GB2453966B - Method of measuring surface emissivity - Google Patents
Method of measuring surface emissivityInfo
- Publication number
- GB2453966B GB2453966B GB0720796A GB0720796A GB2453966B GB 2453966 B GB2453966 B GB 2453966B GB 0720796 A GB0720796 A GB 0720796A GB 0720796 A GB0720796 A GB 0720796A GB 2453966 B GB2453966 B GB 2453966B
- Authority
- GB
- United Kingdom
- Prior art keywords
- measuring surface
- surface emissivity
- emissivity
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
- G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/48—Thermography; Techniques using wholly visual means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/80—Calibration
- G01J5/802—Calibration by correcting for emissivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/046—Materials; Selection of thermal materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0720796A GB2453966B (en) | 2007-10-23 | 2007-10-23 | Method of measuring surface emissivity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0720796A GB2453966B (en) | 2007-10-23 | 2007-10-23 | Method of measuring surface emissivity |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0720796D0 GB0720796D0 (en) | 2007-12-05 |
GB2453966A GB2453966A (en) | 2009-04-29 |
GB2453966B true GB2453966B (en) | 2011-12-07 |
Family
ID=38829807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0720796A Expired - Fee Related GB2453966B (en) | 2007-10-23 | 2007-10-23 | Method of measuring surface emissivity |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2453966B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106679818B (en) * | 2016-12-31 | 2023-10-24 | 宁波大学 | Device and method for measuring temperature distribution of smooth surface |
CN114353968B (en) * | 2020-09-30 | 2023-10-20 | 北京振兴计量测试研究所 | On-site calibration method and calibration system for temperature measurement in narrow space |
CN112964364B (en) * | 2021-02-04 | 2021-09-03 | 中国人民解放军91977部队 | Portable calibration device and calibration method for thermal infrared imager |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990012295A1 (en) * | 1989-04-05 | 1990-10-18 | Plessey Overseas Limited | Temperature-controlled bodies |
US5823681A (en) * | 1994-08-02 | 1998-10-20 | C.I. Systems (Israel) Ltd. | Multipoint temperature monitoring apparatus for semiconductor wafers during processing |
WO1999028715A1 (en) * | 1997-12-01 | 1999-06-10 | On-Line Technologies, Inc. | Thermal imaging for semiconductor process monitoring |
US20060190211A1 (en) * | 2001-07-23 | 2006-08-24 | Schietinger Charles W | In-situ wafer parameter measurement method employing a hot susceptor as radiation source for reflectance measurement |
-
2007
- 2007-10-23 GB GB0720796A patent/GB2453966B/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990012295A1 (en) * | 1989-04-05 | 1990-10-18 | Plessey Overseas Limited | Temperature-controlled bodies |
US5823681A (en) * | 1994-08-02 | 1998-10-20 | C.I. Systems (Israel) Ltd. | Multipoint temperature monitoring apparatus for semiconductor wafers during processing |
WO1999028715A1 (en) * | 1997-12-01 | 1999-06-10 | On-Line Technologies, Inc. | Thermal imaging for semiconductor process monitoring |
US20060190211A1 (en) * | 2001-07-23 | 2006-08-24 | Schietinger Charles W | In-situ wafer parameter measurement method employing a hot susceptor as radiation source for reflectance measurement |
Also Published As
Publication number | Publication date |
---|---|
GB2453966A (en) | 2009-04-29 |
GB0720796D0 (en) | 2007-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20201023 |