GB2478509B - A method and system for identifying the resonance frequency of a probe resonating in plasma - Google Patents

A method and system for identifying the resonance frequency of a probe resonating in plasma

Info

Publication number
GB2478509B
GB2478509B GB0822072.5A GB0822072A GB2478509B GB 2478509 B GB2478509 B GB 2478509B GB 0822072 A GB0822072 A GB 0822072A GB 2478509 B GB2478509 B GB 2478509B
Authority
GB
United Kingdom
Prior art keywords
plasma
identifying
resonance frequency
resonating
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0822072.5A
Other versions
GB2478509A (en
GB2478509A8 (en
GB0822072D0 (en
Inventor
Shantanu Kumar Karkari
Cezar Gaman
Albert Rogers Ellingboe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dublin City University
Original Assignee
Dublin City University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dublin City University filed Critical Dublin City University
Priority to GB0822072.5A priority Critical patent/GB2478509B/en
Publication of GB0822072D0 publication Critical patent/GB0822072D0/en
Publication of GB2478509A publication Critical patent/GB2478509A/en
Publication of GB2478509A8 publication Critical patent/GB2478509A8/en
Application granted granted Critical
Publication of GB2478509B publication Critical patent/GB2478509B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0062—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by using microwaves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
GB0822072.5A 2008-12-03 2008-12-03 A method and system for identifying the resonance frequency of a probe resonating in plasma Expired - Fee Related GB2478509B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0822072.5A GB2478509B (en) 2008-12-03 2008-12-03 A method and system for identifying the resonance frequency of a probe resonating in plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0822072.5A GB2478509B (en) 2008-12-03 2008-12-03 A method and system for identifying the resonance frequency of a probe resonating in plasma

Publications (4)

Publication Number Publication Date
GB0822072D0 GB0822072D0 (en) 2009-01-07
GB2478509A GB2478509A (en) 2011-09-14
GB2478509A8 GB2478509A8 (en) 2011-10-05
GB2478509B true GB2478509B (en) 2013-08-21

Family

ID=40262599

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0822072.5A Expired - Fee Related GB2478509B (en) 2008-12-03 2008-12-03 A method and system for identifying the resonance frequency of a probe resonating in plasma

Country Status (1)

Country Link
GB (1) GB2478509B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109688686A (en) * 2018-12-10 2019-04-26 兰州空间技术物理研究所 Langmuir probe volt-ampere characteristic simulation device in a kind of plasma environment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001006402A1 (en) * 1999-07-20 2001-01-25 Tokyo Electron Limited Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
WO2003036309A1 (en) * 2001-10-24 2003-05-01 Tokyo Electron Limited Method and apparatus for electron density measurement
US6861844B1 (en) * 1999-07-21 2005-03-01 Tokyo Electron Limited Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
US20070075036A1 (en) * 2005-09-30 2007-04-05 Paul Moroz Method and apparatus for measuring plasma density in processing reactors using a short dielectric cap

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001006402A1 (en) * 1999-07-20 2001-01-25 Tokyo Electron Limited Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
US6861844B1 (en) * 1999-07-21 2005-03-01 Tokyo Electron Limited Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
WO2003036309A1 (en) * 2001-10-24 2003-05-01 Tokyo Electron Limited Method and apparatus for electron density measurement
US20070075036A1 (en) * 2005-09-30 2007-04-05 Paul Moroz Method and apparatus for measuring plasma density in processing reactors using a short dielectric cap

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109688686A (en) * 2018-12-10 2019-04-26 兰州空间技术物理研究所 Langmuir probe volt-ampere characteristic simulation device in a kind of plasma environment
CN109688686B (en) * 2018-12-10 2021-02-02 兰州空间技术物理研究所 Langmuir probe volt-ampere characteristic simulation device in plasma environment

Also Published As

Publication number Publication date
GB2478509A (en) 2011-09-14
GB2478509A8 (en) 2011-10-05
GB0822072D0 (en) 2009-01-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20131121