GB2581145A - Method of manufacturing an elastic conductor, elastic conductor and electronic device comprising the elastic conductor - Google Patents
Method of manufacturing an elastic conductor, elastic conductor and electronic device comprising the elastic conductor Download PDFInfo
- Publication number
- GB2581145A GB2581145A GB1901521.3A GB201901521A GB2581145A GB 2581145 A GB2581145 A GB 2581145A GB 201901521 A GB201901521 A GB 201901521A GB 2581145 A GB2581145 A GB 2581145A
- Authority
- GB
- United Kingdom
- Prior art keywords
- metal layer
- alloy
- solid metal
- layer
- liquid metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004020 conductor Substances 0.000 title abstract description 49
- 238000004519 manufacturing process Methods 0.000 title description 24
- 229910052751 metal Inorganic materials 0.000 abstract description 142
- 239000002184 metal Substances 0.000 abstract description 141
- 239000007787 solid Substances 0.000 abstract description 82
- 229910045601 alloy Inorganic materials 0.000 abstract description 65
- 239000000956 alloy Substances 0.000 abstract description 65
- 229910001338 liquidmetal Inorganic materials 0.000 abstract description 65
- 239000000758 substrate Substances 0.000 abstract description 41
- 229920001971 elastomer Polymers 0.000 abstract description 38
- 239000000806 elastomer Substances 0.000 abstract description 34
- 238000000034 method Methods 0.000 abstract description 30
- 239000000463 material Substances 0.000 abstract description 28
- 230000001681 protective effect Effects 0.000 abstract description 13
- 238000002161 passivation Methods 0.000 abstract description 7
- 230000003213 activating effect Effects 0.000 abstract description 6
- -1 Ag+ ions Chemical class 0.000 description 17
- 238000011282 treatment Methods 0.000 description 14
- 150000002739 metals Chemical class 0.000 description 13
- 238000005275 alloying Methods 0.000 description 12
- 239000002243 precursor Substances 0.000 description 12
- 238000005507 spraying Methods 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000002131 composite material Substances 0.000 description 7
- 239000000945 filler Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 244000043261 Hevea brasiliensis Species 0.000 description 6
- 229920000459 Nitrile rubber Polymers 0.000 description 6
- 238000003618 dip coating Methods 0.000 description 6
- 229910001084 galinstan Inorganic materials 0.000 description 6
- 229920003052 natural elastomer Polymers 0.000 description 6
- 229920001194 natural rubber Polymers 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 230000004913 activation Effects 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 230000002051 biphasic effect Effects 0.000 description 5
- 239000003638 chemical reducing agent Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 239000000976 ink Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 5
- 239000004814 polyurethane Substances 0.000 description 5
- 238000007650 screen-printing Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000004812 Fluorinated ethylene propylene Substances 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 229920009441 perflouroethylene propylene Polymers 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 229920001230 polyarylate Polymers 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000007646 gravure printing Methods 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 238000002604 ultrasonography Methods 0.000 description 3
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 229920000144 PEDOT:PSS Polymers 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 2
- 229920001222 biopolymer Polymers 0.000 description 2
- 239000002041 carbon nanotube Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000011231 conductive filler Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000004811 fluoropolymer Substances 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920001643 poly(ether ketone) Polymers 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 229920001470 polyketone Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920001021 polysulfide Polymers 0.000 description 2
- 239000005077 polysulfide Substances 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 229920006174 synthetic rubber latex Polymers 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229920002749 Bacterial cellulose Polymers 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- 241000258880 Gynoeryx meander Species 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 239000012448 Lithium borohydride Substances 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000005016 bacterial cellulose Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- OWIUPIRUAQMTTK-UHFFFAOYSA-M n-aminocarbamate Chemical compound NNC([O-])=O OWIUPIRUAQMTTK-UHFFFAOYSA-M 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005325 percolation Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- KZJPVUDYAMEDRM-UHFFFAOYSA-M silver;2,2,2-trifluoroacetate Chemical compound [Ag+].[O-]C(=O)C(F)(F)F KZJPVUDYAMEDRM-UHFFFAOYSA-M 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B7/00—Insulated conductors or cables characterised by their form
- H01B7/06—Extensible conductors or cables, e.g. self-coiling cords
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0277—Bendability or stretchability details
- H05K1/0283—Stretchable printed circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/008—Apparatus or processes specially adapted for manufacturing conductors or cables for manufacturing extensible conductors or cables
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0133—Elastomeric or compliant polymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0302—Properties and characteristics in general
- H05K2201/0311—Metallic part with specific elastic properties, e.g. bent piece of metal as electrical contact
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/075—Global treatment of printed circuits by fluid spraying, e.g. cleaning a conductive pattern using nozzles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0776—Uses of liquids not otherwise provided for in H05K2203/0759 - H05K2203/0773
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
- H05K2203/0789—Aqueous acid solution, e.g. for cleaning or etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1333—Deposition techniques, e.g. coating
- H05K2203/1361—Coating by immersion in coating bath
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Abstract
The method comprises the steps of: (a) forming a solid metal layer on a surface of an elastomer substrate; (b) optionally, activating a surface of the solid metal layer by removing a passivation layer from the surface of the solid metal layer; (c) applying a liquid metal onto an exposed surface of the solid metal layer; (d) forming an alloy from the solid metal layer and the liquid metal such that the alloy comprises at least one element originating from the solid metal layer and at least one element originating from the liquid metal, such that the alloy is composed of at least 5 wt.-% of material originating from the solid metal layer and at least 15 wt.-% of material originating from the liquid metal; (e) removing un-alloyed liquid metal from a surface of the alloy formed in step (d); and (f) optionally, applying a protective elastomeric film. The elastic conductor finds use in a wearable and/or stretchable electronic device.
