GB673651A - New polymers - Google Patents
New polymersInfo
- Publication number
- GB673651A GB673651A GB335649A GB335649A GB673651A GB 673651 A GB673651 A GB 673651A GB 335649 A GB335649 A GB 335649A GB 335649 A GB335649 A GB 335649A GB 673651 A GB673651 A GB 673651A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapour
- fluoro
- deposited
- cooling
- vapours
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/025—Polyxylylenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/34—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain
- C08G2261/342—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing only carbon atoms
- C08G2261/3424—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing only carbon atoms non-conjugated, e.g. paracyclophanes or xylenes
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Organic Insulating Materials (AREA)
Abstract
Polymers are produced by pyrolysing the vapour of p-xylene substituted in the nucleus by at least one atom of the normally gaseous halogens at a temperature between 700 DEG and 1000 DEG C. for not more than 10 seconds and cooling the resulting vapours so that a solid polymer is deposited. Specified compounds which may be pyrolysed are 2-fluoro-, 2-chloro-and 2,5-dichloro-p-xylenes. The preferred duration of pyrolysis is from 0.1 to 1 second. The vapour pressure should not exceed atmospheric and the vapour may be diluted with an inert gas, e.g. nitrogen or carbon dioxide, to maintain a low partial vapour pressure of the compound. Cooling may be effected by contacting a cool surface, e.g. at a temperature of 100 DEG to - 80 DEG C., on which the polymer is deposited as a film. The monomeric unit appears to be the original compound with two CH2 groups instead of the two paramethyl groups. In the examples, the vapours at a pressure of 8 to 10 mm. Hg. abs., are passed through a tube heated to 800 DEG C. The polymers are insoluble in many organic solvents, are heat-stable and resistant to corrosive liquids and have good heat and electrical insulating properties. Specification 650,947 is referred to.ALSO:2 - Fluoro - p - xylylene di - iodide is prepared by reacting the vapour of 2-fluoro-p-xylene, pyrolysed at 700-1000 DEG C., with iodine vapour, and cooling the resultant vapours, when, in addition to the deposition of polymer (see Group IV (a)), white needles of the above compound having a melting point of 150-151 DEG C. are deposited.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB335649A GB673651A (en) | 1949-02-07 | 1949-02-07 | New polymers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB335649A GB673651A (en) | 1949-02-07 | 1949-02-07 | New polymers |
Publications (1)
Publication Number | Publication Date |
---|---|
GB673651A true GB673651A (en) | 1952-06-11 |
Family
ID=9756763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB335649A Expired GB673651A (en) | 1949-02-07 | 1949-02-07 | New polymers |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB673651A (en) |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2744085A (en) * | 1953-09-15 | 1956-05-01 | Du Pont | Process of making dispersions of polymers |
US2758989A (en) * | 1953-04-10 | 1956-08-14 | Kellogg M W Co | Polymerization of cyclooctatetraene |
US2777005A (en) * | 1953-10-14 | 1957-01-08 | Kellogg M W Co | Polymerizable cyclic compounds |
US2914489A (en) * | 1956-01-10 | 1959-11-24 | Du Pont | Production of poly p-xylene polymers containing halogen |
US3084146A (en) * | 1957-04-24 | 1963-04-02 | Minnesota Mining & Mfg | Aromatically unsaturated compounds and preparation thereof |
US3117168A (en) * | 1960-08-19 | 1964-01-07 | Union Carbide Corp | Alkylated di-p-xylylenes |
US3213041A (en) * | 1957-07-05 | 1965-10-19 | Kellogg M W Co | Process of pyrolyzing a paraxylyl halide |
US3288728A (en) * | 1966-02-18 | 1966-11-29 | Union Carbide Corp | Para-xylylene copolymers |
US3342754A (en) * | 1966-02-18 | 1967-09-19 | Union Carbide Corp | Para-xylylene polymers |
