GB2478265B - Apparatus and method relating to the focusing of charged particles - Google Patents
Apparatus and method relating to the focusing of charged particlesInfo
- Publication number
- GB2478265B GB2478265B GB0816014.5A GB0816014A GB2478265B GB 2478265 B GB2478265 B GB 2478265B GB 0816014 A GB0816014 A GB 0816014A GB 2478265 B GB2478265 B GB 2478265B
- Authority
- GB
- United Kingdom
- Prior art keywords
- focusing
- charged particles
- method relating
- relating
- charged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002245 particle Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/20—Magnetic deflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
- H01J49/30—Static spectrometers using magnetic analysers, e.g. Dempster spectrometer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/055—Arrangements for energy or mass analysis magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
- Particle Accelerators (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0816014.5A GB2478265B (en) | 2008-09-03 | 2008-09-03 | Apparatus and method relating to the focusing of charged particles |
JP2009202950A JP5524542B2 (en) | 2008-09-03 | 2009-09-02 | Apparatus and method for focusing charged particles |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0816014.5A GB2478265B (en) | 2008-09-03 | 2008-09-03 | Apparatus and method relating to the focusing of charged particles |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0816014D0 GB0816014D0 (en) | 2008-10-08 |
GB2478265A GB2478265A (en) | 2011-09-07 |
GB2478265B true GB2478265B (en) | 2013-06-19 |
Family
ID=39866163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0816014.5A Expired - Fee Related GB2478265B (en) | 2008-09-03 | 2008-09-03 | Apparatus and method relating to the focusing of charged particles |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5524542B2 (en) |
GB (1) | GB2478265B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4578589A (en) * | 1983-08-15 | 1986-03-25 | Applied Materials, Inc. | Apparatus and methods for ion implantation |
US4902993A (en) * | 1987-02-19 | 1990-02-20 | Kernforschungszentrum Karlsruhe Gmbh | Magnetic deflection system for charged particles |
US5760405A (en) * | 1996-02-16 | 1998-06-02 | Eaton Corporation | Plasma chamber for controlling ion dosage in ion implantation |
EP1090411A2 (en) * | 1998-06-19 | 2001-04-11 | Superion Limited | Apparatus and method relating to charged particles |
GB2446005A (en) * | 2007-01-23 | 2008-07-30 | Superion Limited | Apparatus and method for removal of selected particles from a charged particle beam |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04248240A (en) * | 1991-01-23 | 1992-09-03 | Sanyo Electric Co Ltd | Ion irradiation device |
-
2008
- 2008-09-03 GB GB0816014.5A patent/GB2478265B/en not_active Expired - Fee Related
-
2009
- 2009-09-02 JP JP2009202950A patent/JP5524542B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4578589A (en) * | 1983-08-15 | 1986-03-25 | Applied Materials, Inc. | Apparatus and methods for ion implantation |
US4902993A (en) * | 1987-02-19 | 1990-02-20 | Kernforschungszentrum Karlsruhe Gmbh | Magnetic deflection system for charged particles |
US5760405A (en) * | 1996-02-16 | 1998-06-02 | Eaton Corporation | Plasma chamber for controlling ion dosage in ion implantation |
EP1090411A2 (en) * | 1998-06-19 | 2001-04-11 | Superion Limited | Apparatus and method relating to charged particles |
GB2446005A (en) * | 2007-01-23 | 2008-07-30 | Superion Limited | Apparatus and method for removal of selected particles from a charged particle beam |
Also Published As
Publication number | Publication date |
---|---|
JP5524542B2 (en) | 2014-06-18 |
GB2478265A (en) | 2011-09-07 |
JP2010118331A (en) | 2010-05-27 |
GB0816014D0 (en) | 2008-10-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20130919 |