GB2413702B - Methods and apparatus for controlling rotating magnetic fields - Google Patents
Methods and apparatus for controlling rotating magnetic fieldsInfo
- Publication number
- GB2413702B GB2413702B GB0507431A GB0507431A GB2413702B GB 2413702 B GB2413702 B GB 2413702B GB 0507431 A GB0507431 A GB 0507431A GB 0507431 A GB0507431 A GB 0507431A GB 2413702 B GB2413702 B GB 2413702B
- Authority
- GB
- United Kingdom
- Prior art keywords
- methods
- magnetic fields
- rotating magnetic
- controlling rotating
- controlling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3455—Movable magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/2855—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table by physical means, e.g. sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0409337.3A GB0409337D0 (en) | 2004-04-27 | 2004-04-27 | Methods and apparatus for controlling rotating magnetic fields |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0507431D0 GB0507431D0 (en) | 2005-05-18 |
GB2413702A GB2413702A (en) | 2005-11-02 |
GB2413702B true GB2413702B (en) | 2008-08-20 |
Family
ID=32408092
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB0409337.3A Ceased GB0409337D0 (en) | 2004-04-27 | 2004-04-27 | Methods and apparatus for controlling rotating magnetic fields |
GB0507431A Active GB2413702B (en) | 2004-04-27 | 2005-04-13 | Methods and apparatus for controlling rotating magnetic fields |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB0409337.3A Ceased GB0409337D0 (en) | 2004-04-27 | 2004-04-27 | Methods and apparatus for controlling rotating magnetic fields |
Country Status (1)
Country | Link |
---|---|
GB (2) | GB0409337D0 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0423032D0 (en) * | 2004-10-16 | 2004-11-17 | Trikon Technologies Ltd | Methods and apparatus for sputtering |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4407713A (en) * | 1980-08-08 | 1983-10-04 | Battelle Development Corporation | Cylindrical magnetron sputtering cathode and apparatus |
US4552639A (en) * | 1984-07-20 | 1985-11-12 | Varian Associates, Inc. | Magnetron sputter etching system |
EP0213922A2 (en) * | 1985-08-26 | 1987-03-11 | Varian Associates, Inc. | Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields |
EP0399710A1 (en) * | 1989-05-22 | 1990-11-28 | Varian Associates, Inc. | Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile |
US5228963A (en) * | 1991-07-01 | 1993-07-20 | Himont Incorporated | Hollow-cathode magnetron and method of making thin films |
-
2004
- 2004-04-27 GB GBGB0409337.3A patent/GB0409337D0/en not_active Ceased
-
2005
- 2005-04-13 GB GB0507431A patent/GB2413702B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4407713A (en) * | 1980-08-08 | 1983-10-04 | Battelle Development Corporation | Cylindrical magnetron sputtering cathode and apparatus |
US4552639A (en) * | 1984-07-20 | 1985-11-12 | Varian Associates, Inc. | Magnetron sputter etching system |
EP0213922A2 (en) * | 1985-08-26 | 1987-03-11 | Varian Associates, Inc. | Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields |
EP0399710A1 (en) * | 1989-05-22 | 1990-11-28 | Varian Associates, Inc. | Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile |
US5228963A (en) * | 1991-07-01 | 1993-07-20 | Himont Incorporated | Hollow-cathode magnetron and method of making thin films |
Also Published As
Publication number | Publication date |
---|---|
GB2413702A (en) | 2005-11-02 |
GB0507431D0 (en) | 2005-05-18 |
GB0409337D0 (en) | 2004-06-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) |
Free format text: REGISTERED BETWEEN 20150716 AND 20150722 |