US5310858A (en) * | 1992-01-31 | 1994-05-10 | Hoechst Aktiengesellschaft | Process for preparing polymers of p-xylylene from p-xylylene diesters |
WO2003014182A1 (en) * | 2001-08-09 | 2003-02-20 | Dielectric Systems, Inc. | Stabilized polymer film and its manufacture |
US6797343B2 (en) | 2001-12-20 | 2004-09-28 | Dielectric Systems, Inc. | Dielectric thin films from fluorinated precursors |
US6825303B2 (en) | 2001-02-26 | 2004-11-30 | Dielectric Systems, Inc. | Integration of low ε thin films and Ta into Cu dual damascene |
US6881447B2 (en) | 2002-04-04 | 2005-04-19 | Dielectric Systems, Inc. | Chemically and electrically stabilized polymer films |
US6962871B2 (en) | 2004-03-31 | 2005-11-08 | Dielectric Systems, Inc. | Composite polymer dielectric film |
US7026052B2 (en) | 2001-02-26 | 2006-04-11 | Dielectric Systems, Inc. | Porous low k(<2.0) thin film derived from homo-transport-polymerization |
US7094661B2 (en) | 2004-03-31 | 2006-08-22 | Dielectric Systems, Inc. | Single and dual damascene techniques utilizing composite polymer dielectric film |
US7192645B2 (en) | 2001-02-26 | 2007-03-20 | Dielectric Systems, Inc. | Porous low E (<2.0) thin films by transport co-polymerization |
US7309395B2 (en) | 2004-03-31 | 2007-12-18 | Dielectric Systems, Inc. | System for forming composite polymer dielectric film |
-
1949
- 1949-02-07 GB GB335649A patent/GB673651A/en not_active Expired
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2758989A (en) * | 1953-04-10 | 1956-08-14 | Kellogg M W Co | Polymerization of cyclooctatetraene |
US2744085A (en) * | 1953-09-15 | 1956-05-01 | Du Pont | Process of making dispersions of polymers |
US2777005A (en) * | 1953-10-14 | 1957-01-08 | Kellogg M W Co | Polymerizable cyclic compounds |
US2914489A (en) * | 1956-01-10 | 1959-11-24 | Du Pont | Production of poly p-xylene polymers containing halogen |
US3084146A (en) * | 1957-04-24 | 1963-04-02 | Minnesota Mining & Mfg | Aromatically unsaturated compounds and preparation thereof |
US3213041A (en) * | 1957-07-05 | 1965-10-19 | Kellogg M W Co | Process of pyrolyzing a paraxylyl halide |
US3117168A (en) * | 1960-08-19 | 1964-01-07 | Union Carbide Corp | Alkylated di-p-xylylenes |
US3288728A (en) * | 1966-02-18 | 1966-11-29 | Union Carbide Corp | Para-xylylene copolymers |
US3342754A (en) * | 1966-02-18 | 1967-09-19 | Union Carbide Corp | Para-xylylene polymers |
US5310858A (en) * | 1992-01-31 | 1994-05-10 | Hoechst Aktiengesellschaft | Process for preparing polymers of p-xylylene from p-xylylene diesters |
US6825303B2 (en) | 2001-02-26 | 2004-11-30 | Dielectric Systems, Inc. | Integration of low ε thin films and Ta into Cu dual damascene |
US7192645B2 (en) | 2001-02-26 | 2007-03-20 | Dielectric Systems, Inc. | Porous low E (<2.0) thin films by transport co-polymerization |
US7026052B2 (en) | 2001-02-26 | 2006-04-11 | Dielectric Systems, Inc. | Porous low k(<2.0) thin film derived from homo-transport-polymerization |
WO2003014182A1 (en) * | 2001-08-09 | 2003-02-20 | Dielectric Systems, Inc. | Stabilized polymer film and its manufacture |
US6703462B2 (en) | 2001-08-09 | 2004-03-09 | Dielectric Systems Inc. | Stabilized polymer film and its manufacture |
US7009016B2 (en) | 2001-12-20 | 2006-03-07 | Dielectric Systems, Inc. | Dielectric thin films from fluorinated precursors |
US6797343B2 (en) | 2001-12-20 | 2004-09-28 | Dielectric Systems, Inc. | Dielectric thin films from fluorinated precursors |
US6881447B2 (en) | 2002-04-04 | 2005-04-19 | Dielectric Systems, Inc. | Chemically and electrically stabilized polymer films |
US6962871B2 (en) | 2004-03-31 | 2005-11-08 | Dielectric Systems, Inc. | Composite polymer dielectric film |
US7094661B2 (en) | 2004-03-31 | 2006-08-22 | Dielectric Systems, Inc. | Single and dual damascene techniques utilizing composite polymer dielectric film |
US7309395B2 (en) | 2004-03-31 | 2007-12-18 | Dielectric Systems, Inc. | System for forming composite polymer dielectric film |
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