Description
Method of manufacturing an elastic conductor, elastic conductor and electronic device comprising the elastic conductor
FIELD OF THE INVENTION
The present invention relates to a method of manufacturing an elastic conductor, an elastic conductor obtainable by the method and an electronic device, in particular a wearable and/or stretchable electronic device, comprising the elastic conductor.
BACKGROUND
The field of flexible or elastic electronics has rapidly grown over the past decade as a result of the increasing demand for real-time health monitoring, light weight mobile electronics, wearable displays etc. In the proximate future multifunctional electronic devices are going to be incorporated on the human body or clothing and a stable performance under conditions of high strain and extreme body motion such as folding, twisting and stretching will be required. The growing demand for such devices has triggered research in the design and manufacturing of stretchable elastomers and elastomer composites. Although good conductivity and high stretchability seem to be mutually exclusive features, a few approaches to combine stretchability and good electrical conductivity have been proposed to date.
A common strategy is to obtain stretchable conductors from stiff, non-stretchable materials: (a) coiled metal wires, (b) meanders of metal foil, (c) thin layers of metal sputtered on a prestretched or buckled/microporous substrates. These interconnects are stretchable within the boundaries imposed by geometrical features of the conductive film due to the microporosity of the -2 -surface, pattern design (e.g. meanders), pre-stretching and/or grain boundary lithography. Within these limits, excellent conductivity, speed and only little fatigue are observed. Nevertheless, above critical strain values (i.e. approx. 40% for meanders) irreversible destruction of the circuitry occurs.
Additionally, the fabrication of conductive layers on prestretched substrates poses some technical challenges, which significantly increase the cost of manufacturing.
Well resolved and highly conductive stretchable interconnects were manufactured by infiltration of an elastomeric substrate with Ag+ ions, followed by chemical reduction. In this approach the high solubility of silver trifluoroacetate in organic solvents was exploited. The reduction is carried out by means of hydrazine or formaldehyde treatment. These substances are toxic or require a harsh environment, so the produced stretchable wiring boards need to be extensively rinsed. The preparation requires a multistep procedure and works well only on selected substrates, which limits its applicability in industrial processes.
Despite the advantages of the systems described above, the vast majority of stretchable conductive systems are based on conductive composites, in which the polymeric part is responsible for the stretchability, while percolated conductive fillers allow efficient charge transfer. Conductive fillers may be carbon based (e.g. graphite, amorphous carbon, carbon nanotubes (CNTs), graphene, pyrolyzed bacterial cellulose) or metallic (e.g. metal nanowires, microflakes, micropowders, microflowers and nanoparticles). Combinations of different kinds of fillers were also reported.
One method of fabricating conductive composites is the infiltration of a percolated filler-network with a liquid elastomer resin, which is subsequently cured. Thus obtained composites show excellent conductivity, since the filler network is per se highly percolated. The drawback is the relatively complex, -3 -multistep manufacturing process and the difficulty in the precise deposition of the filler.
In another approach, an ink contains both the elastomeric resin and the filler in a single component, which can be structured for instance by means of screen printing. The latter is the preferred deposition method for industrial applications because of the simplicity of the printing process, easy automatization, applicability on different substrates and good resolution. Common inks giving access to conductive stretchable composites comprise CNTs and/or microscopic metallic particles. Particularly good conductivities under strain can be achieved with silver microflakes, which are the filler of choice in most commercially available systems. These inks result in percolated networks with excellent conductivity, but the inks have generally high R/Ro values and significant fatigue, since many connections between individual filler nanoparticles are broken when strain is applied. The particles of the filler may also undergo encapsulation in the insulating polymer, which decreases the effective percolation. Thus, relatively thick layers of the composite are necessary to meet the required conductivity and fatigue resistance.
High stretchability with low R/Ro was reported for stretchable inks based on PEDOT:PSS. The conductive polymer is typically used together with a fluorosurfactant and can be applied via screen printing. The advantage of the system lies inter alia in high optical transparency, which makes it a stretchable analogue to ITO films. However, for applications in stretchable interconnects, the limited conductivity of PEDOT:PSS is a disadvantage.
Liquid metal conductors on elastomers show optimal R/Ro at almost any strain values but are difficult to manufacture industrially. In a recent publication (Hirsch, A., Michaud, H.O., Gerratt, A.P., Mulatier, S. de & Lacour, S.P.
