GB2419501B - Holographic lithography - Google Patents

Holographic lithography

Info

Publication number
GB2419501B
GB2419501B GB0423170A GB0423170A GB2419501B GB 2419501 B GB2419501 B GB 2419501B GB 0423170 A GB0423170 A GB 0423170A GB 0423170 A GB0423170 A GB 0423170A GB 2419501 B GB2419501 B GB 2419501B
Authority
GB
United Kingdom
Prior art keywords
line
diffraction pattern
diffraction
geometrical shape
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0423170A
Other versions
GB2419501A (en
GB0423170D0 (en
Inventor
Richard Peter Mcwilliam
Andrew Maiden
Simon Johnson
Alan Purvis
Peter Anthony Ivey
Nicholas Luke Seed
Gavin Lewis Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Durham
Original Assignee
University of Durham
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Durham filed Critical University of Durham
Priority to GB0423170A priority Critical patent/GB2419501B/en
Publication of GB0423170D0 publication Critical patent/GB0423170D0/en
Priority to PCT/GB2005/050135 priority patent/WO2006021818A1/en
Priority to US11/660,895 priority patent/US7978386B2/en
Priority to EP05774396A priority patent/EP1782133A1/en
Priority to JP2007529003A priority patent/JP5020081B2/en
Publication of GB2419501A publication Critical patent/GB2419501A/en
Application granted granted Critical
Publication of GB2419501B publication Critical patent/GB2419501B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2294—Addressing the hologram to an active spatial light modulator
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/048—Parallel printer, i.e. a fringe pattern is reproduced
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/30—3D object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/40—Synthetic representation, i.e. digital or optical object decomposition
    • G03H2210/45—Representation of the decomposed object
    • G03H2210/452—Representation of the decomposed object into points
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00—Active addressable light modulator
    • G03H2225/30—Modulation
    • G03H2225/33—Complex modulation
    • G03H2225/34—Amplitude and phase coupled modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00—Active addressable light modulator
    • G03H2225/60—Multiple SLMs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/14—Photoresist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0284—Details of three-dimensional rigid printed circuit boards
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Abstract

A method and system for generating holographic diffraction patterns is disclosed. The method includes the steps of defining at least one geometrical shape; generating at least one line segment to represent the at least one geometrical shape; calculating a line diffraction pattern on a hologram plane, including calculating the Fresnel diffraction equation for an impulse representing the at least one line segment with a line width control term and a line length control term; and adding vectorially, where there are two or more line segments, the line diffraction patterns to form the holographic diffraction pattern. The method enables generation of two and three-dimensional shapes through the use of the line width and line length control terms and identifying where any lines cross so that the diffraction pattern can be suitably corrected.
GB0423170A 2004-08-24 2004-10-19 Holographic lithography Expired - Fee Related GB2419501B (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB0423170A GB2419501B (en) 2004-10-19 2004-10-19 Holographic lithography
PCT/GB2005/050135 WO2006021818A1 (en) 2004-08-24 2005-08-23 Holographic lithography
US11/660,895 US7978386B2 (en) 2004-08-24 2005-08-23 Generation of holographic diffraction patterns
EP05774396A EP1782133A1 (en) 2004-08-24 2005-08-23 Holographic lithography
JP2007529003A JP5020081B2 (en) 2004-08-24 2005-08-23 Holographic lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0423170A GB2419501B (en) 2004-10-19 2004-10-19 Holographic lithography

Publications (3)

Publication Number Publication Date
GB0423170D0 GB0423170D0 (en) 2004-11-24
GB2419501A GB2419501A (en) 2006-04-26
GB2419501B true GB2419501B (en) 2009-12-23

Family

ID=33484793

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0423170A Expired - Fee Related GB2419501B (en) 2004-08-24 2004-10-19 Holographic lithography

Country Status (1)

Country Link
GB (1) GB2419501B (en)

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
CHRISTENSEC C ET AL: "Wafer through-hole interconnections with high vertical wiring densities" IEEE Transactions on Components, Packaging and Manufacturing Technology: Part A, IEE Service Centre, Piscataway, NJ, US, Vol. 19, no 4, December 1996, pages 516-521 *
FRERE C ET AL: "Computer-generated holograms of three-dimensional objects composed of line segments" Journal of the Optical Society of America A (Optics and Image Science) USA, vol. 3, no. 5, May 1986, pages 726-730. *
FRERE C ET AL: "Computer-generated holograms: reconstruction of curves in 3-D" Optics Communications Netherlands, vol. 60, no 6, 15 December 1986, pages 369-372. Whole document *
JACOBSEN C ET AL: "A technique for projection X-Ray lithography using computer-generated holograms" Journal of Applied Physics, vol 71, no. 6 15 March 1992, pages 2993-3001 *

Also Published As

Publication number Publication date
GB2419501A (en) 2006-04-26
GB0423170D0 (en) 2004-11-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20201019