GB2368343B - Resin material for deture base - Google Patents

Resin material for deture base

Info

Publication number
GB2368343B
GB2368343B GB0121295A GB0121295A GB2368343B GB 2368343 B GB2368343 B GB 2368343B GB 0121295 A GB0121295 A GB 0121295A GB 0121295 A GB0121295 A GB 0121295A GB 2368343 B GB2368343 B GB 2368343B
Authority
GB
United Kingdom
Prior art keywords
polymer
methacrylate
acrylate
resin material
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0121295A
Other versions
GB2368343A (en
GB0121295D0 (en
Inventor
Tomohiro Kumagai
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GC Corp
Original Assignee
GC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000273941A external-priority patent/JP3801853B2/en
Application filed by GC Corp filed Critical GC Corp
Publication of GB0121295D0 publication Critical patent/GB0121295D0/en
Publication of GB2368343A publication Critical patent/GB2368343A/en
Application granted granted Critical
Publication of GB2368343B publication Critical patent/GB2368343B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/06—Metallic compounds other than hydrides and other than metallo-organic compounds; Boron halide or aluminium halide complexes with organic compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C08L33/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate

Abstract

The resin material for denture base is of a two-liquid type, constructed by (a) a methacrylate or acrylate monomer having at least one unsaturated double bond; (b) one or two or more polymers selected from the group consisting of a methacrylate polymer, an acrylate polymer, a methacrylate/acrylate copolymer, a methacrylate/styrene copolymer, and an acrylate/styrene copolymer; and (c) a polymerization initiator, wherein a liquid A comprises of the polymer (b), the monomer (a) having a solubility to the polymer (b) of 20 % by weight or more, and the polymerization initiator (c) ; and a liquid B comprises the polymer (b) and the monomer (a) having a solubility to the polymer (b) of less than 20 % by weight.
GB0121295A 2000-09-08 2001-09-03 Resin material for deture base Expired - Fee Related GB2368343B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000273941A JP3801853B2 (en) 1999-09-30 2000-09-08 Base isolation table and its transport equipment

Publications (3)

Publication Number Publication Date
GB0121295D0 GB0121295D0 (en) 2001-10-24
GB2368343A GB2368343A (en) 2002-05-01
GB2368343B true GB2368343B (en) 2004-06-30

Family

ID=18759788

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0121295A Expired - Fee Related GB2368343B (en) 2000-09-08 2001-09-03 Resin material for deture base

Country Status (1)

Country Link
GB (1) GB2368343B (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2347679A (en) * 1999-03-12 2000-09-13 Gc Kk Resin material for denture base

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2347679A (en) * 1999-03-12 2000-09-13 Gc Kk Resin material for denture base

Also Published As

Publication number Publication date
GB2368343A (en) 2002-05-01
GB0121295D0 (en) 2001-10-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20200903