Intrinsically stretchable biphasic (solid-liquid) thin metal films. Advanced Materials 28,4507-4512 (2016)), a thin layer of noble metal (i.e. Au) was evaporated onto an elastomer surface, followed by the evaporation of a layer -4 -of Ga. This resulted in a biphasic AuGa2/Ga layer, which showed excellent conductivity and was virtually fatigue free. The practical applicability for large scale production is however limited by the thermal evaporation steps, which require high vacuum.
OBJECT OF THE INVENTION
The present invention aims at overcoming the above described problems and drawbacks. Thus, an object of the present invention is to provide a method which enables the manufacturing of an elastic (flexible, stretchable) conductor exhibiting high stretchability along with excellent electrical conductivity (preserved even at high strain values) and excellent fatigue resistance (e.g. only minimum changes in conductivity after multiple stretching and release cycles) in a cost efficient manner and suitable for high throughput manufacturing.
SUMMARY OF THE INVENTION
This object may be solved by a method of manufacturing an elastic conductor as described in claim 1.
The present invention in particular relates to a method of manufacturing an elastic (flexible, stretchable) conductor (e.g. conductive trace), the method comprising the steps of (a) forming a solid metal layer on a surface of an elastomer substrate; (b) optionally, activating a surface of the solid metal layer by removing a passivation layer from the surface of the solid metal layer; (c) applying a liquid metal onto an exposed surface of the solid metal layer; (d) forming an (electrically conductive (in particular electrically conductive under strain) and/or biphasic (e.g. solid-liquid)) alloy from the solid metal layer and the liquid metal such that the alloy comprises at least one element (or metal) originating from the solid metal layer and at least one element (or metal) originating from the liquid metal, such that the alloy is composed of at least 5 wt.-% of material (i.e. one or more elements or metals) originating from the solid metal layer and at least 15 wt.-% of material (i.e. one or more elements or metals) originating from the liquid metal; (e) removing un-alloyed liquid metal from a surface of the alloy formed in step (d); (f) optionally, applying a protective elastomeric film.
The present invention further relates to an elastic (flexible, stretchable) conductor (e.g. conductive trace) obtainable by the method as described 10 herein.
In addition, the present invention relates to an electronic device, in particular a wearable and/or stretchable electronic device, comprising the elastic (flexible, stretchable) conductor as described herein.
Other objects and many of the attendant advantages of embodiments of the present invention will be readily appreciated and become better understood by reference to the following detailed description of embodiments and the accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
Figure 1 illustrates an exemplary set-up suitable for manufacturing an elastic conductor as described herein.
Figure 2 shows experimental results of an XPS measurement of the depth profile of two exemplary conductors manufactured according to the present invention.
DETAILLED DESCRIPTION OF THE INVENTION -6 -
Hereinafter, details of the present invention and other features and advantages thereof will be described. However, the present invention is not limited to the following specific descriptions, but they are for illustrative purposes only.
It should be noted that features described in connection with one exemplary embodiment or exemplary aspect may be combined with any other exemplary embodiment or exemplary aspect, in particular features described with any exemplary embodiment of the method of manufacturing an elastic conductor may be combined with any exemplary embodiment of an elastic conductor or with any exemplary embodiment of an electronic device and vice versa, unless specifically stated otherwise.
Where an indefinite or definite article is used when referring to a singular term, such as "a", "an" or "the", a plural of that term is also included and vice versa, unless specifically stated otherwise, whereas the word "one" or the number "1", as used herein, typically means "just one" or "exactly one".
The expressions "comprising", "including" or "containing" do not exclude other elements or steps and, as used herein, include not only the meaning of "comprising", "including" or "containing", but may also encompass "consisting essentially of" and "consisting or.
Unless specifically stated otherwise, the expression "at least partially", "at least a partial" or "at least a part of", as used herein, may mean at least 5 % thereof, in particular at least 10 % thereof, in particular at least 15 % thereof, in particular at least 20 Wo there of, in particular at least 25 Wo thereof, in particular at least 30 % thereof, in particular at least 35 °A° thereof, in particular at least 40 0/0 thereof, in particular at least 45 °A° thereof, in particular at least 50 % thereof, in particular at least 55 % thereof, in particular at least 60 % thereof, in particular at least 65 % thereof, in particular at least 70 Wo thereof, in particular at least 75 Wo thereof, in -7 -particular at least 80 0/0 thereof, in particular at least 85 % thereof, in particular at least 90 0/0 thereof, in particular at least 95 % thereof, in particular at least 98 % thereof, and may also mean 100 % thereof.
In a first aspect, the present invention relates to a method of manufacturing an elastic (flexible, stretchable) conductor (e.g. conductive trace), the method comprising the steps of (a) forming a solid metal layer on a surface of an elastomer substrate; (b) optionally, activating a surface of the solid metal layer by removing a passivation layer from the surface of the solid metal layer; (c) applying a liquid metal onto an exposed surface of the solid metal layer; (d) forming an (electrically conductive (in particular electrically conductive under strain) and/or biphasic (e.g. solid-liquid)) alloy from the solid metal layer and the liquid metal such that the alloy comprises at least one element (or metal) originating from the solid metal layer and at least one element (or metal) originating from the liquid metal, such that the alloy is composed of at least 5 wt.-% of material (i.e. one or more elements or metals) originating from the solid metal layer and at least 15 wt.-% of material (i.e. one or more elements or metals) originating from the liquid metal; (e) removing un-alloyed liquid metal from a surface of the alloy formed in step (d); (f) optionally, applying a protective elastomeric film.
