GB2390378B - Deposition methods and apparatus - Google Patents

Deposition methods and apparatus

Info

Publication number
GB2390378B
GB2390378B GB0314514A GB0314514A GB2390378B GB 2390378 B GB2390378 B GB 2390378B GB 0314514 A GB0314514 A GB 0314514A GB 0314514 A GB0314514 A GB 0314514A GB 2390378 B GB2390378 B GB 2390378B
Authority
GB
United Kingdom
Prior art keywords
deposition methods
deposition
methods
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB0314514A
Other versions
GB2390378A (en
GB0314514D0 (en
Inventor
Paul Rich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aviza Europe Ltd
Original Assignee
Aviza Europe Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB0215699.0A external-priority patent/GB0215699D0/en
Application filed by Aviza Europe Ltd filed Critical Aviza Europe Ltd
Publication of GB0314514D0 publication Critical patent/GB0314514D0/en
Publication of GB2390378A publication Critical patent/GB2390378A/en
Application granted granted Critical
Publication of GB2390378B publication Critical patent/GB2390378B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
GB0314514A 2002-07-06 2003-06-23 Deposition methods and apparatus Expired - Lifetime GB2390378B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0215699.0A GB0215699D0 (en) 2002-07-06 2002-07-06 Deposition methods and apparatus
US40723702P 2002-09-03 2002-09-03

Publications (3)

Publication Number Publication Date
GB0314514D0 GB0314514D0 (en) 2003-07-30
GB2390378A GB2390378A (en) 2004-01-07
GB2390378B true GB2390378B (en) 2005-08-03

Family

ID=27665378

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0314514A Expired - Lifetime GB2390378B (en) 2002-07-06 2003-06-23 Deposition methods and apparatus

Country Status (1)

Country Link
GB (1) GB2390378B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3858547A (en) * 1973-12-14 1975-01-07 Nils H Bergfelt Coating machine having an adjustable rotation system
US4108107A (en) * 1976-04-01 1978-08-22 Airco, Inc. Rotatable substrate holder for use in vacuum
DE3934887A1 (en) * 1988-10-19 1990-04-26 Fuji Photo Film Co Ltd Deposition of thin magnetic films with constant thickness - uses sputtering method in which substrates perform specified planetary motions

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3858547A (en) * 1973-12-14 1975-01-07 Nils H Bergfelt Coating machine having an adjustable rotation system
US4108107A (en) * 1976-04-01 1978-08-22 Airco, Inc. Rotatable substrate holder for use in vacuum
DE3934887A1 (en) * 1988-10-19 1990-04-26 Fuji Photo Film Co Ltd Deposition of thin magnetic films with constant thickness - uses sputtering method in which substrates perform specified planetary motions

Also Published As

Publication number Publication date
GB2390378A (en) 2004-01-07
GB0314514D0 (en) 2003-07-30

Similar Documents

Publication Publication Date Title
GB2394389B (en) Equalisation apparatus and methods
AU2003220088A8 (en) Ald method and apparatus
GB0218836D0 (en) Apparatus and method
HK1078052A1 (en) Tube-joining apparatus and tube-joining method
EP1547755A4 (en) Tube-joining apparatus and tube-joining method
GB2389502B (en) Writeboard method and apparatus
GB0201955D0 (en) Apparatus and method
GB0210414D0 (en) Method and apparatus
GB2392066B (en) Equaliser apparatus and methods
EP1650788A4 (en) Vapor deposition apparatus and vapor deposition method
GB2390787B (en) Communications methods and apparatus
GB0230237D0 (en) Apparatus and method
GB0227778D0 (en) Droplet-deposition related methods and apparatus
HK1062857A1 (en) Film-bonding apparatus and film-bonding method
GB0202121D0 (en) Method and apparatus
GB0219068D0 (en) Apparatus and method
GB0224109D0 (en) Deposition apparatus and methods
GB0215699D0 (en) Deposition methods and apparatus
GB0324144D0 (en) Apparatus and methods
GB2390378B (en) Deposition methods and apparatus
GB2395283B (en) Apparatus and method
GB0217232D0 (en) Apparatus and method
GB0228510D0 (en) Apparatus and methods
GB0228912D0 (en) Process and apparatus
GB0207321D0 (en) Apparatus and method

Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20150716 AND 20150722

PE20 Patent expired after termination of 20 years

Expiry date: 20230622