GB2409581B - Magnet assemblies - Google Patents

Magnet assemblies

Info

Publication number
GB2409581B
GB2409581B GB0426889A GB0426889A GB2409581B GB 2409581 B GB2409581 B GB 2409581B GB 0426889 A GB0426889 A GB 0426889A GB 0426889 A GB0426889 A GB 0426889A GB 2409581 B GB2409581 B GB 2409581B
Authority
GB
United Kingdom
Prior art keywords
magnet assemblies
assemblies
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB0426889A
Other versions
GB0426889D0 (en
GB2409581A (en
Inventor
Gordon Green
Robert Trowell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trikon Technologies Ltd
Original Assignee
Trikon Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0329992A external-priority patent/GB0329992D0/en
Application filed by Trikon Technologies Ltd filed Critical Trikon Technologies Ltd
Publication of GB0426889D0 publication Critical patent/GB0426889D0/en
Publication of GB2409581A publication Critical patent/GB2409581A/en
Application granted granted Critical
Publication of GB2409581B publication Critical patent/GB2409581B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electromagnets (AREA)
  • Physical Vapour Deposition (AREA)
GB0426889A 2003-12-23 2004-12-08 Magnet assemblies Active GB2409581B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US53162203P 2003-12-23 2003-12-23
GB0329992A GB0329992D0 (en) 2003-12-24 2003-12-24 Magnet assemblies

Publications (3)

Publication Number Publication Date
GB0426889D0 GB0426889D0 (en) 2005-01-12
GB2409581A GB2409581A (en) 2005-06-29
GB2409581B true GB2409581B (en) 2007-09-12

Family

ID=34082106

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0426889A Active GB2409581B (en) 2003-12-23 2004-12-08 Magnet assemblies

Country Status (2)

Country Link
JP (1) JP2005179781A (en)
GB (1) GB2409581B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1710829A1 (en) 2005-04-05 2006-10-11 Applied Films GmbH & Co. KG Magnet assembly for a planar magnetron

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5589039A (en) * 1995-07-28 1996-12-31 Sony Corporation In-plane parallel bias magnetic field generator for sputter coating magnetic materials onto substrates
US5630916A (en) * 1993-03-02 1997-05-20 Cvc Products, Inc. Magnetic orienting device for thin film deposition and method of use
WO1999053506A1 (en) * 1998-04-10 1999-10-21 Dexter Magnetic Technologies, Inc. Combination of magnets for generating a uniform external magnetic field
WO2000014768A1 (en) * 1998-09-09 2000-03-16 Veeco Instruments, Inc. Electromagnetic field generator and method of operation
GB2343199A (en) * 1998-05-22 2000-05-03 Cvc Products Inc Multiple-coil electromagnet for magnetically orienting thin films
WO2004022238A2 (en) * 2002-09-09 2004-03-18 Oster Magnetics, Inc. Apparatus for manipulating magnetic fields

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5630916A (en) * 1993-03-02 1997-05-20 Cvc Products, Inc. Magnetic orienting device for thin film deposition and method of use
US5589039A (en) * 1995-07-28 1996-12-31 Sony Corporation In-plane parallel bias magnetic field generator for sputter coating magnetic materials onto substrates
WO1999053506A1 (en) * 1998-04-10 1999-10-21 Dexter Magnetic Technologies, Inc. Combination of magnets for generating a uniform external magnetic field
GB2343199A (en) * 1998-05-22 2000-05-03 Cvc Products Inc Multiple-coil electromagnet for magnetically orienting thin films
WO2000014768A1 (en) * 1998-09-09 2000-03-16 Veeco Instruments, Inc. Electromagnetic field generator and method of operation
WO2004022238A2 (en) * 2002-09-09 2004-03-18 Oster Magnetics, Inc. Apparatus for manipulating magnetic fields

Also Published As

Publication number Publication date
GB0426889D0 (en) 2005-01-12
GB2409581A (en) 2005-06-29
JP2005179781A (en) 2005-07-07

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20150716 AND 20150722