The terms "elastic", "flexible" and "stretchable" are substantially interchangeable herein. These terms may particularly denote a material property of reversibly deforming under stress.
The term "conductor", as used herein, may in particular denote a material that is capable of conducting electric current, i.e. that is electrically conductive. A conductor within the meaning of the present invention may be capable of conducting electric current even under strain, such as under tensile strain or stress and/or under a flexural load, and preferably may substantially revert to its initial conductivity after release of the strain. In an embodiment, a conductor as well as its conductivity may be substantially fatigue resistant with regard to repeated appliances of stress/strain and release thereof. The conductor may for instance represent a conductive trace, such as a conductive trace formed or arranged on a substrate, such as an elastomer or elastic substrate.
The term "alloy", as used herein, may in particular denote a combination of at least two components, such as at least two metals, exhibiting a metallic bonding characteristics. It may be a solid solution of metal elements (forming a single phase) or a mixture of metallic phases (forming two or more solutions).
The term "liquid metal", as used herein, may in particular denote a metal or an alloy, which is in a liquid state. In particular, a liquid metal may be composed of metal ions and free electrons, such as mercury or fused metal. In addition, a liquid metal may have a high electrical conductivity due to the action of free electrons.
In an embodiment, the step (a) of forming a solid metal layer on a surface of an elastomer substrate comprises applying at least one metal or metal precursor (such as a salt or a complex thereof). For instance, the metal or metal precursor may be applied in the form of a solution or a suspension containing the metal or metal precursor. The metal or metal precursor may be applied directly on a surface of the elastomer, i.e. without any intervening structure or layer.
In an embodiment, the step (a) of forming a solid metal layer on a surface of an elastomer substrate comprises applying at least one metal or metal precursor by means of at least one selected from the group consisting of sputtering, evaporation, printing (such as inkjet printing, screen printing, flexographic printing or gravure printing), spray-coating and dip-coating. It might be advantageous if the solid metal layer may be formed in a continuous process, for instance in a reel-to-reel process, which may be efficiently achieved for instance by means of spray-coating.
In some embodiments, the solid metal layer may be formed as a solid metal layer having a substantially continuous surface. This may be achieved for instance by means of at least one selected from the group consisting of sputtering, evaporation, spray-coating and dip-coating.
In alternative embodiments, the solid metal layer may be formed as a patterned (or structured) metal layer, which may be for instance efficiently achieved by means of a printing technique, such as inkjet printing, screen printing, flexographic printing or gravure printing.
In an embodiment, a metal precursor is applied on a surface of the elastomer substrate. The metal precursor may comprise a salt of a metal or a complex of a metal. In particular, the solid metal layer may be formed by applying a solution of a metal precursor, which may be advantageous in terms of cost efficiency and in terms of appropriately adjusting the amount of applied solid metal and/or thickness of the solid metal layer.
If a metal precursor is applied on a surface of the elastomer substrate, the method may further comprise a step of reducing the metal precursor to the corresponding metal (or element).
In an embodiment, reducing the metal precursor includes a physical and/or chemical treatment of the metal precursor, in particular by at least one selected from the group consisting of thermal reduction, photochemical reduction, and chemical reduction.
In an embodiment, the step (a) of forming a solid metal layer may be carried out in an inert gas atmosphere (such as under a N2, CO2, or a noble gas, in particular Ar, atmosphere). By taking this measure, it may be avoided that a -10 -passivation layer, such as an oxide layer, is formed on a surface of the solid metal layer, which should otherwise be removed before applying a liquid metal. Alternatively, the step (a) of forming a solid metal layer may be carried out in a normal gas atmosphere, such as air. This might be advantageous for reducing the process costs, in particular if the solid metal layer basically consists of noble metals that are not prone to form a passivation layer, such as an oxide layer, in the presence of oxygen.
In an embodiment, the step (a) of forming a solid metal layer on a surface of 10 an elastomer substrate comprises (al) depositing, in particular spray-coating or dip-coating, a solution or suspension containing at least one metal or metal salt on the surface of the elastomer substrate; (a2) optionally reducing the metal salt to the corresponding metal (element); and (a3) drying the solution or suspension.
In an embodiment, the solid metal layer comprises an adhesion layer and/or an alloying layer composed of a metal or a combination thereof. The term "adhesion layer", as used herein, may in particular denote a (metal) layer configured for providing adhesion (or an adhesive connection) between the substrate and the later formed alloy. The term "alloying layer", as used herein, may in particular denote a (metal) layer configured for providing a part of the raw material for the later formed alloy. As will be discussed in further detail below, the alloy formed in step (d) comprises at least one element or metal originating from the solid metal layer, more specifically from an alloying layer forming part or constituting the solid metal layer.
