GB2345351B - Pattern generating method - Google Patents

Pattern generating method

Info

Publication number
GB2345351B
GB2345351B GB0001562A GB0001562A GB2345351B GB 2345351 B GB2345351 B GB 2345351B GB 0001562 A GB0001562 A GB 0001562A GB 0001562 A GB0001562 A GB 0001562A GB 2345351 B GB2345351 B GB 2345351B
Authority
GB
United Kingdom
Prior art keywords
generating method
pattern generating
pattern
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0001562A
Other versions
GB2345351A (en
GB0001562D0 (en
Inventor
Hidetoshi Ohnuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1133498A external-priority patent/JP3307313B2/en
Application filed by Sony Corp filed Critical Sony Corp
Publication of GB0001562D0 publication Critical patent/GB0001562D0/en
Publication of GB2345351A publication Critical patent/GB2345351A/en
Application granted granted Critical
Publication of GB2345351B publication Critical patent/GB2345351B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB0001562A 1998-01-23 1999-01-20 Pattern generating method Expired - Fee Related GB2345351B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1133498A JP3307313B2 (en) 1998-01-23 1998-01-23 Pattern generation method and apparatus
GB9901258A GB2333613B (en) 1998-01-23 1999-01-20 Pattern generating method and apparatus

Publications (3)

Publication Number Publication Date
GB0001562D0 GB0001562D0 (en) 2000-03-15
GB2345351A GB2345351A (en) 2000-07-05
GB2345351B true GB2345351B (en) 2001-03-21

Family

ID=26315008

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0001562A Expired - Fee Related GB2345351B (en) 1998-01-23 1999-01-20 Pattern generating method

Country Status (1)

Country Link
GB (1) GB2345351B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10042929A1 (en) * 2000-08-31 2002-03-21 Infineon Technologies Ag OPC method for generating corrected patterns for a phase shift mask and its trimming mask, as well as the associated device and integrated circuit structure
US6534224B2 (en) * 2001-01-30 2003-03-18 Advanced Micro Devices, Inc. Phase shift mask and system and method for making the same

Also Published As

Publication number Publication date
GB2345351A (en) 2000-07-05
GB0001562D0 (en) 2000-03-15

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20150120