UHFFFAOYSA-N 0.000 abstract 1
- 239000003832 thermite Substances 0.000 abstract 1
- IRAUUSOWFPPUNG-UHFFFAOYSA-N tris(2-ethylhexyl) tris(2-ethylhexoxy)silyl silicate Chemical compound CCCCC(CC)CO[Si](OCC(CC)CCCC)(OCC(CC)CCCC)O[Si](OCC(CC)CCCC)(OCC(CC)CCCC)OCC(CC)CCCC IRAUUSOWFPPUNG-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
- C07F7/06—Esters of silicic acids with hydroxyaryl compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
Polysilicates and orthosilicates having alkyl, cycloalkyl, aryl, alkaryl or aralkyl substituents are prepared by reacting anhydrous alcohols or phenols with a mixture consisting of silicon disulphide and a compound, possibly silicon oxysulphide, containing only silicon, oxygen and sulphur, which mixture is obtained by igniting silicon, silica and sulphur preferably in a molar proportion of 1:1:2. The alcohols or phenols employed may have 1-18 carbon atoms such as methanol, ethanol, isopropanol, n p butanol, tertiary butanol, n hexanol, n heptanol, 2 ethylhexanol, n octanol, lauryl or octadecyl alcohol, benzyl alcohol, 2 phenylethanol, or phenols such as phenol, cresol, p-ethylphenol, beta-naphthol or 2-hydroxy diphenyl. The reaction of the phenol or alcohol may take place at ordinary or increased temperatures preferably under reflux, until the hydrogen sulphide evolution has ceased. The reaction product, consisting of the orthosilicate and a mixture of polysilicates may be distilled or employed as such. According to examples:-(1) ethyl alcohol was reacted with the mixture (silicon disulphide and silicon oxysulphide), refluxed for 2 hours and the residue washed with alcohol. Fractionation of the combined filtrate and washings yielded tetraethyl orthosilicate, hexaethyl disilicate and octaethyl trisilicate. (2) the alcohol employed was 2 ethylhexanol, yielding tetrakis (2 ethylhexyl) orthosilicate, tetrakis (2 ethylhexyl) disilicate and octakis (2 ethylhexyl trisilicate. (3) the mixture was finely ground and reacted with phenol in an iron retort 550 DEG C. The unreacted phenol was removed by distillation and the residue removed from the retort and extracted with benzene. Distillation yielded tetraphenyl orthosilicate and a polymeric material having a molecular weight of 930, probably a mixture of octa phenyl trisilicate and decaphenyl tetrasilicate.ALSO:Polysilicates and orthosilicates having alkyl, cycloalkyl, aryl, alkaryl or aralkyl substituents are prepared by reacting anhydrous alcohols or phenols with a mixture consisting of silicon disulphide and a compound, possibly silicon oxysulphide, containing only silicon, oxygen and sulphur, which mixture is obtained by igniting silicon, silica and sulphur preferably in a molar proportion of 1:1:2. The alcohols or phenols employed may have 1-18 carbon atoms such as methanol, ethanol, isopropanol, n butanol, tertiary butanol, n-hexanol, n-heptanol 2-ethylhexanol, n-octanol, lauryl or octadecyl alcohol, benzyl alcohol, 2-phenyl-ethanol, or phenols such as phenol, cresol, p-ethylphenol, beta-naphthol or 2-hydroxy diphenyl. The reaction of the phenol or alcohol may take place at ordinary or increased temperatures preferably under reflux, until the hydrogen sulphide evolution has ceased. The reaction product, consisting of the orthosilicate and a mixture of polysilicates may be distilled or employed as such. According to examples:-(1) Ethyl alcohol was reacted with the mixtures (silicon sulphide and silicon oxysulphide) refluxed for 2 hours and the residue washed with alcohol. Fractionation of the combined filtrate and washings yielded tetraethyl orthosilicate, hexaethyl disilicate and octaethyl trisilicate; (2) The alcohol employed was 2-ethylhexanol, yielding tetrakis (2-ethylhexyl) orthosilicate, hexakis (2-ethylhexyl) disilicate and octakis (2-ethylhexyl) trisilicate; (3) the mixture was finely ground and reacted with phenol in an iron retort at 550 DEG C. The unreacted phenol was removed by distillation and the residue removed from the retort and extracted with benzene. Distillation yielded tetraphenyl orthosilicate and a polymeric material having a molecular weight of 930, probably a mixture of octaphenyl trisilicate and decaphenyl tetrasilicate.ALSO:Silicon, silica and sulphur, preferably in the molar proportion of 1 : 1 : 2 are ignited to prepare a mixture of silicon disulphide and a compound containing only silicon oxygen and sulphur, probably silicon oxysulphide or a cyclic thioether or a polymer of either. The resulting mixture may be reacted with anhydrous alcohols and phenols (see Groups IV (a) and IV (b), 0.5 to 5 per cent. by weight of a heat-producing substance such as peroxide of barium, sodium or potassium may be incorporated before ignition which may be effected at 2000 DEG C. or above. This temperature may be attained by thermite ignition (e.g. a mixture of aluminium and ferric oxide) in a fire-clay crucible. The friable ignition product contains no elemental silicon and little silica.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US706288XA | 1951-04-27 | 1951-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB706288A true GB706288A (en) | 1954-03-24 |
Family
ID=22096454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB10631/52A Expired GB706288A (en) | 1951-04-27 | 1952-04-28 | Production of silicon-containing compounds |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB706288A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106995459A (en) * | 2016-01-26 | 2017-08-01 | 赢创德固赛有限公司 | The method for preparing the composition containing the ethylhexyl of silicic acid 2 |
-
1952
- 1952-04-28 GB GB10631/52A patent/GB706288A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106995459A (en) * | 2016-01-26 | 2017-08-01 | 赢创德固赛有限公司 | The method for preparing the composition containing the ethylhexyl of silicic acid 2 |
| CN106995459B (en) * | 2016-01-26 | 2019-12-10 | 赢创德固赛有限公司 | Process for preparing 2-ethylhexyl silicate-containing compositions |
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