In an embodiment, the solid metal layer may comprise, in particular consist of, one layer, which may function as an adhesion layer and/or an alloying layer. In this embodiment, the solid metal layer preferably comprises only one metal, such as silver or copper, or one alloy.
In alternative embodiments, the solid metal layer may comprise, in particular consist of, more than one layers (such as a plurality of sublayers). For example, the solid metal layer may comprise at least one adhesion layer and at least one alloying layer. The more than one layers may be composed of the same metal (or the same alloy) or of different metals (or different alloys).
The solid metal layer may comprise more than one metals or elements, which may be applied sequentially or as a mixture.
In an embodiment, the solid metal layer comprises at least one element (or metal) selected from the group consisting of copper, silver, gold and platinum. Preferably, the solid metal layer comprises at least one element (or metal) selected from the group consisting of copper and silver.
In an embodiment, a thickness of the solid metal layer is from 50 nm to 10 pm, in particular 100 nm to 5 pm, in particular 250 nm to 1 pm, for example 500 nm.
The material of the elastomer substrate is not particularly limited, as long as it is elastic (or flexible) and is capable of bearing a solid metal layer (or the later formed alloy) on its surface. For instance, the material of the elastomer substrate may comprise at least one polymer material. Suitable examples of the material of the elastomer substrate may be in particular thermoplastics, thermosets and composite materials. In particular, suitable examples of the material of the elastomer substrate include polyurethanes, polyurethane (meth)acrylates, PEG-(meth)acrylates; polyester, such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC); polysulfones, such as polyethersulfone (PES); polyarylates (PAR); polycyclic olefins (PC0); polyimides (PI); polyolefins, such as polyethylene (PE), polypropylene (PP); vinyl polymers, such as polystyrene (PS), polyvinyl chloride (PVC), polymethyl methacrylate (PMMA); polyamides; polyethers; -12 -polyketones, such as aromatic polyetherketones (e.g. PEEK); polysulfides (e.g. PPS); fluoropolymers, such as polyvinylidene fluoride (P(VDF), such as P(VDFTrFE), which may be particularly suitable when used for a piezoelectric sensor), polytetrafluoroethylene (such as PTFE), fluorinated ethylene propylene (FEP); liquid crystal polymers; polyepoxides; polysiloxanes (e.g. PDMS); rubber materials, such as natural rubber (NR), synthetic natural rubber (IR), nitrile butadiene rubber (NBR), carboxylated nitrile butadiene rubber (XNBR), styrene butadiene rubber (SBR) and other rubber materials derived from polymer dispersions and caoutchouc or synthetic rubber latexes; biopolymers or combinations, copolymers and/or blends thereof. In particular, the material of the elastomer substrate may include a thermoplastic polyurethane.
In an embodiment, the elastomer substrate may have a tensile modulus of not more than 250 MPa, in particular of not more than 200 MPa. The lower limit of the tensile modulus of the elastomer substrate is not particularly limited, as long as the elastomer substrate is capable bearing a solid metal layer (or the later formed alloy) on its surface. In particular, the elastomer substrate may have a tensile modulus of not less than 25 MPa, in particular of not less than 50 MPa. The tensile modulus of the elastomer substrate can be for instance determined in accordance with ISO 527-1 and 527-3.
In an embodiment, the method further comprises a step of structuring (or patterning) the solid metal layer after step (a) and prior to step (c), for instance, if a solid metal layer having a substantially continuous surface has been formed in step (a), such as by means of at least one selected from the group consisting of sputtering, evaporation, spray-coating and dip-coating.
In an embodiment, the step of structuring the solid metal layer includes at least one selected from the group consisting of cutting, selective wetting, etching or a photolithography process.
-13 -In an embodiment, the method comprises the step (b) of activating a surface of the solid metal layer by removing a passivation layer, such as an oxide layer, from the surface of the solid metal layer. By doing so, the wettability of the surface of the solid metal layer may be improved, in particular its wettability for a liquid metal. This process step may be necessary if the solid metal layer does not basically consist of noble metals, such as silver, gold or platinum, and/or if the solid metal layer has been formed in the presence of oxygen.
In an embodiment, the activating of a surface of the solid metal layer includes a physical treatment, such as an irradiation with (e.g. intense pulsed) light, and/or a chemical treatment, such as a(n) (etching) treatment (for instance by spray coating) with an acid (for instance NCI), a base (for instance an amine compound, e.g. diaminooctane), or a reducing agent (for instance a polyol, aldehyde, hydride, e.g. lithium borohydride, hydrazine and its derivatives, e.g. hydrazine carboxylate) of the surface of the solid metal layer.
In an embodiment, prior to step (c), the liquid metal is subjected to an activation treatment. In particular, the activation treatment of the liquid metal may comprise a removal of a passivation layer, such as an oxide layer, from the surface of the liquid metal. By taking this measure, the wettability of the liquid metal with regard to a surface of the solid metal layer may be improved. This process step may be necessary if the process step (c) is carried out in a atmosphere comprising oxygen.
In an embodiment, the activation treatment of the liquid metal includes a physical treatment, such as an irradiation with (e.g. intense pulsed) light, and/or a chemical treatment, such as a(n) (etching) treatment (for instance by spray coating) with an acid (for instance HCI),a base (for instance an amine compound, e.g. diaminooctane), or a chemical reducing agent, of the surface of the liquid metal.
-14 -It might be advantageous to carry out both the activating of a surface of the solid metal layer (if any) and the activation treatment of the liquid metal (if any) by means of the same technique, for instance by an etching treatment by spray coating with an acid or any other of the techniques described in the foregoing. By doing so, the same equipment may be used for both activation treatments, thereby reducing equipment requirements and process costs.
In an embodiment, the step (c) of applying a liquid metal onto an exposed surface of the solid metal layer comprises a dip coating of an exposed surface of the solid metal layer into the liquid metal. By taking this measure, it might be possible to perform step (c) continuously, for instance in a reel-to-reel process, which may be advantageous in terms of cost efficiency and may allow high throughput manufacturing.
In an embodiment, the liquid metal comprises at least one element (or metal) selected from the group consisting of gallium, indium and tin. For example, the liquid metal may consist of one element (or metal) or of an alloy of two or more elements (or metals).
In an embodiment, the liquid metal comprises an (eutectic) alloy of gallium, indium and tin. For example, the liquid metal may be an alloy comprising a larger amount of gallium than an amount of any of indium and tin. For example, the liquid metal may be an alloy comprising from 65 to 86 wt.-% of gallium, from 5 to 22 wt.-% of indium and from 1 to 11 wt.-% of tin. In particular, the liquid metal may be Galinstan.
In the step (d) of forming an alloy from the solid metal layer and the liquid metal, a new material is formed (i.e. the alloy), which has different properties than both the solid metal and the liquid metal. As a result of the alloying process, a volume expansion may occur due to an increase of the lattice constant of the metal or the alloy. The alloy formed in step (d) may be solid. In addition, the alloy formed in step (d) is typically electrically conductive, and -15 -advantageously may remain its electrical conductivity under strain or stress (e.g. it may be electrically conductive under strain). The alloy formed in step (d) may be a biphasic alloy, such as a solid-liquid alloy.
In an embodiment, the alloy represents the (main) conductive material of the conductor. The alloy may even represent the only (electrically) conductive material of the conductor.
In an embodiment, the alloy formed in step (d) comprises at least 10 wt.-%, in particular at least 15 wt.-%, in particular at least 20 wt.-%, of material (i.e. one or more elements or metals) originating from the solid metal layer.
In an embodiment, the alloy formed in step (d) comprises at least 20 wt.-%, in particular at least 25 wt.-%, in particular at least 30 wt.-%, of material (i.e. one or more elements or metals) originating from the liquid metal.
In an embodiment, the alloy formed in step (d) is entirely composed of material (i.e. one or more elements or metals) originating from the solid metal layer or from the liquid metal.
In an embodiment, the step (d) of forming an alloy from the solid metal layer and the liquid metal includes (directly) contacting the solid metal layer with the liquid metal for a period of time of from 1 second to 1 hour, in particular of from 30 seconds to 30 minutes, in particular of from 1 minute to 10 minutes and at a temperature of from 10 °C to 150 °C, in particular of from 15 °C to 130 °C, in particular of from 20 °C to 100 °C. The period of time for completing the alloying may in particular depend on the characteristics of the solid metal layer (more specifically the alloying layer), such as its elemental composition, thickness and structure (e.g. porous or non-porous), the type of the liquid metal and the temperature.
-16 -In an embodiment, the alloy formed in step (d) has a depth profile in thickness direction. In other words, it may be possible that the composition of the alloy is not homogenous in a thickness direction, but that there may be a concentration gradient in the thickness direction. For instance, one or more elements or metals originating from the solid metal layer may have a higher concentration at a position within the alloy close to the substrate than at a position within the alloy farther from to the substrate or vice versa.
In an embodiment, the alloy formed in step (d) has a shape with a flat (substantially rectangular) cross-section. For instance, the alloy may form a layer, for instance a continuous layer or a patterned or structured layer.
In an embodiment, the alloy formed in step (d), such as an alloy layer, has a thickness of from 75 nm to 20 pm, in particular 250 nm to 10 pm, in particular 15 500 nm to 5 pm.
In an embodiment, a thickness of the alloy formed in step (d), such as an alloy layer, is at least one and a half times, in particular at least twice, in particular at least three times, the thickness of the solid metal layer prior to step (c).
In an embodiment, the step (d) of forming an alloy from the solid metal layer and the liquid metal includes a substantially complete dissolution (or transformation) of the solid metal layer. Thus, the alloying step of (d) may be carried out until substantially all of the material from the solid metal layer is transformed together with the liquid metal into an alloy. A thus formed alloy may retain the adhesion to the substrate of the previous solid metal layer and may remain fully wetted by the liquid metal.
The method of manufacturing an elastic conductor according to the first aspect comprises a step (e) of removing un-alloyed (or excessive) liquid metal from a surface of the alloy formed in step (d). By taking this measure, a flat-cross- -17 - section of the conductor may be achieved because no meniscus of accumulated liquid metal is present. In addition, the surface of the conductor may be resistant to soft touch because the formed alloy may not readily wet skin and/or most polymeric surfaces. As a consequence of removing un-alloyed liquid metal from the surface of the alloy, a protective elastomeric film may be applied by means of lamination, which may not be possible if substantial amounts of un-alloyed (or excessive) liquid metal remained on the surface of the alloy.
In an embodiment, the step (e) of removing un-alloyed liquid metal from a surface of the alloy is carried out by means of at least one selected from the group consisting of squeegee, compressed air (such as an air blade), doctor blade, scraper, pressing roll and a roller mill.
In an embodiment, the step (e) of removing un-alloyed liquid metal from a surface of the alloy substantially completely removes any un-alloyed liquid metal from the surface of the alloy, in particular so that the conductor does substantially not comprise any mechanically extractable liquid metal. By taking this measure, leakage of liquid metal may be avoided, which is advantageous in terms of safety, in particular since leaking or extractable liquid metal may corrode aluminium or other metals, which restricts the application range. Such restrictions, for instance in airplanes, may be avoided by substantially completely removing any un-alloyed liquid metal.
In an embodiment, the un-alloyed liquid metal removed in step (e) may be recycled and used again for step (c) of applying a liquid metal. By taking this measure, the material costs may be reduced and resources may be efficiently utilized being advantageous from an ecological point of view.
In an embodiment, the method further comprises, after step (e), a step of structuring (or patterning) an alloy layer (or film) formed in step (d), for -18 -instance if no structuring (or patterning) of the solid metal layer has been made.
In an embodiment, the step of structuring the alloy layer comprises at least one selected from the group consisting of cutting (such as laser cutting), etching or a photolithography process.
In an embodiment, the method of manufacturing an elastic conductor comprises the step (f) of applying a protective elastomeric film. By taking this measure, the alloy representing the conductive material of the conductor may be protected from environmental influences. As a result, the reliability and/or the robustness of the conductor may be improved.
In an embodiment, the step (f) of applying a protective elastomeric film comprises at least one selected from the group consisting of a lamination process (e.g. under application of heat and pressure or under application of ultrasound (such as ultrasound sintering or ultrasound lamination, which may allow the selective provision of heat for lamination at the interfaces to be laminated)), in particular by means of roll-to-roll (or reel-to-reel) processing; screen printing, in particular by means of roll-to-roll (or reel-to-reel) processing, optionally followed by curing (such as photo-polymerization); offset printing; flexographic printing and gravure printing. It should be appreciated that these techniques are not compatible with conventional methods for manufacturing an elastic conductor using a liquid metal, but are only compatible with a method for manufacturing an elastic conductor according to the present invention. In addition, the protective elastomeric film may hereby be provided in a particular cost-efficient manner, enabling a continuous high throughput production of the conductor. In alternative embodiments, the step (f) of applying a protective elastomeric film comprises at least one selected from the group consisting of casting a liquid elastomer resin and subsequently curing the liquid elastomer resin, curtain coating, spray coating, dip coating, doctor-blading and roll-coating.
-19 -In an embodiment, the protective elastomeric film comprises at least one polymer material, in particular at least one selected from the group consisting of thermoplastic materials, thermosetting resins, UV-and thermally curable (polymerizable) resins, materials obtained from polymer (elastomer) solutions, polymer (elastomer) dispersions, and latexes (emulsions of elastomer droplets in a non-miscible solvent). In particular, suitable examples of the material of the protective elastomeric film include polyurethanes, polyurethane (meth)acrylates, PEG-(meth)acrylates; polyesters, such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC); polysulfones, such as polyethersulfone (PES); polyarylates (PAR); polycyclic olefins (PC0); polyimides (PI); polyolefins, such as polyethylene (PE), polypropylene (PP); vinyl polymers, such as polystyrene (PS), polyvinyl chloride (PVC), polymethyl methacrylate (PMMA); polyamides; polyethers; polyketones, such as aromatic polyetherketones (e.g. PEEK); polysulfides (e.g. PPS); fluoropolymers, such as polyvinylidene fluoride (P(VDF), such as P(VDFTrFE), which may be particularly suitable when used for a piezoelectric sensor), polytetrafluoroethylene (such as PTFE), fluorinated ethylene propylene (FEP); liquid crystal polymers; polyepoxides; polysiloxanes (e.g. PDMS); rubber materials, such as natural rubber (NR), synthetic natural rubber (IR), nitrile butadiene rubber (NBR), carboxylated nitrile butadiene rubber (XNBR), styrene butadiene rubber (SBR) and other rubber materials derived from polymer (elastomer) dispersions, caoutchouc or synthetic rubber latexes; biopolymers or combinations, copolymers and/or blends thereof. In particular, the material of the protective elastomeric film may include a thermoplastic polyurethane.
Figure 1 illustrates an exemplary set-up suitable for manufacturing an elastic conductor as described herein. More specifically, a roll-to-roll setup is shown which may be suitable for continuously carrying out several process steps. An elastomer substrate with a solid metal layer thereon (which may have been provided in a separate module) is provided from a substrate roll. A surface of -20 -the solid metal layer is exposed to a spray nozzle dispensing for instance a mixture of ethanol and hydrochloric acid (HCI) to thereby activate the surface of the solid metal layer. A thus activated substrate is dipped into a bath of heated liquid metal, which in turn has also been activated by the same spray equipment. While passing the bath of liquid metal, the solid metal layer is wetted by liquid metal and an alloying of the solid metal and the liquid metal takes place until remaining un-alloyed liquid metal is removed from the a surface of the formed alloy by pressing rolls or squeegees. Subsequently, a laminating film (such as a protective elastomeric film) is applied on the alloy-substrate structure in a manner that the alloy (layer) is sandwiched between the protective elastomeric film and the substrate, and the thus obtained multi-layer structure is laminated by being passed through heated rolls.
In a second aspect, the present invention relates to an elastic (flexible, stretchable) conductor (e.g. conductive trace) obtainable by the method according to the first aspect.
The conductor may for instance represent a conductive trace, such as a conductive trace formed or arranged on a substrate, such as an elastomer or 20 elastic substrate. The conductor may also represent a conductor path, a wiring, or an electrical contact.
In a third aspect, the present invention relates to an electronic device, in particular a wearable and/or stretchable electronic device, comprising the elastic (flexible, stretchable) conductor according to the second aspect.
In an embodiment, the conductor may form a conductive trace, a conductor path, a wiring, or an electrical contact of the electronic device.
In an embodiment, the electronic device is selected from the group consisting of an adhesive patch, a wearable display, a printed circuit, a printed wiring board, a transistor, an antenna, a radio-frequency identification (RFID) tag, a -21 -semitransparent or transparent coating, a light-emitting diode (LED), in particular an organic light-emitting diode (OLED), a solar cell, a capacitor, a sensor, a battery electrode or an organic memory device.
The present invention is further described by the following examples, which are solely for the purpose of illustrating specific embodiments, and are not construed as limiting the scope of the invention in any way.
Examples
A thin silver layer (thickness 500 nm) was deposited on a substrate made of polyurethane by means of spraying a solution of a silver salt, followed by chemical reduction of the silver compound. After drying at 50 °C for 20 min, the substrate was dipped in activated Galinstan. The Galinstan has previously been activated by spraying with a solution of HCI in dry ethanol and remains activated in an inert or HCI saturated atmosphere.
After one second, the substrate was taken out from the bath of Galinstan. Galinstan remains adhered to those portions of the substrate coated with silver. After an alloying time of 1 minute (Sample A) and 10 minutes (Sample B), respectively, excessive Galinstan was removed by means of a squeegee. Sample A remained electrically conductive after stretching by 50%, whereas Sample B remained electrically conductive even after stretching by 200%.
Figure 2 shows experimental results of an XPS measurement of the depth profile of Sample A (1 min) and Sample B (10 min). As can be taken from Figure 2, the content of silver of the stretchable alloy and thus the maximum stretchability (while still being conductive) strongly depends on the alloying time.
While the present invention has been described in detail by way of specific embodiments and examples, the invention is not limited thereto and various -22 -alterations and modifications are possible, without departing from the scope of the invention.
Priority Applications (2)
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GB1901521.3A GB2581145A (en) | 2019-02-04 | 2019-02-04 | Method of manufacturing an elastic conductor, elastic conductor and electronic device comprising the elastic conductor |
PCT/EP2020/052627 WO2020161077A1 (en) | 2019-02-04 | 2020-02-03 | Method of manufacturing an elastic conductor, elastic conductor and electronic device comprising the elastic conductor |
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GB1901521.3A GB2581145A (en) | 2019-02-04 | 2019-02-04 | Method of manufacturing an elastic conductor, elastic conductor and electronic device comprising the elastic conductor |
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GB201901521D0 GB201901521D0 (en) | 2019-03-27 |
GB2581145A true GB2581145A (en) | 2020-08-12 |
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Cited By (1)
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CN114758844A (en) * | 2022-04-29 | 2022-07-15 | 厦门大学 | Flexible wire based on liquid metal and manufacturing method thereof |
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CN114438663A (en) * | 2021-12-17 | 2022-05-06 | 宁波诺丁汉新材料研究院有限公司 | Breathable liquid metal-based elastic conductor composite film, preparation method and application |
CN114758819A (en) * | 2022-04-12 | 2022-07-15 | 中国科学院宁波材料技术与工程研究所 | Stretchable wire and preparation method thereof |
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US20170169918A1 (en) * | 2015-12-10 | 2017-06-15 | Electronics And Telecommunications Research Institute | Stretchable wire and method of fabricating the same |
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US10057981B2 (en) * | 2015-06-10 | 2018-08-21 | Industry Foundation Of Chonnam National University | Stretchable circuit board and method of manufacturing the same |
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US20170169918A1 (en) * | 2015-12-10 | 2017-06-15 | Electronics And Telecommunications Research Institute | Stretchable wire and method of fabricating the same |
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CN114758844A (en) * | 2022-04-29 | 2022-07-15 | 厦门大学 | Flexible wire based on liquid metal and manufacturing method thereof |
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